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WO/1992/014703A1 |
A process for transforming a carbonyl compound into its corresponding epoxide, which comprises contacting the carbonyl compound with either trimethylsulphonium hydrogen sulphate and/or bis(trimethylsulphonium) sulphate or trimethylsulpho...
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WO/1992/011237A1 |
The invention relates to sulphonyl formamidoximes of formula (I) or their tautomers (II) in which: R?1¿ and R?2¿ are mutually independently hydrogen, possibly substituted alkyl, alkenyl, alkinyl, cycloalkyl, benzyl or phenyl; R?1¿ is ...
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WO/1992/006683A1 |
The present invention relates to a method of treating a retrovirus utilizing a compound of the formula (I): (R¿2?)¿n?R¿1?-Ar-X-Y-R(T¿1?)(T¿2?)¿m?. The present invention also relates to pharmaceutical compositions in which the activ...
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WO/1992/003050A1 |
Fungicidally effective compounds of formula (I) are disclosed.
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WO/1991/016299A1 |
A method for control of plant disease, especially fungus, using compounds of formula (I) and novel compounds within the class, wherein: A is C(=O)R, C(=O)OR1, C(=O)SR1, P(=O)QR2Q1R3; C(=O)NHR, SO2R5, SO2NR6R7; Q and Q1 are independently ...
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WO/1991/010648A1 |
Compounds of formula (I), wherein R and R1 are H or C1-C4 alkyl; and X is a group of formulae (II) or (III), wherein either R2 is H or C1-C4 alkyl and R3 is C1-C4 alkyl, or R2 and R3 represent -(CH2)r- wherein r is from 2 to 5; R4 is C1-...
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WO/1991/008198A1 |
This invention relates to optical elements capable of second harmonic generation and novel compositions for use in such optical elements comprising polar molecules placed in noncentrosymmetric configuration wherein such optical element h...
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WO/1991/007382A1 |
Substituted semicarbazones of formula (I), wherein Q, X, R¿1?, R¿5?, R¿6? and m are as defined in the text; including all geometric and stereoisomers thereof, agricultural compositions containing them and their use as arthropodicides.
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WO/1991/006039A2 |
Sulfonium, selenonium, arsonium, ammonium and phosphonium salts, useful as photoinitiators, comprise: a chromophore which absorbs visible radiation, the chromophore (1) having a removable positive hydrogen ion and (2) exhibiting a higher...
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WO/1991/006039A1 |
Sulfonium, selenonium, arsonium, ammonium and phosphonium salts, useful as photoinitiators, comprise: a chromophore which absorbs visible radiation, the chromophore (1) having a removable positive hydrogen ion and (2) exhibiting a higher...
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WO/1990/015795A1 |
The invention relates to a process for the preparation of guanidine-derivatives of general formula (I), wherein R means a C1-4 alkyl group, M means a hydrogenatom, sodium-, potassium-, or calcium ion, A means an -S-, -SO-, or -SO2-group;...
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WO/1990/012784A1 |
A method for control of plant disease, especially fungus, using compounds of formula (I) and novel compounds within the class (I), wherein: A is C(=O)R, C(=O)OR?1¿, C(=O)SR?1¿, P(=O)QR?2¿Q?1¿R?3¿; C(=O)NHR, SO¿2?R?5¿, SO¿2?NR?6¿...
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WO/1990/007495A1 |
Certain substituted semicarbazones, including all geometric and stereoisomers thereof, agricultural compositions containing them and their use as arthropodicides.
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WO/1989/009205A1 |
This invention relates to certain S-substituted homocysteine sulfoximines and their uses. Buthionine sulfoximine (BSO) appears to have significant uses for chemotherapy and radio therepy, especially combination chemotherapy and radiation...
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WO/1989/003836A1 |
Novel factors isolated and purified from animal tissue or fluid that are associated with essential hypertension are disclosed as well as analogues and derivatives thereof. Novel isolation and resolution methods. Biochemical assay methods...
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WO/1989/000422A2 |
Thiosulphinic acid derivatives, drugs containing these compounds, and their medicinal use. It has been discovered that thiosulphinic acid derivatives possess excellent anti-inflammatory properties. These compounds are particularly advant...
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WO/1988/010251A1 |
Ary sulfur pentafluorides having the formula (I), where R, A, Z, n, m and X° have the meaning given in claim 1, are useful components of liquid crystalline phases for field and/or bistability effect displays.
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WO/1988/008008A2 |
Hydrocarbon compositions, including oligomers and polymers, for use in improving the thermo-oxidative stability and the dispersancy and viscosity index improvement (for high molecular weight) properties of fuels and lubricating oils are ...
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WO/1987/006932A1 |
Process for the production of asymmetrical olefines from prochiral symmetrical ketones by addition of lithiosulfoximin from n-butyllithium and N-substituted S-methyl-S-phenyl-sulfoximine derivatives and subsequent reaction with n-butylli...
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WO/1986/005950A1 |
Sulfur-linked bis alkylthio alkylimino N-alkyl carbamate pesticides can be stabilized against thermal decomposition induced and accelerated by a variety of contaminants by incorporation of a substantially non-alkaline inorganic compound,...
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WO/1985/004168A1 |
New soft beta-adrenergic blocking agents, useful in the treatment or prevention of cardiovascular disorders and in the treatment of glaucome, have formula (I), wherein n is an integer from 0 to 10; R is C6-C12 cycloalkyl-CpH2p-, C6-C18 p...
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WO/1985/000167A1 |
The present invention relates particularly to chemical compounds having the formula (I), R1-CO-NR3- ADA BD-S-R2 wherein R1 is a radical corresponding to an amino acid R1-COOH, ADA BD is an alkylene radical at C2 or C3 which may be substi...
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WO/1981/000713A1 |
Method of preparing thiobiscarbamates by reacting nitrogen-containing heterocyclic base and sulfur monochloride or sulfur dichloride and reacting the resulting base-sulfur chloride adduct with carbamate to form thiobiscarbamates.
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JP2024515258A |
Metal complex of general formula (I): Cyc LMZp(I) where M is a metal selected from the group consisting of titanium, zirconium, and hafnium; Cyc is selected from cyclopentadienyl, indenyl, and fluorenyl; Z is an anionic ligand, and L is ...
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JP2024043941A |
[Problem] A chemically amplified resist composition using an acid as a catalyst, which has higher sensitivity, can improve line LWR and hole CDU, and has excellent etching resistance after pattern formation. Provides an onium salt type m...
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JP2024045065A |
The present invention provides a salt, an acid generator, and a resist composition that can produce a resist pattern with good CD uniformity. A salt represented by formula (I), an acid generator, and a resist composition. [In the formula...
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JP2024038872A |
[Problems] A resist composition that can achieve high sensitivity and have good lithography properties, a resist pattern forming method using the resist composition, a polymer compound useful for the resist composition, and a method for ...
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JP2024037706A |
The present invention provides a resist composition and the like that can produce a resist pattern with good CD uniformity. An acid generator, etc. and a resist composition containing a salt represented by formula (I) or a structural uni...
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JP2024037707A |
The present invention provides a resist composition and the like that can produce a resist pattern with good CD uniformity. An acid generator, etc. and a resist composition containing a salt represented by formula (I) or a structural uni...
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JP2024037169A |
An object of the present invention is to provide a salt, an acid generator, a resist composition, etc. that can produce a resist pattern with good CD uniformity. A salt represented by formula (I), an acid generator and a resist compositi...
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JP2024035201A |
An object of the present invention is to provide a salt, an acid generator, a resist composition, etc., which can produce a resist pattern having good resistance to pattern collapse. A salt represented by formula (I), an acid generator a...
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JP7449064B2 |
To provide a compound capable of producing an excellent CD-uniformity (CDU) resist pattern, a resin, and a resist composition containing the resin.Provided are the salt, the acid generator represented by formula (I), and the resist compo...
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JP2024035193A |
An object of the present invention is to provide a salt, an acid generator, a resist composition, etc., which can produce a resist pattern having good line edge roughness. A salt represented by formula (I), an acid generator and a resist...
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JP2024035177A |
The present invention provides a resist composition capable of forming a resist pattern with good line edge roughness (LER). A salt represented by formula (I), an acid generator containing the salt, and a resist composition. [In formula ...
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JP2024035176A |
An object of the present invention is to manufacture a resist pattern with good CD uniformity (CDU). [Solution] An acid generator containing a salt represented by formula (I). In formula (I), Za+and Zb+each independently represents a gro...
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JP2024035178A |
The present invention provides a resist composition capable of forming a resist pattern with good resolution. [Solution] An acid generator containing a salt represented by formula (I). Xc1and Xc2is a sulfur atom or an iodine atom, Rc1and...
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JP2024035179A |
An object of the present invention is to manufacture a resist pattern with good resolution. [Solution] An acid generator containing a salt represented by formula (I). [Selection diagram] None
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JP2024032658A |
The present invention provides a carboxylic acid salt, a photoresist composition containing the same, and a pattern forming method using the photoresist composition. [Solution] A carboxylic acid salt represented by the following chemical...
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JP7446357B2 |
This resist composition contains a resin component (A1) having: a constitutional unit (a01) derived from a compound represented by general formula (a0-1); and a constitutional unit (a02) including a lactone-containing cyclic group or the...
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JP7446352B2 |
The present invention provides a resist composition which contains a base material component (A) and a compound (B0) that is represented by general formula (b0). In the formula, Rpg represents an acid-decomposable group; Rl0 represents a...
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JP2024031893A |
An object of the present invention is to provide a resist composition etc. that can produce a resist pattern having good CD uniformity. The present invention provides an acid generator, a resin, etc., and a resist composition containing ...
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JP2024031894A |
The present invention provides a resist composition and the like that can produce a resist pattern having good line edge roughness. A carboxylic acid generator, a resin, etc., and a resist composition each having a carboxylic acid salt h...
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JP2024031937A |
The present invention provides a carboxylic acid salt, a carboxylic acid generator, a resist composition, etc., which can produce a resist pattern with good CD uniformity. A carboxylic acid salt represented by formula (I), a carboxylic a...
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JP2024031931A |
An object of the present invention is to provide a salt, an acid generator, a resist composition, etc., which can produce a resist pattern having good line edge roughness. A salt represented by formula (I), an acid generator, and a resis...
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JP2024029638A |
The present invention provides a resist composition, a method for forming a resist pattern, and a novel acid generator component used in the resist composition, which can achieve high sensitivity when forming a resist pattern and suppres...
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JP2024029637A |
The present invention provides a resist composition, a method for forming a resist pattern, and a novel base component for use in the resist composition, which can achieve high sensitivity when forming a resist pattern and suppress film ...
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JP7441642B2 |
To provide a salt capable of producing a resist pattern having good line edge roughness (LER), an acid generator, and a resist composition containing the acid generator.The salt represented by formula (I), the acid generator, and the res...
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JP7441947B2 |
The present disclosure provides methods for preparing MCL1 inhibitors or a salt thereof and related key intermediates.
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JP2024026964A |
An object of the present invention is to provide an onium salt for use in a resist composition that has high sensitivity and excellent resolution, improves roughness and dimensional uniformity, and can suppress collapse of a resist patte...
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JP2024026915A |
[Problem] Used in a chemically amplified resist composition that has excellent solvent solubility, high sensitivity, high contrast, and excellent lithography performance such as exposure latitude and line width roughness in photolithogra...
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