Title:
WAVEFRONT ABERRATION MEASURING APPARATUS AND WAVEFRONT ABERRATION MEASURING METHOD
Document Type and Number:
WIPO Patent Application WO/2012/001929
Kind Code:
A1
Abstract:
Disclosed is a wavefront aberration measuring apparatus wherein a beam splitter (3) splits light emitted from a light source (1) into measuring light (8) and reference light (12), and guides the measuring light (8) reflected by a lens (5) to be inspected and the reference light (12) to be in the same direction. An objective lens (7) collects the measuring light (8) to the lens (5), and converts the measuring light (8) reflected by the lens surface of the lens (5) into parallel light, a reference mirror (10) reflects the reference light (12) toward the beam splitter (3), the light source (1) emits the low coherence light, and the optical path length of the measuring light (8) and that of the reference light (12) accord with each other. With such configuration, influence of interference noise due to reflection light from surfaces different from the lens surface to be measured can be reduced, and the wavefront aberration of the lens surface to be measured can be highly accurately measured.
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Inventors:
MATSUZAKI, Keiichi (())
松崎 圭一 (())
松崎 圭一 (())
Application Number:
JP2011/003625
Publication Date:
January 05, 2012
Filing Date:
June 24, 2011
Export Citation:
Assignee:
PANASONIC CORPORATION (1006, Oaza Kadoma Kadoma-sh, Osaka 01, 〒5718501, JP)
パナソニック株式会社 (〒01 大阪府門真市大字門真１００６番地 Osaka, 〒5718501, JP)
MATSUZAKI, Keiichi (())
パナソニック株式会社 (〒01 大阪府門真市大字門真１００６番地 Osaka, 〒5718501, JP)
MATSUZAKI, Keiichi (())
International Classes:
G01M11/02
Attorney, Agent or Firm:
KOTANI, Etsuji et al. (Osaka Nakanoshima Building 2nd Floor, 2-2 Nakanoshima 2-chome, Kita-ku, Osaka-sh, Osaka 05, 〒5300005, JP)
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