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Title:
X-RAY DIFFRACTION MEASURING DEVICE AND X-RAY DIFFRACTION MEASURING METHOD
Document Type and Number:
WIPO Patent Application WO/2016/152654
Kind Code:
A1
Abstract:
The objective of the present invention is to provide an X-ray diffraction measuring device and an X-ray diffraction measuring method with which it is possible to perform X-ray diffraction measurement of a sample using a desired shape, and with which the measuring accuracy can be improved. An X-ray diffraction measuring device 1 is provided with: a sample rotating unit 22 which rotates about a prescribed first axis of rotation C1, thereby causing a sample 10 to rotate within a prescribed plane; an X-ray source 3 which radiates X-rays toward the rotating sample 10; a diffracted X-ray detecting unit 4 which moves along a circular arc trajectory f centered about a second axis of rotation C2 which intersects the X-ray optical axis C0 at right angles, thereby detecting diffracted X-rays 12 which have been transmitted through the sample 10 and have been diffracted; and an axis inclining mechanism 5 which causes the first axis of rotation C1 to be inclined through a prescribed acute angle θ relative to the optical axis C0, about the center of the sample 10, in a virtual plane containing the optical axis C0 and the second axis of rotation C2.

Inventors:
KAWAGUCHI TOMOYA (JP)
MATSUBARA EIICHIRO (JP)
FUKUDA KATSUTOSHI (JP)
Application Number:
PCT/JP2016/058151
Publication Date:
September 29, 2016
Filing Date:
March 15, 2016
Export Citation:
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Assignee:
UNIV KYOTO (JP)
International Classes:
G01N23/20
Foreign References:
JP2004294136A2004-10-21
JPH06229951A1994-08-19
JP2005265566A2005-09-29
JPH01214747A1989-08-29
JPH05322806A1993-12-07
JP2002039970A2002-02-06
Attorney, Agent or Firm:
SunCrest Patent and Trademark Attorneys (JP)
Patent business corporation Sun Crest international patent firm (JP)
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