WATER-BASED HIGH-GLOSS POLISHING OIL FOR LEATHER SYNTHESIS AND PREPARATION METHOD THEREFOR

Title:

WATER-BASED HIGH-GLOSS POLISHING OIL FOR LEATHER SYNTHESIS AND PREPARATION METHOD THEREFOR

Document Type and Number:

WIPO Patent Application WO/2017/107710

Kind Code:

A1

Abstract:

Provided in the present invention is a water-based high gloss polishing oil for leather synthesis, for use in a rear-section process for leather synthesis, comprising the following constituents: 1000 molecular mass of BG-AA diol, DMPA, BDO, a reactive dimethyl silicone oil, IPDI, acetone, triethylamine, ethylenediamine, water, an aqueous defoamer, a leveling agent, and a thickener. Also provided in the present invention is a preparation method for the water-based high-gloss polishing oil for leather synthesis. The constituents of the water-based high-gloss polishing oil of the present invention coordinate and interact with each other and provides a unique post-processing touch, provides high gloss, high transmittance, clear colors, and great comprehensive effects, at the same time, a diluted spray solution thus formulated has great storage stability, and pigments do not precipitate easily. The water-based high-gloss polishing oil for leather synthesis of the present invention is a novel material for the rear-section process, is applicable in an existing leather synthesis production line, has a simple process, obviates the need to modify production equipment, and incurs no additional production costs.

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Inventors:

CHEN YONGGANG (CN)

Application Number:

PCT/CN2016/106295

Publication Date:

June 29, 2017

Filing Date:

November 17, 2016

Export Citation:

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Assignee:

JIANGSU BAOZE POLYMER MAT CO LTD (CN)

International Classes:

D06M15/572; C08G18/08; C08G18/32; C08G18/34; C08G18/40; C08G18/42; C08G18/61; C08G18/66

Foreign References:

CN105421076A	2016-03-23
CN102093530A	2011-06-15
CN103319682A	2013-09-25
CN102898613A	2013-01-30
CN104356342A	2015-02-18
CN103073692A	2013-05-01
CN103305177A	2013-09-18

Attorney, Agent or Firm:

LIAN & LIEN IP ATTORNEYS (CN)

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