Title:
WAFER CARRIER SYSTEM AND IMMERSION LITHOGRAPHY APPARATUS
Document Type and Number:
WIPO Patent Application WO/2020/001550
Kind Code:
A1
Abstract:
Provided is a wafer carrier system comprising a workpiece stage (81). The inside of the workpiece stage (81) is provided with several liquid flow path cavities. Each of the liquid flow path cavities is arranged to be centrally symmetric with respect to the central point of a horizontal plane of the workpiece stage (81). Temperature controlled liquid flows in opposite directions inside two adjacent liquid flow path cavities respectively. Also provided is an immersion lithography apparatus, comprising: a main frame, an illumination system, a projection objective lens, an immersion head, and the wafer carrier system. The invention resolves the issue that acceleration and deceleration motions of the workpiece stage during exposure cause immersion liquid to move and thus result in temperature fluctuation of the liquid inside the workpiece stage, thereby improving exposure performance of lithography apparatuses.
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Inventors:
ZHAO DANPING (CN)
WEI WEI (CN)
LUO JIN (CN)
WEI WEI (CN)
LUO JIN (CN)
Application Number:
PCT/CN2019/093323
Publication Date:
January 02, 2020
Filing Date:
June 27, 2019
Export Citation:
Assignee:
SHANGHAI MICRO ELECTRONICS EQUIPMENT GROUP CO LTD (CN)
International Classes:
G03F7/20
Foreign References:
| US20120013865A1 | 2012-01-19 | |||
| US8767174B2 | 2014-07-01 | |||
| KR20040075563A | 2004-08-30 | |||
| CN106463363A | 2017-02-22 | |||
| CN201926867U | 2011-08-10 | |||
| CN202905683U | 2013-04-24 | |||
| JPH0750250A | 1995-02-21 | |||
| CN103426793A | 2013-12-04 |
Attorney, Agent or Firm:
SHANGHAI SAVVY INTELLECTUAL PROPERTY AGENCY (CN)
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