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JP6873488B2 |
Provided is a method for manufacturing carboxylic acid or a salt thereof under a moderate condition and in a simple, highly-selective, high-yielding manner. Provided is a method for manufacturing a compound represented by general formula...
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JP2021038158A |
To provide a production method capable of producing a solid, high-purity cyclic compound or a derivative thereof at a high yield.A production method of a cyclic compound or a derivative thereof includes: an adsorption step of making a ra...
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JP2021038157A |
To provide a production method capable of producing a solid, high-purity cyclic compound or a derivative thereof at a high yield.A production method of a cyclic compound or a derivative thereof includes: a drying step of drying a raw mat...
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JP2021035939A |
To provide a carboxylate capable of producing a resist pattern with good line edge roughness and a resist composition containing the carboxylate.The carboxylate is represented by formula (IA) or formula (IB).SELECTED DRAWING: None
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JP2021035937A |
To provide a carboxylate capable of producing a resist pattern with good CD uniformity and a resist composition containing the carboxylate.A carboxylate represented by formula (I), a carboxylic acid generator, and a resist composition co...
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JP2021035938A |
To provide a carboxylate capable of producing a resist pattern with good line edge roughness and a resist composition containing the carboxylate.A carboxylate represented by the following formula and a resist composition containing the c...
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JP2021011479A |
To provide a carboxylate capable of producing a resist pattern having good line edge roughness (LER), and a resist composition containing the carboxylate.The carboxylate represented by formula (I), a carboxylic acid generator, and the re...
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JP2021011481A |
To provide a carboxylate capable of producing a resist pattern having good CD uniformity (CDU), and a resist composition containing the carboxylate.The carboxylate represented by formula (I), a carboxylic acid generator, and the resist c...
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JP2021008457A |
To provide a carboxylate capable of producing a resist pattern having good CD uniformity (CDU), a carboxylic acid generator, and a resist composition containing the same.The carboxylate represented by formula (I), the carboxylic acid gen...
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JP2021008464A |
To provide a carboxylate capable of producing a resist pattern having a good MEF.The carboxylate is represented by formula (I) [where R1a and R2a each represent H or a hydrocarbon group optionally having F or are bonded together to form ...
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JP2021008455A |
To provide a carboxylate capable of producing a resist pattern having good line edge roughness (LER), a carboxylic acid generator, and a resist composition containing the same.The carboxylate represented by formula (I), the carboxylic ac...
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JP2021008461A |
To provide a carboxylate capable of producing a resist pattern having good resolution.The carboxylate is represented by formula (I) [where R1 and R2 each represent H, F or an alkyl group having F; R3 represents F or an alkyl group having...
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JP2021008465A |
To provide a carboxylate capable of producing a resist pattern having good pattern collapse resistance.The carboxylate is represented by formula (I) [where R1a and R2a each represent H or a hydrocarbon group optionally having F or are bo...
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JP2021008459A |
To provide a carboxylate capable of producing a resist pattern with good line edge roughness, a carboxylic acid generator, and a resist composition.The carboxylate represented by formula (I) and the resist composition containing the same...
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JP2020180119A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition capable of producing a resist pattern having a good mask error factor (MEF).A carboxylate represented by formula (I), a carboxylic acid generator, and a resi...
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JP2020180117A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition capable of producing a resist pattern having good CD uniformity (CDU).A carboxylate represented by formula (I), a carboxylic acid generator, and a resist com...
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JP2020180115A |
To provide a salt, an acid generator, and a resist composition capable of producing a resist pattern with good CD uniformity (CDU).A salt of formula (I) and a resist composition containing the same are provided. [In the formula, R1a and ...
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JP2020180120A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition capable of producing a resist pattern having good line edge roughness (LER).A carboxylate represented by formula (I), a carboxylic acid generator, and a resi...
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JP2020180118A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition capable of producing a resist pattern having good CD uniformity (CDU).A carboxylate represented by formula (I), a carboxylic acid generator, and a resist com...
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JP2020180113A |
To provide a salt, an acid generator, and a resist composition capable of producing a resist pattern with good line edge roughness.A carboxylate of formula (I) and a resist composition containing the same are provided. [In the formula, R...
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JP2020180122A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition capable of producing a resist pattern with good line edge roughness (LER).A salt represented by formula (I) and a resist composition containing the same are ...
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JP2020176119A |
To provide a salt capable of producing a resist pattern having good line edge roughness, an acid generator, and a resist composition containing the same.A carboxylate represented by Formula (I), a carboxylic acid generator, and a resist ...
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JP2020176118A |
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), an acid generator, and a resist composition containing the same.A carboxylate represented by Formula (I), a carboxylic acid generator, and a resist ...
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JP2020176114A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition capable of producing a resist pattern with a good mask error factor (MEF).A carboxylate represented by Formula (I), a carboxylic acid generator, and a resist...
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JP2020176117A |
To provide a salt capable of producing a resist pattern having a good mask error factor (MEF), an acid generator, and a resist composition containing the same.A carboxylate represented by Formula (I), an acid generator, and a resist comp...
