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Patent Searching and Data


Title:
X-RAY SOURCE AND X-RAY IMAGING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2019/158765
Kind Code:
A3
Abstract:
An X-ray source (10) for emitting an X-ray beam (101) is proposed. The X- ray source (10) comprises an anode (12) and an emitter arrangement (14) comprising a cathode (16) for emitting an electron beam (15) towards the anode (12) and an electron optics (18) for focusing the electron beam (15) at a focal spot (20) on the anode (12). The X-ray source (10) further comprises a controller (22) configured to determine a switching action of the emitter arrangement (14) and to actuate the emitter arrangement (14) to perform the switching action, the switching action being associated with a change of at least one of a position of the focal spot (20) on the anode (12), a size of the focal spot (20), and a shape of the focal spot (20). The controller (22) is further configured to predict before the switching action is performed, based on the determined switching action, the size and the shape of the focal spot (20) expected after the switching action. Further, the controller (22) is configured to actuate the electron optics (18) to compensate for a change of the size and the shape of the focal spot (20) induced by the switching action.

Inventors:
STEADMAN BOOKER, Roger (High Tech Campus 5, 5656 AE Eindhoven, 5656 AE, NL)
VOGTMEIER, Gereon (High Tech Campus 5, 5656 AE Eindhoven, 5656 AE, NL)
Application Number:
EP2019/054011
Publication Date:
September 26, 2019
Filing Date:
February 19, 2019
Export Citation:
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Assignee:
KONINKLIJKE PHILIPS N.V. (High Tech Campus 5, 5656 AE Eindhoven, 5656 AE, NL)
International Classes:
H01J35/14; H05G1/26; H05G1/52; H05G1/56; H05G1/58
Foreign References:
US20070274457A12007-11-29
Attorney, Agent or Firm:
VAN LIEMPD, Jan et al. (Philips International B.V. – Intellectual Property & Standards High Tech Campus 5, 5656 AE Eindhoven, 5656 AE, NL)
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