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JP2021183594A |
To provide a carboxylate capable of producing a resist pattern having good line edge roughness (LER), a carboxylic acid generator, and a resist composition containing the same.A carboxylate represented by formula (I), a carboxylic acid g...
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JP2021183599A |
To provide a salt capable of producing a resist pattern having a good mask error factor (MEF), an acid generator, and a resist composition containing the same.A salt represented by formula (I), an acid generator, and a resist composition...
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JP2021183601A |
To provide a salt capable of producing a resist pattern having good line edge roughness (LER), an acid generator, and a resist composition containing the same.A salt represented by formula (I), an acid generator, and a resist composition...
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JP2021181429A |
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), an acid generator, and a resist composition containing the same.The salt represented by formula (I), the acid generator, and the resist composition ...
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JP2021181430A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition capable of producing a resist pattern having good line edge roughness.The carboxylate represented by formula (I), the carboxylic acid generator, and the resi...
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JP2021178815A |
To provide a salt and an acid generator which make it possible to produce a resist pattern with excellent pattern collapse margin (PCM) and a resist composition comprising the same.The present invention discloses a carboxylate represente...
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JP2021178817A |
To provide a carboxylate and a carboxylic acid generator which make it possible to produce a resist pattern with excellent line edge roughness (LER) and a resist composition comprising the same.The present invention discloses a carboxyla...
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JP2021178814A |
To provide a salt and an acid generator which make it possible to produce a resist pattern with excellent mask error factor (MEF) and a resist composition comprising the same.The present invention discloses a salt represented by, for exa...
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JP2021178812A |
To provide a salt and an acid generator which make it possible to produce a resist pattern with excellent focus margin (DOF) and a resist composition comprising the same.The present invention discloses a salt represented by, for example,...
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JP2021178813A |
To provide a carboxylate and a carboxylic acid generator which make it possible to produce a resist pattern with excellent mask error factor (MEF) and a resist composition comprising the same.The present invention discloses a carboxylate...
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JP2021178816A |
To provide a salt and an acid generator which make it possible to produce a resist pattern with excellent CD uniformity (CDU) and a resist composition comprising the same.The present invention discloses a salt represented by, for example...
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JP2021176851A |
To provide a salt capable of producing a resist pattern with excellent CD uniformity (CDU), and to provide a resist composition containing the salt.A salt has an anion expressed by a formula (aa1). [In the formula (aa1), X1 represents a ...
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JP2021175731A |
To provide carboxylate, a carboxylic acid generator including the carboxylate and a resist composition including the generator from which a resist pattern having an excellent line edge roughness (LER) can be produced.Carboxylate expresse...
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JP2021175727A |
To provide carboxylate, a carboxylic acid generator including the carboxylate and a resist composition including the generator from which a resist pattern having an excellent mask error factor (MEF) can be produced.Provided is carboxylat...
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JP2021175724A |
To provide a salt, an acid generator including the salt and a resist composition including the generator from which a resist pattern having an excellent CD uniformity (CDU) can be produced.Provided is a salt expressed by and synthesized ...
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JP2021175722A |
To provide a salt, an acid generator including the salt and a resist composition including the generator from which a resist pattern having an excellent line edge roughness (LER) can be produced.A salt expressed by a formula (I-5) and sy...
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JP2021175730A |
To provide a salt, an acid generator including the salt and a resist composition including the generator from which a resist pattern having an excellent CD uniformity can be produced.Provided is a salt expressed by and synthesized as in ...
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JP2021175721A |
To provide carboxylate, a carboxylic acid generator and a resist composition including the same from which a resist pattern having an excellent mask error factor (MEF) can be produced.Carboxylate expressed by a formula (I-4100) and synth...
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JP2021175728A |
To provide a salt, an acid generator including the salt and a resist composition including the generator from which a resist pattern having an excellent mask error factor (MEF) can be produced.Provided is a salt expressed by and synthesi...
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JP2021175725A |
To provide carboxylate, a carboxylic acid generator including the carboxylate and a resist composition including the generator from which a resist pattern having an excellent pattern collapse margin (PCM) can be produced.Provided is carb...
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JP2021175723A |
To provide carboxylate, a carboxylic acid generator and a resist composition including the same from which a resist pattern having an excellent CD uniformity (CDU) can be produced.Carboxylate expressed by a formula (I-2) and synthesized ...
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JP2021175726A |
To provide a salt, an acid generator including the salt and a resist composition including the generator from which a resist pattern having an excellent resolution can be produced.Provided is a salt expressed by and synthesized as in a f...
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JP6957989B2 |
To provide a resist composition capable of producing a resist pattern having good CD uniformity (CDU).The resist composition contains a resin containing a structural unit having an acid-labile group, an acid generator, and a compound rep...
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JP2021165253A |
To provide a compound capable of producing a resist pattern having good CD uniformity (CDU), a resin, and a resist composition containing the same.The compound represented by formula (I), the resin, and the resist composition containing ...
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JP2021151990A |
To provide a salt capable of producing a resist pattern having good line edge roughness (LER), and a resist composition containing the same.A salt represented by formula (I), an acid generator, and a resist composition containing the sam...
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JP2021151992A |
To provide a carboxylate capable of producing a resist pattern having good line edge roughness (LER), and a resist composition containing the same.The carboxylate is represented by formula (I) [where R1, R2, R3 and R4 each represent a ha...
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JP2021147390A |
To provide a salt capable of producing a resist pattern having good line edge roughness (LER) and a resist composition containing the same.A salt represented by formula (I), an acid generator, and a resist composition containing the same...
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JP2021147388A |
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU) and a resist composition containing the same.A salt represented by formula (I), an acid generator, and a resist composition containing the same are p...
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JP6935255B2 |
To provide a method for producing a resist pattern, capable of producing a resist pattern with excellent line edge roughness.The method for producing a resist pattern includes: applying a resist composition containing a salt represented ...
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JP6932943B2 |
To provide a salt capable of producing a resist pattern with good CD uniformity (CDU), and a resist composition containing the salt.The salt is represented by formula (I) [Rand Rare each independently H, a hydroxy group, or a C1-12 hydro...
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JP2021123579A |
To provide a salt capable of producing a resist pattern having good CD uniformity, and a resist composition containing the same.There are provided: a salt represented by formula (I); and an acid generator and a resist composition contain...
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JP2021123580A |
To provide a carboxylate capable of producing a resist pattern having good line edge roughness (LER), and a resist composition containing the same.There are provided a carboxylate represented by formula (I), an acid generator, and a resi...
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JP2021119120A |
To provide: a method for easily producing an aromatic cyclic compound having aromatic rings linked in a curved manner; and an aromatic cyclic compound useful as a wavelength conversion material.An aromatic cyclic compound represented by ...
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JP6915943B2 |
The present invention provides dioxetane-based chemiluminescence probes, more specifically fluorophore-tethered dioxetane-based chemiluminescence probes and compositions thereof. The chemiluminescence probes disclosed are useful for both...
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JP6913084B2 |
wherein the parameters have the meaning given in claim 1, to liquid crystal mixtures comprising at least one chiral compound of formula I, to chiral linear or crosslinked liquid crystal polymers obtainable by polymerizing a polymerizable...
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JP2021107529A |
To provide a resin and a resist composition which form a resist pattern having good line edge roughness (LER).The resin contains a structural unit represented by formula (I) and a structural unit represented by formula (a2-A). [In the fo...
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JP2021107379A |
To provide a salt, an acid generator, and a resist composition which form a resist pattern having good CD uniformity (CDU).A salt represented by formula (I), an acid generator, and a resist composition containing the same are provided. [...
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JP6900276B2 |
To provide a salt that makes it possible to produce a resist pattern with good CD uniformity (CDU), a resist composition containing the same, and a method for producing a resist pattern.A salt represented by formula (I), a resist composi...
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JP2021096466A |
To provide a resist composition forming a resist pattern having good CD uniformity (CDU).The resist composition contains a compound represented by formula (I), a resin having an acid-labile group, and an acid generator. [In the formula, ...
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JP2021091664A |
To provide a salt, an acid generator, and a resist composition capable of producing a resist pattern having a good line edge roughness (LER).A salt, an acid generator, and a resist composition are represented by a formula (I), [in the fo...
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JP6850597B2 |
To provide a salt capable of producing a resist pattern with a good mask error factor (MEF), an acid generator, and a resist composition containing the acid generator.The salt having a group represented by formula (aa1), the acid generat...
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JP2021035939A |
To provide a carboxylate capable of producing a resist pattern with good line edge roughness and a resist composition containing the carboxylate.The carboxylate is represented by formula (IA) or formula (IB).SELECTED DRAWING: None
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JP2021035937A |
To provide a carboxylate capable of producing a resist pattern with good CD uniformity and a resist composition containing the carboxylate.A carboxylate represented by formula (I), a carboxylic acid generator, and a resist composition co...
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JP2021035938A |
To provide a carboxylate capable of producing a resist pattern with good line edge roughness and a resist composition containing the carboxylate.A carboxylate represented by the following formula and a resist composition containing the c...
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JP2021035935A |
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU) and a resist composition containing the salt.A salt represented by formula (I), an acid generator, and a resist composition containing the same are p...
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JP2021031423A |
To provide naturally derived ingredients that can improve immunity against cancer by inhibitory action against proteins that act suppressively in immune systems, such as immune checkpoint molecules.Provided is an anticancer drug resistan...
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JP2021020897A |
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU) and a resist composition containing the salt.A salt represented by formula (I), an acid generator, and a resist composition containing the same are p...
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JP2021011478A |
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), and a resist composition containing the salt.The salt represented by formula (I), an acid generator, and the resist composition are provided. [In th...
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JP2021011479A |
To provide a carboxylate capable of producing a resist pattern having good line edge roughness (LER), and a resist composition containing the carboxylate.The carboxylate represented by formula (I), a carboxylic acid generator, and the re...
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JP2021011477A |
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), and a resist composition containing the salt.The salt represented by formula (I), an acid generator, and the resist composition are provided. [In th...
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