$g(b)-DIKETONATOCOPPER(I) COMPLEX CONTAINING ALLENE COMPOUND AS LIGAND AND PROCESS FOR PRODUCING THE SAME

Title:

$g(b)-DIKETONATOCOPPER(I) COMPLEX CONTAINING ALLENE COMPOUND AS LIGAND AND PROCESS FOR PRODUCING THE SAME

Document Type and Number:

WIPO Patent Application WO/2001/068580

Kind Code:

A1

Abstract:

A $g(b)-diketonatocopper(I) complex which contains an allene compound as a ligand (L) and is represented by the formula (2), wherein R¿6? and R¿7? may be the same or different and each represents linear or branched C¿1-4? alkyl, C¿1-4? alkoxy, or linear or branched C¿1-4? fluoroalkyl; R¿8? represents hydrogen or fluorine; and L represents an allene compound. It is useful in forming a thin copper film by metal-organic chemical vapor deposition (hereinafter abbreviated as MOCVD).

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Inventors:

WATANABE HISAYUKI (JP)
MUSASHI HIDEKI (JP)
KAWAMURA YASUO (JP)

Application Number:

PCT/JP2001/001956

Publication Date:

September 20, 2001

Filing Date:

March 13, 2001

Export Citation:

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Assignee:

NISSAN CHEMICAL IND LTD (JP)
WATANABE HISAYUKI (JP)
MUSASHI HIDEKI (JP)
KAWAMURA YASUO (JP)

International Classes:

C07C45/77; C07C49/92; C07F1/08; C07F7/08; C23C16/18; (IPC1-7): C07C49/92; C07C45/77; C07C11/14; C07C13/02; C07F7/08

Foreign References:

EP0498269A2	1992-08-12
EP0533070A2	1993-03-24
EP0493754A1	1992-07-08

Attorney, Agent or Firm:

Hanabusa, Tsuneo c/o Hanabusa, Patent Office (Ochanomizu Square B 6 Kandasurugadai 1-chome Chiyoda-ku, Tokyo, JP)

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