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Patent Searching and Data


Title:
ZIRCONIUM, HAFNIUM, TITANIUM PRECURSORS AND DEPOSITION OF GROUP 4 CONTAINING FILMS USING THE SAME
Document Type and Number:
WIPO Patent Application WO/2018/122603
Kind Code:
A3
Abstract:
Group 4 transition metal-containing film forming compositions are disclosed comprising Group 4 transition metal precursors having the formula: L2-M-C4AR3-3-[(ER2)m-(ER2)n-L']-, L2-M-(C3(m-A2)R2-4-[(ER2)m- (ER2)n-L']-, L2-M-(C5AR4-4-[(ER2)m-(ER2)n-L'], and L2-M-(C4(m- A2)R3-4-[(ER2)m-(ER2)n-L']-, wherein M is Ti, Zr, or Hf; each A is independently N, Si, B or P; each E is independently C, Si, B or P; m and n is independently 0, 1 or 2; m + n >1; each R is independently a H or a C1-C4 hydrocarbon group; each L is independently a -1 anionic ligand selected from the group consisting of NR'2, OR', Cp, amidinate, β- diketonate, or keto-iminate, wherein R' is a H or a C1-C4 hydrocarbon group; and L' is NR" or O, wherein R' is a H or a C1-C4 hydrocarbon group. Also disclosed are methods of synthesizing and using the disclosed precursors to deposit Group 4 transition metal-containing films on one or more substrates via vapor deposition processes.

Inventors:
GATINEAU SATOKO (KR)
NOH WONTAE (KR)
KIM DAEHYEON (KR)
GATINEAU JULIE (KR)
GIRARD JEAN-MARC (FR)
Application Number:
PCT/IB2017/001658
Publication Date:
January 10, 2019
Filing Date:
December 14, 2017
Export Citation:
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Assignee:
AIR LIQUIDE (FR)
GATINEAU SATOKO (KR)
NOH WONTAE (KR)
KIM DAEHYEON (KR)
GATINEAU JULIE (KR)
GIRARD JEAN MARC (FR)
International Classes:
C23C16/455; C04B35/622; C07F17/00; C23C16/06; C23C16/50
Foreign References:
US20130337659A12013-12-19
US20150255276A12015-09-10
KR20140078534A2014-06-25
US5621127A1997-04-15
US20170107612A12017-04-20
Attorney, Agent or Firm:
DE BEAUFORT, François-Xavier (FR)
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