Title:
X-RAY GENERATING DEVICE AND EXPOSURE DEVICE
Document Type and Number:
WIPO Patent Application WO/2004/030423
Kind Code:
A1
Abstract:
A liquid jet X-ray generating device (1), wherein a nozzle (11) and a mirror (15) are disposed in a light source chamber (10), a flange member (20) is installed on the outer wall part of the light source chamber (10), and the base end side of a pipe (13) for the nozzle (11) is fitted to the flange member (20) so that the nozzle (11) can be removed to the outside of the light source chamber (10) by removing the member (20), whereby the nozzle (11) as a most frequently replaced element can be replaced by merely removing the flange member (20), and the mirror (15) less frequently replaced than the nozzle (11) must not be removed.
Inventors:
SHIRAISHI MASAYUKI (JP)
Application Number:
PCT/JP2003/009398
Publication Date:
April 08, 2004
Filing Date:
July 24, 2003
Export Citation:
Assignee:
NIKON CORP (JP)
SHIRAISHI MASAYUKI (JP)
SHIRAISHI MASAYUKI (JP)
International Classes:
G03F7/20; H05G2/00; (IPC1-7): H05G2/00
Foreign References:
| JP2002252162A | 2002-09-06 | |||
| JP2000047000A | 2000-02-18 | |||
| JP2000091216A | 2000-03-31 |
Other References:
See also references of EP 1545168A4
Attorney, Agent or Firm:
Watanabe, Atsushi (1-20-10-203 Takadanobab, Shinjuku-ku Tokyo, JP)
Download PDF:
Previous Patent: CONTROL CIRCUIT FOR CONTROLLING AN ELECTRON EMISSION DEVICE
Next Patent: PARTICLE ACCELERATOR HAVING WIDE ENERGY CONTROL RANGE
Next Patent: PARTICLE ACCELERATOR HAVING WIDE ENERGY CONTROL RANGE