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Title:
VERTICAL VACUUM DEVICE AND PROCESSING METHOD
Document Type and Number:
WIPO Patent Application WO/2011/102405
Kind Code:
A1
Abstract:
The disclosed vertical vacuum device is provided with: a vacuum chamber (11); a gas source (131) wherein vent gas is encapsulated; a gas introduction pipe which is connected to the gas source and the vacuum chamber; and a valve which is provided in the gas introduction pipe and which controls the gas flow amount. In the vacuum chamber a substrate is held so as to be substantially perpendicular, and vent gas is introduced from the gas source. The vacuum device further has a control means (144) which controls the degree of opening of the valve such that in the period when the inside of the vacuum chamber changes from a molecular flow state to a viscous flow state due to the initialisation of vent gas introduction, the pressure (Y) (kPa) in the vacuum chamber (11) relative to time (X) (seconds) is Y<0.3X+Z (Z being the initial pressure in the vacuum chamber).

Inventors:
OONO TETSUHIRO (JP)
OOZORA HIROKI (JP)
SATO SHIGEMITSU (JP)
Application Number:
PCT/JP2011/053340
Publication Date:
August 25, 2011
Filing Date:
February 17, 2011
Export Citation:
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Assignee:
ULVAC INC (JP)
OONO TETSUHIRO (JP)
OOZORA HIROKI (JP)
SATO SHIGEMITSU (JP)
International Classes:
C23C14/24; C23C14/34; F16K51/02
Foreign References:
JPS59133365A1984-07-31
JPH06158360A1994-06-07
JPH06101782A1994-04-12
JP2009030720A2009-02-12
Attorney, Agent or Firm:
KURIHARA, Hiroyuki et al. (JP)
Hiroyuki Kurihara (JP)
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