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JP7310724B2 |
An onium salt containing an anion having formula (A1) and a cation having formula (A1-a), (A1-b) or (A1-c) is provided. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of goo...
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JP2023100659A |
To provide a salt which allows a resist pattern to be produced with good line edge roughness (LER).Specifically, there is provided a salt represented by, e.g., formula (I-1).SELECTED DRAWING: None
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JP2023100758A |
To provide a carbamoyl phenylalaninol analog, and a method using the same material for treating the fault.A compound of formula I or a pharmaceutically acceptable salt thereof is provided. (Wherein, X is CH2, O, NH, S; Y is C=O, C=S, SO2...
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JP2023100005A |
To provide a resin and a resist composition which allow a resist pattern having good line edge roughness to be produced.There are provided: a resin containing a structural unit represented by formula (I1) and a structural unit represente...
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JP2023100006A |
To provide a resist composition from which a resist pattern having good CD uniformity can be produced.The resist composition contains a resin (A1) containing a structural unit represented by formula (I1) and a resin (A2) containing a str...
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JP2023100003A |
To provide a resin and a resist composition which allow a resist pattern having good resolution to be produced.There are provided: a resin containing structural units of formula (I1) and formula (I2); and a resist composition.SELECTED DR...
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JP2023100004A |
To provide a resist composition from which a resist pattern having good pattern collapse resistance can be produced.The resist composition contains a resin (A1) containing a structural unit represented by formula (I1) and a resin (A2) co...
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JP7306434B2 |
To provide a salt capable of producing a resist pattern with a good mask error factor (MEF) and a resist composition containing the salt.The salt has an anion represented by formula (aa2) [where Xa and Xb each independently represent an ...
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JP2023096529A |
To provide a resist composition that exhibits excellent lithography properties such as CDU and LWR without impairing its sensitivity in photo-lithography using high-energy rays, an acid diffusion inhibitor for use therein, and a patterni...
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JP2023088870A |
To provide a carboxylate which allows a resist pattern having good CD uniformity to be produced, and a resist composition containing the same.There are provided: a carboxylate represented by formula (I); and a carboxylic acid generator a...
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JP2023088869A |
To provide a salt which allows a resist pattern having good line edge roughness to be produced, and a resist composition containing the same.There are provided: a salt represented by formula (I); and an acid generator and a resist compos...
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JP2023086690A |
To provide a salt allowing a resist pattern having good CD uniformity to be produced, an acid generator, and a resist composition containing the same.A salt is represented by a formula (I), and an acid generator and a resist composition ...
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JP7295691B2 |
To provide a resist composition with which a resist pattern having good line edge roughness (LER) can be produced.The resist composition comprises: an acid generator; a resin containing at least one structural unit selected from the grou...
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JP2023081849A |
To provide salt, an acid generator, and a resist composition including the same, with which it is possible to manufacture a resist pattern having good CD uniformity (CDU).Salt has a specific structure that triphenylsulfonium cation has, ...
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JP7289669B2 |
To provide a salt and a resist composition capable of producing a resist pattern with good CD uniformity (CDU).A carboxylate is represented by formula (I), and the resist composition contains the carboxylate. [In the formula, Xrepresents...
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JP2023081337A |
To provide a salt that enables production of a resist pattern having good resistance to pattern collapse, an acid generator, and a resist composition including the same.Salt represented by formula (I), an acid generator including the sal...
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JP7288814B2 |
To provide a salt capable of producing a resist pattern having good CD uniformity.The salt is represented by formula (I) [where Qand Qeach independently represent a fluorine atom or the like; Rand Reach independently represent a hydrogen...
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JP7285695B2 |
To provide a novel compound useful as an acid generator for a resist composition, an acid generator using the compound, a resist composition containing the acid generator, and a resist pattern forming method using the resist composition....
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JP2023076402A |
To provide a salt, a resin, and a resist composition which allow a resist pattern having a good focus margin (DOF) to be produced.There are provided: a salt having an ethylenically polymerizable group represented by a specific formula, a...
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JP2023076400A |
To provide a carboxylate and the like which allow a resist pattern having a good mask error factor to be produced, and a resist composition.There are provided: a substituted triphenylsulfonium carboxylate having a polymerizable group rep...
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JP7285126B2 |
To provide a salt, an acid generator and a resist composition that make it possible to produce a resist pattern having excellent CD uniformity (CDU).The present invention provides a salt, an acid generator and a resist composition, repre...
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JP2023076401A |
To provide a carboxylate and the like which allow a resist pattern having a good pattern collapse margin to be produced, and a resist composition containing the same.There are provided: a carboxylate represented by formula (I) and the li...
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JP7285141B2 |
To provide a salt capable of producing a resist pattern having good CD uniformity.The salt is represented by the following formula. [Qand Qeach independently represent a fluorine atom or the like; Rand Reach independently represent a hyd...
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JP7284622B2 |
To provide a salt capable of manufacturing a resist pattern having good CD uniformity (CDU), an acid generator containing the salt, and a resist composition.There are provided a salt represented by the formula (I), an acid generator cont...
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JP7283883B2 |
wherein R1 and R2 each represent a chain hydrocarbon group which may have a substituent, an alicyclic hydrocarbon group which may have a substituent or an aromatic hydrocarbon group which may have a substituent, or R1 and R2 are bonded e...
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JP2023070656A |
To provide a carboxylic acid generator, a resin, and a resist composition which contain a carboxylate or the like allowing a resist pattern having good line edge roughness to be produced.There are provided: a carboxylic acid generator be...
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JP2023070655A |
To provide a salt and the like and a resist composition which allow a resist pattern having good CD uniformity to be produced.An acid generator contains: (I) a specific sulfonate having an unsaturated group of a specific triphenylsulfoni...
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JP7274937B2 |
To provide a resist composition which further reduces roughness and is capable of improving rectangularity of a cross-sectional shape of a resist pattern, and a resist pattern forming method using the resist composition.The resist compos...
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JP2023068626A |
To provide a molecular resist composition which is improved in sensitivity, resolution, and LWR in photolithography using high-energy radiation; and a patterning process using the resist composition.A molecular resist composition compris...
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JP2023067890A |
An object of the present invention is to provide a salt capable of producing a resist pattern with good line edge roughness (LER), and a resist composition containing the salt. A salt represented by formula (I). [In the formula, Q1and Q2...
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JP2023065448A |
A method for producing functionalized fluorinated monomers for use in the production of oligomers and polymers that can be used to improve the surface properties of polymer-derived systems such as coatings. A method of making a functiona...
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JP7270347B2 |
To provide a resist pattern forming method by which generation of a defect in an unexposed portion of a resist film can be reduced and a resist pattern having a good profile can be formed. The resist pattern forming method includes: a st...
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JP7269093B2 |
A salt represented by formula (I) and a resist composition including the salt are described.wherein, in formula (I),Q1 and Q2 each independently represent a fluorine atom or the like,R1 and R2 each independently represent a hydrogen atom...
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JP2023061383A |
To provide a salt which allows a resist pattern having good CD uniformity to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and a resi...
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JP2023059597A |
To provide a chemically amplified resist composition which is excellent in balance of sensitivity, CDU, LWR, MEF and DOF in photolithography using high-energy rays as a light source and can form a rectangular pattern, a photoacid generat...
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JP7260643B2 |
The present invention provides a method for purifying a compound that generates an acid when irradiated with active light or radiation, said method being capable of reducing the content of metal impurities, while having excellent recover...
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JP7259097B2 |
To provide a resist composition capable of producing a resist pattern with good resolution, and a method for producing a resist pattern.The resist composition contains a compound represented by formula (IA) or formula (IB), a compound ha...
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JP7257884B2 |
To provide a resist composition which achieves higher sensitivity and is capable of forming a resist pattern having a good shape with further reduced roughness, and a resist pattern forming method.The resist composition contains: a resin...
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JP7257149B2 |
To provide a salt and an acid generator with which a resist composition can be obtained, the resist composition being able to produce a resist pattern with good CD uniformity (CDU).Provided are: a salt represented by formula (I0); an aci...
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JP2023515209A |
The present invention relates to novel compounds of general formula (I), their pharmaceutically acceptable salts, pharmaceutically acceptable solvates, enantiomers, diastereomers and polymorphs. The present invention also provides method...
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JP7255472B2 |
An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits a ...
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JP7240068B2 |
To provide a carboxylate capable of producing a resist pattern having good line edge roughness, and a resist composition containing the carboxylate.A carboxylate represented by a formula (I) and a resist composition containing the carbox...
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JP7240070B2 |
To provide a salt and a resist composition capable of producing a resist pattern with good CD uniformity.The salt is represented by formula (I). In the formula, Q, Q, Qand Qeach represent F or a perfluoroalkyl group; R, R, Rand Reach rep...
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JP7240069B2 |
To provide a salt and a resist composition capable of producing a resist pattern with good CD uniformity (CDU).There are provided a sulfate ester salt having a group represented by formula (I) and a resist composition containing the sulf...
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JP2023036012A |
To provide a carboxylate and a carboxylic acid generator which can produce a resist pattern having excellent line edge roughness, and a resist composition comprising the same.The present invention provides a carboxylate represented by th...
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JP2023036004A |
To provide a salt that can produce a resist pattern having excellent CD uniformity (CDU) and a resist composition comprising the same.The present invention provides a salt represented by formula (I), an acid generator and a resist compos...
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JP7233871B2 |
To provide a compound capable of producing a resist pattern with good line edge roughness (LER), a resin having a structural unit derived from the compound, and a resist composition containing the resin.The compound is represented by for...
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JP7226095B2 |
The present invention provides an onium salt of chemical formula (I) and a chemically amplified resist composition comprising the onium salt as PAG. When processed by lithography, the resist composition exhibits high sensitivity, minimal...
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JP7224970B2 |
To provide a salt and a resist composition capable of producing a resist pattern with good line edge roughness.The salt is represented by formula (I), and the resist composition contains the salt. [In the formula, Q, Q, Qand Qeach repres...
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JP7224971B2 |
To provide a salt and a resist composition capable of producing a resist pattern with good line edge roughness.The salt is represented by formula (I), and the resist composition contains the salt. [In the formula, Q, Q, Qand Qeach repres...
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