Title:
WAVELENGTH SCANNING ANALYSIS APPARATUS AND METHOD
Document Type and Number:
WIPO Patent Application WO/2015/093599
Kind Code:
A1
Abstract:
Provided are an analysis apparatus and an analysis method for reliably eliminating the effects of components that interfere with measurement and improving the accuracy of measuring a component to be measured. Light from a light source is scanned in a specific scanning band at a predetermined scanning frequency by an interference filter (12), and the light is irradiated on a sample solution. The light that has passed through an optical cell (18) is converted into an electrical signal by a photodetector (20). A processing unit (22) performs fast Fourier transformation on the signal, and quantifies the component to be measured using the intensity of a specific harmonic component among the harmonic components of the scanning frequency, e.g., the second-order or third-order harmonic. Which harmonic component to use is determined in accordance with the component to be measured and components that interfere with measurement.
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Inventors:
FUJIWARA MASATO (JP)
LU RONGFU (JP)
WATANABE ATSUO (JP)
LU RONGFU (JP)
WATANABE ATSUO (JP)
Application Number:
PCT/JP2014/083727
Publication Date:
June 25, 2015
Filing Date:
December 19, 2014
Export Citation:
Assignee:
NIKKISO CO LTD (JP)
International Classes:
G01N21/359
Foreign References:
| JP2010164375A | 2010-07-29 | |||
| JP3532870B2 | 2004-05-31 | |||
| JP2013134239A | 2013-07-08 | |||
| JP2008513736A | 2008-05-01 |
Attorney, Agent or Firm:
YKI Patent Attorneys (JP)
Patent business corporation YKI international patent firm (JP)
Patent business corporation YKI international patent firm (JP)
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