Title:
WET CLEANING DEVICE AND WET CLEANING METHOD
Document Type and Number:
WIPO Patent Application WO/2017/164362
Kind Code:
A1
Abstract:
The present invention makes it possible, in a wet cleaning process using carbon dioxide gas-dissolved water, to achieve a high degree of removal of ultrafine particles mixed in the carbon dioxide gas-dissolved water to prevent particulate contamination, thereby enabling high-purity cleaning of an object to be cleaned. A wet cleaning device for cleaning an object to be cleaned using carbon dioxide gas-dissolved water in which carbon dioxide gas is dissolved in ultra pure water comprises: a carbon dioxide gas dissolving means which dissolves carbon dioxide gas in ultra pure water; a cleaning means for the object to be cleaned to which the carbon dioxide gas-dissolved water is supplied from the carbon dioxide gas dissolving means; and a filtering membrane module which is disposed in a pipe for supplying the carbon dioxide gas-dissolved water to the cleaning means and which is filled with a porous membrane including a cationic functional group.
Inventors:
IINO HIDEAKI (JP)
NAKATA KOJI (JP)
KANEDA MASAYUKI (JP)
SATO DAISUKE (JP)
NAKATA KOJI (JP)
KANEDA MASAYUKI (JP)
SATO DAISUKE (JP)
Application Number:
PCT/JP2017/011990
Publication Date:
September 28, 2017
Filing Date:
March 24, 2017
Export Citation:
Assignee:
KURITA WATER IND LTD (JP)
ASAHI CHEMICAL IND (JP)
ASAHI CHEMICAL IND (JP)
International Classes:
H01L21/304; B01D61/14; B01D71/26; B01D71/56; B01D71/68; B01D71/76; B01F1/00; B01J41/07; B01J41/13; B01J41/14; B01J47/12; C02F1/44
Domestic Patent References:
| WO2014178289A1 | 2014-11-06 |
Foreign References:
| JP2014173013A | 2014-09-22 | |||
| JPH09141262A | 1997-06-03 |
Attorney, Agent or Firm:
SHIGENO, Tsuyoshi et al. (JP)
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