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WO/2020/250639A1 |
Provided are: a radiation-sensitive resin composition from which a resist pattern can be formed to have good sensitivity to exposure light, excellent LWR performance, and resolution; and a method of forming a resist pattern. The radiatio...
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WO/2020/233550A1 |
The present invention relates to a compound represented by formula (I) and a photoresist composition thereof. The compound of the present invention has dual functions of both acid generation and acid sensitivity, that is, same can be use...
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WO/2020/207620A1 |
The invention relates to a method for the photoredox catalytically selective activation of sulphur hexaflouride for the alpha-alkoxy pentaflourosulfonation of unsaturated carbon dioxide compounds and to a method for producing unsaturated...
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WO/2020/175495A1 |
Provided is a method for producing a salt by reacting M+X- with YH so as to generate XH and M+Y-, and then removing the generated XH so as to obtain M+Y-. M+X- is a salt of a cation represented by M+ and an anion represented by X-. M+Y- ...
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WO/2020/166677A1 |
Provided is, inter alia, a processing solution for semiconductor wafers for use in a semiconductor formation process. Provided is, inter alia, a processing solution that contains (A) hypochlorite ions and (B) an alkylammonium salt repres...
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WO/2020/130152A1 |
The present invention relates to compounds of formula I bearing a sulfoxonium ylide moiety as warhead, or salts thereof. Such compounds can be used as activity-based probes for cysteine proteases such as cathepsin X, in methods of detect...
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WO/2020/117608A1 |
Oxidized disulfide oil (ODSO) solvent compositions are derived from by-product disulfide oil (DSO) compounds produced as by-products from the generalized mercaptan oxidation (MEROX) processing of a refinery feedstock. The oxidized disulf...
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WO/2020/082817A1 |
The present application pertains to the technical field of pharmaceutical compounds and drugs, relates to an oxime-based naphthoquinone compound, a preparation method therefor and the uses thereof, and specifically relates to a formula (...
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WO/2020/081283A1 |
Stabilized thiosulfate blends are disclosed that include a compound having at least one thiosulfate functional group; and silica particles. The inventive blends may have a pH from about 4.5 to about 9, as measured according to ASTM D1293...
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WO/2020/073822A1 |
The present invention discloses a triphenylphosphonium salt compound as shown in the general formula (I), wherein R1 represents an electron withdrawing group and R2 represents an amplification group. Said compound shows significantly enh...
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WO/2020/067485A1 |
A compound represented by formula (1), a salt thereof or a solvate of the same [in formula (1), R1 represents a linear or branched alkyl group having 2 to 10 carbon atoms, a linear or branched alkyl group having 1 to 10 carbon atoms in w...
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WO/2020/044771A1 |
Provided is an actinic-ray-sensitive or radiation-sensitive resin composition from which a pattern having excellent LWR performance can be produced. Also provided are a resist film, a pattern formation method and an electronic device man...
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WO/2020/045535A1 |
The present invention provides: an active light sensitive or radiation sensitive resin composition that contains (A) a compound which generates an acid when irradiated with active light or radiation, and which has a specific structure; a...
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WO/2020/036329A1 |
The present invention relates to a fluorescent probe for detecting NAD(P)H in mitochondria, and a detection method using same. A probe of the present invention exhibits high selectivity and sensitivity to NAD(P)H and emits strong red flu...
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WO/2019/229103A1 |
The present invention relates to a process for preparing a polyfluorinated compound of formula Ar-Ri(l), wherein Ar-Ri(l) is an aromatic ring system wherein R1 is selected from the group consisting of SF4CI, SF3, SF2CF3, TeFS, TeF4CF3, S...
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WO/2019/225185A1 |
Provided are: a novel sulfonium salt having high photosensitivity to i-rays; and a novel photoacid generator, etc. comprising a sulfonium salt and having high photosensitivity to i-rays, and having high compatibility with cationically po...
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WO/2019/187445A1 |
Provided are: an active-ray-sensitive or radiation-sensitive resin composition which can be prevented from the change in line width of a pattern due to post-exposure delay; a resist film using the active-ray-sensitive or radiation-sensit...
