Title:
WAVELENGTH SELECTIVE ABSORPTION MATERIAL, INFRARED SENSOR, WAVELENGTH SELECTIVE LIGHT SOURCE, AND RADIATIVE COOLING SYSTEM
Document Type and Number:
WIPO Patent Application WO/2019/189418
Kind Code:
A1
Abstract:
The present disclosure provides a wavelength selective absorption material which sequentially comprises, in the following order: a base material; a reflective layer; a high refractive index layer which has a thickness d of from 30 nm to 1,000 nm and a refractive index n of 3.0 or more for infrared light having a wavelength of from 8 μm to 13 μm, and which contains a binder and flattened metal particles; and an infrared absorption layer which has a maximum absorption wavelength at a wavelength of from 8 μm to 13 μm. This wavelength selective absorption material is configured such that the product (n × d) of the refractive index n and the thickness d is more than 1,000 but less than 4,875.
Inventors:
YASUDA HIDEKI (JP)
Application Number:
PCT/JP2019/013285
Publication Date:
October 03, 2019
Filing Date:
March 27, 2019
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G02B5/22; G02B5/26
Domestic Patent References:
| WO2017169506A1 | 2017-10-05 | |||
| WO2016117436A1 | 2016-07-28 | |||
| WO2011152147A1 | 2011-12-08 | |||
| WO2017068789A1 | 2017-04-27 | |||
| WO2019058833A1 | 2019-03-28 | |||
| WO2018180221A1 | 2018-10-04 |
Foreign References:
| JPH0713018A | 1995-01-17 | |||
| JP2005144985A | 2005-06-09 | |||
| US20060023327A1 | 2006-02-02 | |||
| US20150338175A1 | 2015-11-26 |
Attorney, Agent or Firm:
TAIYO, NAKAJIMA & KATO (JP)
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