Title:
WET ETCHING SOLUTION COMPOSITION, WET ETCHING METHOD FOR GLASS, AND GLASS PATTERNED BY WET ETCHING METHOD
Document Type and Number:
WIPO Patent Application WO/2023/068395
Kind Code:
A1
Abstract:
A wet etching method of the present invention comprises: cleaning glass; wet-etching the cleaned glass to form a nano-scale pattern; and cleaning and drying the nano-patterned glass, wherein a wet etching solution used in the wet etching step may include hydrofluoric acid and a surfactant, and oxalic acid and acetic acid. According to the present invention, glass with high transmittance/low reflectance can be provided. The glass can be used in displays and optical devices, including mobile devices.
Inventors:
LEE SANG-RO (KR)
IGARASHI KATSUSHI (JP)
IGARASHI KATSUSHI (JP)
Application Number:
PCT/KR2021/014601
Publication Date:
April 27, 2023
Filing Date:
October 19, 2021
Export Citation:
Assignee:
LEE SANG RO (KR)
IGARASHI KATSUSHI (JP)
IGARASHI KATSUSHI (JP)
International Classes:
C03C15/00; C03C23/00; C09K13/04
Foreign References:
| KR101842083B1 | 2018-03-29 | |||
| KR20150114059A | 2015-10-12 | |||
| KR20080071708A | 2008-08-05 | |||
| KR20170096724A | 2017-08-25 | |||
| KR20120044408A | 2012-05-08 |
Attorney, Agent or Firm:
HAW, Yong Noke (KR)
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