Title:
WATER CARRIER FOR SEMICONDUCTOR PROCESS TOOL
Document Type and Number:
WIPO Patent Application WO2003052792
Kind Code:
A3
Abstract:
A wafer carrier (22) enabling a wafer (26) of different size and/or shape to be processed in a process tool (42) configured for processing a wafer (26) of a predetermined size and/or shape, wherein the wafer carrier (22) has such predetermined size and/or shape and includes at least one recess (20) therein having the different size and/or shape. The wafer carrier (22) enables the use in a process tool (42) (e.g., a semiconductor epitaxial thin film deposition reactor (10) such as a single wafer reactor) of differently sized wafers than those for which the process tool (42) is designed.
Inventors:
TISCHLER MICHAEL A
Application Number:
PCT/US2002/037842
Publication Date:
August 14, 2003
Filing Date:
November 25, 2002
Export Citation:
Assignee:
ADVANCED TECH MATERIALS (US)
International Classes:
H01L21/683; B65G25/00; H01L21/00; H01L21/205; H01L21/31; H01L21/68; H01L21/687; H01L; (IPC1-7): B65G25/00
Foreign References:
| US6187134B1 | 2001-02-13 | |||
| US5074017A | 1991-12-24 | |||
| US5580388A | 1996-12-03 |
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