Title:
VARIABLE RADIUS MIRROR DICHROIC BEAM SPLITTER MODULE FOR EXTREME ULTRAVIOLET SOURCE
Document Type and Number:
WIPO Patent Application WO/2016/099758
Kind Code:
A8
Abstract:
A laser produced plasma extreme ultraviolet laser source comprising at least one variable radius mirror. The at least one variable radius mirror to adjust a beam diameter of a main pulse at a specified distance from a pre-pulse focal plane, where the pre-pulse radiates droplets into target droplets and the main pulse radiates the target droplets into a plasma state to generate the extreme ultraviolet radiation.
Inventors:
PURVIS MICHAEL ANTHONY (US)
RAFAC ROBERT JAY (US)
SCHAFGANS ALEXANDER ANTHONY (US)
ZHANG KEVIN WEIMIN (US)
RAFAC ROBERT JAY (US)
SCHAFGANS ALEXANDER ANTHONY (US)
ZHANG KEVIN WEIMIN (US)
Application Number:
PCT/US2015/061166
Publication Date:
November 02, 2017
Filing Date:
November 17, 2015
Export Citation:
Assignee:
ASML NETHERLANDS BV (NL)
International Classes:
G02B5/08; G02B27/10; H05G2/00
Attorney, Agent or Firm:
NGUYEN, Joseph A. (US)
Download PDF: