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JP2023021058A |
To provide a salt which allows a resist pattern having good CD uniformity to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (IA) or formula (IB), an acid gene...
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JP2023021083A |
To provide a salt which allows a resist pattern having good CD uniformity to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and a resi...
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JP2023021084A |
To provide a salt which allows a resist pattern having good CD uniformity to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and a resi...
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JP2023021085A |
To provide a salt which allows a resist pattern having good line edge roughness to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and ...
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JP2023018672A |
To provide a salt which allows a resist pattern having good CD uniformity (CDU) to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and ...
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JP2023018671A |
To provide a carboxylate which allows a resist pattern having good line edge roughness to be produced, a carboxylic acid generator, and a resist composition containing the same.There are provided a carboxylate represented by formula (I),...
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JP7218162B2 |
A resist composition containing a base material component (A) of which solubility in a developing solution is changed due to an action of an acid and a compound represented by Formula (bd1); in the formula, Rbd1 to Rbd3 each independentl...
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JP7210894B2 |
To provide a salt capable of producing a resist pattern with good line edge roughness (LER), and a resist composition containing the salt.The salt is represented by formula (I) [where Qand Qeach independently represent a fluorine atom or...
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JP2023010650A |
To provide a salt that can produce a resist pattern having excellent CD uniformity, and a resist composition comprising the same.The present invention provides a salt represented by the formula (I) and a resist composition. [Q1 and Q2, R...
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JP2023008954A |
To provide a carboxylate which allows a resist pattern having good line edge roughness (LER) to be produced, and a resist composition containing the same.Specifically, there are provided a carboxylate represented by, e.g., formula (I-1),...
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JP2023008953A |
To provide a salt which allows a resist pattern having good CD uniformity to be produced, and a resist composition containing the same.Specifically, there are provided a salt represented by, e.g., formula (I-1), an acid generator, and a ...
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JP7205419B2 |
A novel onium salt having formula (1) and a resist composition comprising the same as a quencher are provided. When the resist composition is processed by photolithography using high-energy radiation, there is formed a resist pattern whi...
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JP7205729B2 |
A method for producing a pentafluorosulfanyl aromatic compound represented by general formula (2): Ar-(SF5)k (in the formula, Ar is a substituted or unsubstituted aryl group or a heteroaryl group, k is an integer of 1-3) that includes re...
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JP2023002465A |
To provide a positive type resist material having sensitivity and resolution higher than a conventional positive type resist material, improved in LWR and CDU, having a wide process window, and is excellent in a pattern shape after expos...
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JP2023002490A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good CD uniformity (CDU) to be produced.There are provided a salt represented by formula (I), an acid generator, and a resist composition....
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JP2023001917A |
To provide a salt which allows a resist pattern having good resolution to be produced, and a resist composition containing the same.There are provided: a triarylsulfonium salt which has a substituted triphenylsulfonium cationic moiety ha...
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JP2023001918A |
To provide a resist composition from which a resist pattern having a good mask error factor can be produced.There are provided: a carboxylic acid generator which contains a carboxylate of a specific triphenylsulfonium having a substituen...
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JP2023001097A |
To provide a salt which allows a resist pattern having a good pattern collapse margin (PCM) to be produced, a resin, and a resist composition containing the same.There are provided a salt illustrated by the following structural formula, ...
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JP2023001098A |
To provide a carboxylate which allows a resist pattern having good line edge roughness to be produced, a resin, and a resist composition containing the same.There are provided a carboxylate having a specific structure, a carboxylic acid ...
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JP7197988B2 |
To provide a salt and a resist composition which can manufacture a resist pattern in excellent CD uniformity (CDU).There is provided a salt expressed by a formula (I), an acid generator and a resist composition containing the salt [in th...
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JP2022191202A |
To provide a carboxylate which allows a resist pattern having good line edge roughness (LER) to be produced, and a resist composition containing the same.Specifically, there are provided a carboxylate represented by, e.g., formula (I-1),...
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JP2022191173A |
To provide a resist composition containing a compound useful as an acid generator for resist compositions.The resist composition contains a resin component (A1) and a compound (B0) represented by general formula (b0). (In the formula, X0...
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JP2022191201A |
To provide a salt which allows a resist pattern having good CD uniformity (CDU) to be produced, and a resist composition containing the same.There are provided a triphenyl sulfonium salt having a specific substituent, an acid generator, ...
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JP2022190871A |
To provide a production method for producing a compound suitable as an acid generator for a resist composition at high yield.A method for producing a compound includes the steps of: subjecting a compound represented by general formula (C...
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JP2022189774A |
To provide a carboxylate which allows a resist pattern having good CD uniformity (CDU) to be produced, and a resist composition containing the same.A carboxylic acid generator contains a salt of a sulfonium having a specific substituent ...
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JP2022189773A |
To provide a salt which allows a resist pattern having a good pattern collapse margin (PCM) to be produced, and a resist composition containing the same.An acid generator contains a triphenyl sulfonium salt having a specific substituent....
