Title:
VAPORIZER, SUBSTRATE TREATMENT APPARATUS, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2017/163375
Kind Code:
A1
Abstract:
According to the art disclosed in the present application, provided is a vaporizer that is equipped with: a vaporization chamber, the inner surface of which is configured from a quartz member; and an atomizer unit, which is formed of a fluorine resin, and which atomizes a liquid raw material using a carrier gas (atomization gas), and supplies the material to the inside of the vaporization chamber. The present art enables to eliminate, in the vaporizer for vaporizing the liquid raw material, occurrence of metal contamination due to reaction between the liquid raw material and the vaporizer configuration member in contact with the liquid raw material.
Inventors:
TATENO HIDETO (JP)
TANAKA AKINORI (JP)
HARA DAISUKE (JP)
OKUNO MASAHISA (JP)
JODA TAKUYA (JP)
TSUKAMOTO TAKASHI (JP)
HORII SADAYOSHI (JP)
KAKUDA TORU (JP)
TANAKA AKINORI (JP)
HARA DAISUKE (JP)
OKUNO MASAHISA (JP)
JODA TAKUYA (JP)
TSUKAMOTO TAKASHI (JP)
HORII SADAYOSHI (JP)
KAKUDA TORU (JP)
Application Number:
PCT/JP2016/059415
Publication Date:
September 28, 2017
Filing Date:
March 24, 2016
Export Citation:
Assignee:
HITACHI INT ELECTRIC INC (JP)
International Classes:
B01J7/00; H01L21/31; C23C16/455
Domestic Patent References:
| WO2014021220A1 | 2014-02-06 | |||
| WO2013094680A1 | 2013-06-27 | |||
| WO2005067016A1 | 2005-07-21 |
Foreign References:
| JP2003318170A | 2003-11-07 | |||
| JP2007165847A | 2007-06-28 |
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