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JP2020176113A |
To provide a salt capable of producing a resist pattern having good line edge roughness (LER), an acid generator, and a resist composition containing the same.A carboxylate represented by Formula (I), a carboxylic acid generator, and a r...
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JP2020152720A |
To provide a carboxylate that makes it possible to produce a resist pattern having excellent line edge roughness, and a resist composition containing the same.The present invention provides a carboxylate represented by formula (I), a car...
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JP2020152719A |
To provide a carboxylate capable of producing a resist pattern having good CD uniformity (CDU), and a resist composition containing the same.The carboxylate represented by formula (I), a carboxylic acid generator, and the resist composit...
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JP6720512B2 |
Provided is a method for producing a trans-4-substituted-cyclohexanecarboxylic acid under mild conditions with high yield. A method for producing a trans-4-substituted-cyclohexanecarboxylic acid (1-A), involving a step of heating a mixtu...
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JP2020516657A |
The present application relates to a triterpene glycoside saponin-inducing adjuvant, a method for synthesizing it, and an intermediate thereof. The application also provides pharmaceutical compositions containing the compounds of the inv...
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JP2020059676A |
To provide a compound having a dibareran skeleton and a method for manufacturing the compound.There is provided a compound represented by the following general formula (I), where Rto Rrepresent each independently a hydrogen atom, an alky...
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JP6622824B2 |
Certain compounds, or pharmaceutically acceptable salts or prodrugs thereof, pharmaceutical compositions comprising the same and methods of treating patients suffering from certain diseases and disorders response to the inhibition of KMO...
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JP2019523245A |
The present invention provides for the use of compounds of formula I as ligands for orphan nuclear receptors and in the prevention or treatment of diseases associated with orphan nuclear receptors. [Chemical 118]
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JP6559394B2 |
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JP6526275B2 |
Compounds of formula (I): where n, R1, R4a, R4b, R5, R7 and R8 are defined herein, or pharmaceutically acceptable salts thereof, are described herein. The disclosed compounds have activity as SHIP1 modulators, and thus may be used to tre...
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JP6441928B2 |
A compound of formula I, wherein the groups R1, R2, R3, X, m, and n are defined as in claim 1, which have valuable pharmacological properties, in particular bind to the GPR40 receptor and modulate its activity. The compounds are suitable...
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JP6407950B2 |
where R1, R2, R3, R4a, R4b, R5, R6 and R7 are defined herein, or stereoisomers or pharmaceutically acceptable salts thereof, are described herein. Such compounds have activity as SHIP1 modulators, and thus may be used to treat any of a v...
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JP2018526371A |
The present invention is a compound having the general formula I.And its pharmaceutically acceptable salt (variable R in the formula)AA, N, ring A, X1, L, m, X2, R2, R3, R4, R5, X, and R6Has the meaning described herein), as well as comp...
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JP2018513106A |
The present invention provides a compound of structural formula (1), a salt thereof, for use in promoting energy consumption and / or heat production. [Selection diagram] None
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JP6275690B2 |
Certain compounds, or pharmaceutically acceptable salts or prodrugs thereof, pharmaceutical compositions comprising the same and methods of treating patients suffering from certain diseases and disorders response to the inhibition of KMO...
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JP6207065B2 |
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JP6185020B2 |
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JP6180936B2 |
Phenyl substituted bicyclooctane-1,3-dione derivative (I) and its isomers comprising 3-hydroxy-2-phenyl-4,5,6,6a-tetrahydro-3aH-pentalen-1-one derivative (IIa) and (IIb), and 2-phenyl-tetrahydro-pentalene-1,3-dione derivative (IIc), are ...
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JP6177597B2 |
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JP6163695B2 |
The present invention relates to compounds of general formula I, wherein the groups R1, R2, R3, m and n are defined as in claim 1, which have valuable pharmacological properties, in particular bind to the GPR40 receptor and modulate its ...
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JP6159818B2 |
Platinum complexes containing 3-ketone cyclobutane 1,1-dicarboxylic acid as leaving group for treating cancers and a preparation method of the complexes, one of the platinum complexes is cis-[3-ketone cyclobutane-1,1-dicarboxylic acid ra...
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JP6055771B2 |
Phenylketone carboxylate compounds of Formula I, wherein n=2-6; R=C(0); -OC(O)- or -CH(OH)-; A is (CH2)mCOOH, W(CH2)mCOOH or YCH(COOH)((CH2)pCH3) when B is Ft B is (CH2)mCOOH, W(CH2)mCOOH or YCH(COOH)((CH2)pCH3) when A is Ft or A and B f...
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JP6024410B2 |
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JP2016164143A |
To prepare [(1R,2R)-4-oxo-1,2-cyclopentanedicarboxylic acid by the resolution of racemic 4-oxo-1,2-cyclopentanedicarboxylic acid.The process comprises: reacting 4-oxo-1,2-cyclopentanedicarboxylic acid with brucine or (1R,2S)-(-)-ephedrin...
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JP5960058B2 |
The present invention relates to arylated camphenes, processes for their preparation and uses thereof for the manufacture of medicaments for the treatment of diseases, disorders or conditions associated with, or benefiting from stimulati...
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