Title:
WASHING AGENT COMPOSITION FOR SUBSTRATE FOR SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/123889
Kind Code:
A1
Abstract:
One aspect provides a washing agent composition for a substrate for a semiconductor device which exhibits superior washing properties with respect to ceria and can suppress change over time in the solvency of ceria. The present disclosure relates to a washing agent composition for a substrate for a semiconductor device containing, in one aspect, a component A, a component B, a component C, and a component D. Component A: sulfuric acid; component B: ascorbic acid; component C: thiourea and/or dithiothreitol; component D: water
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Inventors:
KAYAKUBO DAISUKE
NAGANUMA JUN
NAGANUMA JUN
Application Number:
PCT/JP2017/046192
Publication Date:
July 05, 2018
Filing Date:
December 22, 2017
Export Citation:
Assignee:
KAO CORP (JP)
International Classes:
H01L21/304; C11D3/04; C11D3/20; C11D3/34; C11D7/08; C11D7/26; C11D7/34; C11D17/08
Foreign References:
| JP2015165561A | 2015-09-17 | |||
| JP2015165562A | 2015-09-17 | |||
| JP2014170927A | 2014-09-18 | |||
| JP2010535422A | 2010-11-18 | |||
| JPH11251280A | 1999-09-17 | |||
| JP2005317808A | 2005-11-10 |
Attorney, Agent or Firm:
IKEUCHI SATO & PARTNER PATENT ATTORNEYS (JP)
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