Title:
WAVEFRONT ABERRATION MEASURING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2011/125971
Kind Code:
A1
Abstract:
Disclosed is a wavefront aberration measuring apparatus which comprises: an illumination optical system disposed on an incident side of a lens to be detected; and a measurement optical system disposed on an emission side of the lens to be detected, wherein the illumination optical system has an openable and closeable aperture diaphragm and is movable along the optical axis of the illumination optical system such that the aperture diaphragm and an entrance pupil surface of the lens to be detected are adjusted to positions which have an optically conjugate relationship with each other. Accordingly, the wavefront aberration measuring apparatus can suppress errors in measurement results.
Inventors:
OTAKI, Tatsuro (12-1 Yurakucho 1-chome, Chiyoda-k, Tokyo 31, 〒1008331, JP)
Application Number:
JP2011/058509
Publication Date:
October 13, 2011
Filing Date:
April 04, 2011
Export Citation:
Assignee:
NIKON CORPORATION (12-1, Yurakucho 1-chome Chiyoda-k, Tokyo 31, 〒1008331, JP)
株式会社ニコン (〒31 東京都千代田区有楽町１丁目１２番１号 Tokyo, 〒1008331, JP)
株式会社ニコン (〒31 東京都千代田区有楽町１丁目１２番１号 Tokyo, 〒1008331, JP)
International Classes:
G01M11/02
Attorney, Agent or Firm:
INOUE, Yoshio (3F Garoh Bldg, 1-4 Nihonbashi 3-chome, Chuo-k, Tokyo 27, 〒1030027, JP)
Claims: