WATER-SOLUBLE NEGATIVE ELECTRON BEAM PHOTORESIST AND IMAGING METHOD THEREOF

Title:

WATER-SOLUBLE NEGATIVE ELECTRON BEAM PHOTORESIST AND IMAGING METHOD THEREOF

Document Type and Number:

WIPO Patent Application WO/2018/196320

Kind Code:

A1

Abstract:

Disclosed is a water-soluble negative electron beam photoresist, comprising: a. a water-soluble polymer capable of self-crosslinking under an electron beam, a side chain thereof having a hydroxy group; and b. a solvent, namely water. Also disclosed is an imaging method of the water-soluble negative electron beam photoresist. The photoresist employs water as a solvent and a developing solution, and thus causes no environmental pollution, does no harm to health, and has good prospect of application.

More Like This:

JPH0721626	[Title of Invention] Resist composition for semiconductor microfabrication
JPH05257283	RADIATION-SENSITIVE HIGH MOLECULAR COMPOUND
WO/2019/130866	ACTIVE RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND

Inventors:

WENG YUYAN (CN)
CHEN GAOJIAN (CN)
LI ZHIYUN (CN)

Application Number:

PCT/CN2017/109465

Publication Date:

November 01, 2018

Filing Date:

November 06, 2017

Export Citation:

Click for automatic bibliography generation Help

Assignee:

UNIV SOOCHOW (CN)

International Classes:

G03F7/038; G03F7/00; G03F7/004

Foreign References:

CN102713755A	2012-10-03
CN1232283A	1999-10-20
CN106959584A	2017-07-18
CN107065436A	2017-08-18
CN102050908A	2011-05-11
CN1264061A	2000-08-23

Attorney, Agent or Firm:

SUZHOU FLY PATENT AGENCY (GENERAL PARTERNERSHIP) (CN)

Download PDF:

View/Download PDF PDF Help

Previous Patent: CARBON NANO-DOT PHOTORESIST WITH FLUORESCENT EFFECT, AND IMAGING METHOD THEREOF

Next Patent: LARGE-POWER WIRELESS CHARGING SYSTEM AND CONTROL METHOD THEREFOR