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WO/2019/087626A1 |
Provided are: a compound which can be used suitably as a photodegradable base in a resist composition that has good sensitivity to an active energy, has excellent resolution in lithography and enables the reduction in line width roughnes...
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WO/2019/047734A1 |
Provided are a sulfonium salt photoinitiator, a preparation method therefor, a photocurable composition containing the sulfonium salt photoinitiator, and the use thereof. The sulfonium salt photoinitiator has a structure as represented b...
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WO/2019/044814A1 |
A method for producing a pentafluorosulfanyl aromatic compound represented by general formula (2): Ar-(SF5)k (in the formula, Ar is a substituted or unsubstituted aryl group or a heteroaryl group, k is an integer of 1-3) that includes re...
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WO/2019/039290A1 |
Provided are: an actinic ray-sensitive or radiation-sensitive resin composition that has excellent resolution, exposure latitude, and pattern shape properties; and a resist film, a pattern-forming method, a method for producing an electr...
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WO/2019/023147A1 |
In one aspect, compounds of Formula AA, or a pharmaceutically acceptable salt thereof, are featured.The variables shown in Formula AA are as defined in the claims. The compounds of formula AA are NLRP3 activity modulators and, as such, c...
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WO/2019/023145A1 |
In one aspect, compounds of Formula AA, or a pharmaceutically acceptable salt thereof, are featured. The variables shown in Formula AA are as defined in the claims. The compounds of formula AA are NLRP3 activity modulators and, as such, ...
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WO/2018/225018A1 |
The present invention relates to novel heterocyclic compounds of the general formula (I) their pharmaceutically acceptable salts, pharmaceutically acceptable solvates, enantiomers, diastereomers and polymorphs. The invention also relates...
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WO/2018/211442A1 |
The present invention relates to 4-substituted amidine derivatives of the general formula (I), wherein A1-A4, D, L, Q, R7, R7' and integer's v and w have the meanings as defined in description. The invention further relates to methods fo...
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WO/2018/186331A1 |
The purpose of the present invention is to provide a modification method for a mixture containing a trifluorosulfanyl aromatic compound and a fluorosulfinyl aromatic compound, wherein one or both of these compounds are converted into der...
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WO/2018/168252A1 |
Provided are: an active light sensitive or radiation sensitive resin composition, from which a pattern having low line width roughness (LWR) is formed; a resist film which uses this active light sensitive or radiation sensitive resin com...
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WO/2018/159515A1 |
Provided is a method for producing a pentafluorosulfanyl aromatic compound represented by general formula (3), Ar-(SF5)k, (in the formula, Ar is a substituted or unsubstituted aryl group or heteroaryl group, and k is an integer between 1...
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WO/2018/159560A1 |
The purpose of the present invention is to provide: a radiation-sensitive resin composition which has excellent LWR performance, resolution, rectangularity of a cross-sectional shape, depth of focus and film shrinkage suppressing propert...
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WO/2018/147204A1 |
Provided is a charge transporting varnish comprising: a charge transporting substance such as an aniline derivative and a thiophene derivative; an onium borate salt such as a compound represented by the formula; and an organic solvent.
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WO/2018/116916A1 |
Provided are: an active light sensitive or radiation sensitive resin composition which contains (A) a photoacid generator that generates an acid having a pKa of -1.40 or more when irradiated with active light or radiation, and (B) a resi...
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WO/2018/102433A1 |
Thionyl tetrafluoride gas reacts efficiently with primary amines to form reactive iminosulfur oxydifluoride compounds. These dual SVI-F loaded iminosulfur oxydifluoride compounds, in turn, readily react with secondary amines or aryloxy s...
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WO/2018/101339A1 |
Provided are a radiation-sensitive resin composition including an acid generating agent that gives an acid having sufficient acid strength even when no fluorine atoms are present at the proximal carbon of a sulfonic acid group, an onium ...
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WO/2018/087064A1 |
The invention relates to a method for producing triarylorganoborates from organoboronic acid esters in the presence of an n-valent cation 1/n Kn+, comprising the anhydrous treatment of the reaction mixture, and to the use of the obtained...
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WO/2018/084050A1 |
Provided are: a metal-containing onium salt compound suitable for use as a photodisintegrable base for resist compositions which have satisfactory sensitivity to ionizing radiation such as extreme ultraviolet (EUV), are excellent in term...
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WO/2018/074382A1 |
Provided are an onium salt and a composition which are appropriately usable in a resist composition for a lithography process, wherein two kinds of active energy rays including first active energy rays such as electron beams or extreme u...
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WO/2018/071327A1 |
This disclosure relates to the field of molecules having pesticidal utility against pests in Phyla Arthropoda, Mollusca, and Nematoda, processes to produce such molecules, intermediates used in such processes, pesticidal compositions con...
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WO/2018/028461A1 |
Disclosed are a novel cationic photoinitiator, and a preparation method therefor and applications thereof. The cationic photoinitiator has a structure represented by formula (I), can match a longer absorption wavelength in the applicatio...
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WO/2018/028050A1 |
Disclosed is an asymmetric aryl-alkyl persulfate compound as represented by formula (3) and a synthesis method therefor, in which an arylboronic acid of formula (1) and R2SSCOR3 of formula (2) serve as reaction raw materials and, under t...
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WO/2018/020974A1 |
Provided are the following: a sulfonium salt which does not contain a toxic metal and which exhibits higher cationic polymerization performance and crosslinking performance than a tetrakis(pentafluorophenyl)borate salt; a heat- or photo-...
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WO/2018/003470A1 |
Because a sulfonium salt that does not contain a toxic metal and that exhibits polymerization performance and crosslinking reaction performance equal to or greater than those of a tetrakis (pentafluorophenyl) borate salt, a photoacid gen...
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WO/2017/219935A1 |
The present invention discloses a biaryl urea RORγt inhibitor, and specifically relates to a biaryl urea derivative, as represented by formula I, with an RORγt inhibiting activity, and a manufacturing method thereof, and a pharmaceutic...
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WO/2017/212963A1 |
The purpose of the present invention is to provide a novel sulfonium salt having high photosensitivity to the i-line. The sulfonium salt according to the present invention is represented by formula (1). [In the formula, R1-R8 each indepe...
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WO/2017/179727A1 |
The present invention is a radiation sensitive resin composition which contains a polymer having a first structural unit that contains an acid-cleavable group, a first radiation sensitive acid generator and a solvent, and wherein the fir...
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WO/2017/172802A1 |
The invention provides compounds having the general formula I: (i) and pharmaceutically acceptable salts thereof, wherein the variables RA, RAA, subscript n, ring A, X2, L, subscript m, X1, ring B, R1, and RN have the meaning as describe...
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WO/2017/154345A1 |
The present invention provides: an active light sensitive or radiation sensitive resin composition which is capable of forming a pattern that has low LWR and is suppressed in collapsing; a resist film; a pattern forming method; and a met...
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WO/2017/091279A1 |
Methods for preparing isotopically modified 1,4-diene systems from non- isotopically modified 1,4-dienes involve selective oxidation of one or more bis-allylic position(s), or the preparation of isotopically modified 1,4-diene systems vi...
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WO/2017/059222A1 |
Described herein are thermoset compositions suitable for hybrid polymerization when processed via additive fabrication equipment utilizing sources of actinic radiation with peak spectral intensities in the UV and/or visible region contai...
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WO/2017/038870A1 |
The purpose of the present invention is to provide a compound having an inhibition activity against discoidin domain receptor 1. The present invention provides a urea derivative represented by the formula and a pharmacologically acceptab...
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WO/2016/180804A1 |
The invention relates to a monomer for copolymerization with alkenes, dienes, vinyl compounds and/or vinylidene compounds, a method for synthesizing a copolymer, a copolymer synthesized using said method, a sulfur cross-linkable rubber m...
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