Title:
VERTICAL HEAT TREATMENT APPARATUS AND HEAT INSULATING MATERIAL
Document Type and Number:
WIPO Patent Application WO/1993/023713
Kind Code:
A1
Abstract:
A vertical heat treatment apparatus which has a heat insulating body having heat insulating property, high allowable overload and pressure resistance sufficient to cope with the increase in the diameter of a substrate and with the treatment of many substrates, and being suitable especially to heat treatment apparatus for semiconductor and TFT substrates. In the apparatus, especially, on the top of a heat insulating table (40), a jig (4) for holding substrates is provided, and in the lower space of the table (40) a heat insulating material (50) made of a porous material is stored. This vertical heat treatment apparatus is characterized in that a space (B) for storing the heat insulating material is gastightly isolated from a space (A) for storing substrates by the heat insulating table (40), and the space (B) can be ventilated, decompressed or compressed via a base (70) supporting the heat insulating table (40), or via the part where a flange part (41) of the heat insulating table contacts with the base (70).
Inventors:
OKOSHI SHINICHI (JP)
KIMURA HIROYUKI (JP)
KIMURA HIROYUKI (JP)
Application Number:
PCT/JP1992/000627
Publication Date:
November 25, 1993
Filing Date:
May 15, 1992
Export Citation:
Assignee:
SHINETSU QUARTZ PROD (JP)
OKOSHI SHINICHI (JP)
KIMURA HIROYUKI (JP)
OKOSHI SHINICHI (JP)
KIMURA HIROYUKI (JP)
International Classes:
C30B31/10; C30B31/12; C30B33/00; F27B17/00; F27D7/02; (IPC1-7): F27B17/00
Foreign References:
| JPH03164688A | 1991-07-16 | |||
| JPS63257220A | 1988-10-25 | |||
| JPS63161612A | 1988-07-05 | |||
| JPS6366928A | 1988-03-25 |
Other References:
See also references of EP 0603391A4
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