Title:
WAFER DEFECT ANALYSIS SYSTEM, AND METHOD FOR CONTROLLING SAME
Document Type and Number:
WIPO Patent Application WO/2010/095848
Kind Code:
A2
Abstract:
The present invention provides a wafer defect analysis system in which substantially all processes for analyzing wafer defects are automated to significantly shorten the time taken for a wafer defect analysis and to effectively improve wafer production processes, thereby improving productivity and reducing costs. The wafer defect analysis system according to the present invention comprises: a magazine in which a plurality of wafers are accommodated; a transport device which extracts at least one wafer from the magazine and transports the extracted wafer to a predetermined location; a wafer defect decorator which stores an electrolyte containing a predetermined amount of ions, and which applies an electric field to the wafer transported and loaded by the transport device to enable ions to be adsorbed to the defect portion of the water; and a cleaning and drying device which cleans and dries the wafer transported and loaded by the transport device from the wafer defect decorator.
Inventors:
HAN, Ho (580-10, I-dongAnsan-si, Gyeonggi-do 426-857, 426-857, KR)
Application Number:
KR2010/000974
Publication Date:
August 26, 2010
Filing Date:
February 17, 2010
Export Citation:
Assignee:
HANSMACHINE INC (104-3Na, Sihwa Industrial ComplexJungwang-1-dong, Sihung-si, Gyeonggi-do 429-932, 429-932, KR)
주식회사 한스머신 (경기도 시흥시 정왕1동 1269-13 시화공단 3나 104, 429-932 Gyeonggi-do, 429-932, KR)
주식회사 한스머신 (경기도 시흥시 정왕1동 1269-13 시화공단 3나 104, 429-932 Gyeonggi-do, 429-932, KR)
International Classes:
H01L21/66
Attorney, Agent or Firm:
HUR, Dong Jin (#302, 3th Fl. 3M Bldg,1506-36 Seocho-dong, Seocho-gu, Seoul 137-070, 137-070, KR)
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