Title:
WAFER APPEARANCE INSPECTION DEVICE
Document Type and Number:
WIPO Patent Application WO/2014/208193
Kind Code:
A1
Abstract:
Provided is a wafer appearance inspection device with which the work of subdividing regions to be inspected and setting a sensitivity threshold value for each region can be easily executed and inspection efficiency can be improved. With a partial image region of a standard wafer serving as a template image, pattern matching is performed on an overall image region of the standard wafer, and an image calibration value is calculated. The calculated image calibration value is used to calibrate an image to be inspected. When a region for setting a threshold value out of a calibration image region displayed on a display is roughly specified, the region is automatically defined. Regions having the pattern similar to the defined region are retrieved and displayed. When a similar region is selected, an initial sensitivity threshold value is displayed, and the value is modified if modification is necessary. Regions having a set sensitivity threshold value are displayed in a display color corresponding to the determined threshold value. Inspection is executed in accordance with the set threshold value.
Inventors:
YOSHIDA MITSUHIRO (JP)
Application Number:
PCT/JP2014/061892
Publication Date:
December 31, 2014
Filing Date:
April 28, 2014
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
G01N21/956; G01B11/30; G06T1/00; H01L21/66
Foreign References:
| JP2010283088A | 2010-12-16 | |||
| JP2010522316A | 2010-07-01 | |||
| JP2004226908A | 2004-08-12 | |||
| JP2005223765A | 2005-08-18 | |||
| JP2000124281A | 2000-04-28 | |||
| JP2014022662A | 2014-02-03 | |||
| JP2012049503A | 2012-03-08 | |||
| JP2002323458A | 2002-11-08 |
Attorney, Agent or Firm:
KAICHI IP (JP)
Patent business corporation development-of-knowledge international patent firm (JP)
Patent business corporation development-of-knowledge international patent firm (JP)
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