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JP7193545B2 |
Novel photoacid generator compounds are provided. Compositions that include the novel photoacid generator compounds are also provided. The present disclosure further provides methods of making and using the photoacid generator compounds ...
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JP7193021B2 |
To provide a resist composition capable of producing a resist pattern with good line edge roughness (LER).The resist composition contains a compound represented by formula (I) and a resin having an acid-labile group. [In the formula (I),...
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JP7190966B2 |
To provide a salt, an acid generator and a resist composition that make it possible to produce a resist pattern with excellent CD uniformity.The present invention provides a salt represented by formula (I), an acid generator and a resist...
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JP7190862B2 |
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), and a resist composition containing the salt.The salt has a group represented by formula (aa) [where Xand Xeach independently represent an oxygen at...
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JP2022184974A |
To provide novel photoacid generator compounds useful as optical activation components in chemically amplified resist compositions for micro-fabrication applications.There is provided a sulfonic acid derivative compound represented by Fo...
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JP7188976B2 |
To provide a salt, an acid generator, a resin and a resist composition capable of producing a resist pattern with good line edge roughness.The salt is represented by formula (I) [where Qand Qeach represent a fluorine atom or a perfluoroa...
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JP7186592B2 |
A resist composition containing a base material component of which solubility in a developing solution is changed due to an action of an acid and a compound represented by Formula (bd1); in the formula, Rbd1 to Rbd3 each independently re...
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JP7186516B2 |
To provide a novel compound useful as an acid generator for a resist composition, an acid generator using the compound, a resist composition containing the acid generator, and a resist pattern forming method using the resist composition....
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JP2022180160A |
To provide a resist composition that can form a resist pattern having excellent CDU and resolution.A resist composition contains a base component (A) and a compound (D0) represented by general formula (d0), where Rd0 is a condensed cycli...
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JP2022179407A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good CD uniformity (CDU) to be produced.There are provided a salt represented by a formula (I), an acid generator, and a resist compositio...
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JP2022179408A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good line edge roughness to be produced.There are provided a salt represented by a formula (I), an acid generator, and a resist compositio...
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JP7181096B2 |
To provide a salt capable of producing a resist pattern having good line edge roughness (LER), an acid generator, and a resist composition containing the acid generator.There are provided a salt represented by formula (I), an acid genera...
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JP7181118B2 |
To provide a carboxylate capable of producing a resist pattern with a good mask error factor, and a resist composition containing the carboxylate.A carboxylate represented by a formula (I) and a resist composition containing the carboxyl...
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JP7178265B2 |
To provide a salt capable of producing a resist pattern having good line edge roughness (LER), an acid generator, and a resist composition containing the acid generator.There are provided a salt represented by formula (I), an acid genera...
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JP2022173127A |
To provide a resist composition from which a resist pattern having a good pattern collapse margin (PCM) can be produced.A resist composition contains a compound represented by a formula (I), a resin having an acid-labile group containing...
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JP7174044B2 |
The sulfonium salt has high photosensitivity to i-rays and high compatibility with cationically polymerizable compounds such as epoxy compounds, and is excellent storage stability in formulations containing such compounds. The sulfonium ...
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JP7174638B2 |
To provide a salt and an acid generator capable of giving a resist composition capable of producing a resist pattern with a good mask error factor (MEF).A salt is represented by formula (I), and an acid generator and a resist composition...
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JP2022548312A |
The present application relates to lipids of formula (A-1) and compositions therewith. Lipid nanoparticles (eg, empty LNPs or loaded LNPs) include such lipids as well as additional lipids such as phospholipids, structured lipids, PEG lip...
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JP7171601B2 |
Provided are: a compound which can be used suitably as a photodegradable base in a resist composition that has good sensitivity to an active energy, has excellent resolution in lithography and enables the reduction in line width roughnes...
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JP2022171610A |
To provide a salt which allows a resist pattern having good line edge roughness (LER) to be produced, and a resist composition containing the same.There are provided a salt represented by a formula (I), an acid generator, and a resist co...
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JP2022171608A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good CD uniformity (CDU) to be produced.There are provided a salt represented by a formula (I), an acid generator, and a resist compositio...
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JP2022171611A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having a good pattern collapse margin (PCM) to be produced.There are provided a salt represented by a formula (I), an acid generator, and a resis...
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JP2022166055A |
To provide novel potassium channel openers.The present invention discloses a novel compound which is useful as an opener of potassium channels, in particular the Kv7.4 potassium channel: (S)-3-(3,4-difluorophenyl)-1-(5-chloro-2,3-dihydro...
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JP7163907B2 |
Provided is a charge-transporting varnish comprising: a charge-transporting material such as an aniline derivative or a thiophene derivative; a fluorinated alkyl phosphate onium salt represented by the formula; and an organic solvent.
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