X-RAY SOURCES USING LINEAR ACCUMULATION

Title:

X-RAY SOURCES USING LINEAR ACCUMULATION

Document Type and Number:

WIPO Patent Application WO/2015/084466

Kind Code:

A3

Abstract:

This application discloses a compact source for high brightness x-ray generation. Higher brightness is achieved through electron beam bombardment of multiple regions aligned with each other to achieve a linear accumulation of x-rays. This is achieved by aligning discrete x-ray emitters, or through use of novel x-ray targets comprising a number of microstructures of x-ray generating materials fabricated in close thermal contact with a substrate with high thermal conductivity. This allows heat to be more efficiently drawn out of the x-ray generating material, and allows bombardment of this material with higher electron density and/or higher energy electrons, leading to greater x-ray brightness. The orientation of the microstructures allows the use of an on-axis collection angle, allowing accumulation of x-rays from several microstructures to be aligned, appearing to have a single origin, also known as "zero-angle" x-ray emission.

Inventors:

YUN WENBING (US)
LEWIS SYLVIA JIA YUN (US)
KIRZ JANOS (US)
LYON ALAN FRANCIS (US)

Application Number:

PCT/US2014/056688

Publication Date:

July 30, 2015

Filing Date:

September 19, 2014

Export Citation:

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Assignee:

SIGRAY INC (US)

International Classes:

H01J35/14; H05G1/32

Foreign References:

EP1028451A1	2000-08-16
US20110135066A1	2011-06-09
US20050074094A1	2005-04-07
JP2007265981A	2007-10-11
JP2007311185A	2007-11-29

Other References: