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Title:
WAVEFRONT ERROR MEASUREMENT APPARATUS AND MEASUREMENT METHOD FOR OPTIMIZING PHASE RETRIEVAL ON THE BASIS OF EXTENDED NIJBOER-ZERNIKE MODE
Document Type and Number:
WIPO Patent Application WO/2021/008606
Kind Code:
A1
Abstract:
A wavefront error measurement apparatus for optimizing phase retrieval on the basis of an extended Nijboer-Zernike mode. The apparatus comprises a point light source (1), a half mirror (2), a lens to be measured (3), a planar reflecting mirror (4), and an image sensor (5), which are arranged in sequence. A wavefront error of an element to be measured is represented by using Zernike polynomials, and a Zernike polynomials coefficient is solved on the basis of an extended Nijboer-Zernike diffraction theory, such that one-step full-aperture wavefront error measurement of a large-aperture optical element can be realized. In addition, the accurate recovery of a wavefront error can be realized by using a partial overexposed image, and also conflict between non-overexposure and a high signal-to-noise ratio caused by a limited dynamic range when the image sensor (5) acquires an image is overcome. The measurement experimental apparatus is simple, and has low requirements for an experimental environment. The measurement method is quick and simple, and compared with a traditional iterative phase retrieval method, the method requires a small amount of calculation, and has a high measurement accuracy, and has a strong anti-noise performance.

Inventors:
BAI JIAN (CN)
ZHAO LEI (CN)
LU BINJIE (CN)
HUANG XIAO (CN)
ZHOU XIANGDONG (CN)
HOU JING (CN)
Application Number:
PCT/CN2020/102651
Publication Date:
January 21, 2021
Filing Date:
July 17, 2020
Export Citation:
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Assignee:
UNIV ZHEJIANG (CN)
International Classes:
G01M11/02
Foreign References:
CN110375964A2019-10-25
CN102252763A2011-11-23
CN103033260A2013-04-10
CN108225187A2018-06-29
CN207850322U2018-09-11
JP2002206990A2002-07-26
US6911637B12005-06-28
Other References:
SHAO, JING ET AL.: "Testing optical system with high NA based on phase retrieval", JOURNAL OF APPLIED OPTICS, vol. 34, no. 1, 31 January 2013 (2013-01-31), XP055773933
Attorney, Agent or Firm:
FANG & ASSOCIATES (CN)
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