Title:
W-TI SPUTTERING TARGET
Document Type and Number:
WIPO Patent Application WO/2016/056441
Kind Code:
A1
Abstract:
This W-Ti sputtering target has a composition containing Ti in a range of 5% by mass to 20% by mass and Fe in a range of 25 ppm by mass to 100 ppm by mass, the remainder comprising W and unavoidable impurities, and satisfies the relational expression (Femax – Femin)/(Femax + Femin) ≤ 0.25, where Femax is the maximum value of the Fe concentration and Femin is the minimum value of the Fe concentration when the Fe concentration is measured in a plurality of locations in the plane of the target.
Inventors:
NONAKA SOHEI (JP)
SAITO ATSUSHI (JP)
OHTOMO TAKESHI (JP)
SAITO ATSUSHI (JP)
OHTOMO TAKESHI (JP)
Application Number:
PCT/JP2015/077729
Publication Date:
April 14, 2016
Filing Date:
September 30, 2015
Export Citation:
Assignee:
MITSUBISHI MATERIALS CORP (JP)
International Classes:
C23C14/34; B22F5/00; C22C27/04; B22F3/14
Domestic Patent References:
| WO2013175884A1 | 2013-11-28 | |||
| WO2014148588A1 | 2014-09-25 |
Foreign References:
| JP2008218693A | 2008-09-18 | |||
| JPH03264640A | 1991-11-25 | |||
| JPH05295531A | 1993-11-09 |
Attorney, Agent or Firm:
SHIGA Masatake et al. (JP)
Masatake Shiga (JP)
Masatake Shiga (JP)
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