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WO/1992/003426A1 |
Piperazinyl derivatives of general formula (I) wherein R1 represents substituted phenyl, 1- or 2-naphthyl, azanaphtyl or diazanaphtyl groups; n is 1, 2, 3 or 4; X is -O- or (1) wherein R2 is hydrogen, C1-6-alkyl or C3-8-cycloalkyl; Y is ...
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WO/1991/019693A1 |
Novel compounds selected from the group consisting of: (A) compounds of formula I(1), wherein: one of R?1� and R?2� represents the group (a) and the other represents hydrogen or R?7�CO-; R?5� represents C�1? to C�6?-alkyl or ...
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WO/1991/014689A1 |
A process for synthesizing polyoxa heterocycle compounds and in particular the antimalarial agent known as quinghaosu or artemisinin and its analogs is disclosed. A family of new antimalerial analogs of quinghaosu is also disclosed.
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WO/1991/009002A1 |
An improved process for the preparation of vinyl ethers by the coupling reaction of an ester of formula (I), with a carbonyl containing compound of formula (II), wherein A and R are passive organic groups and OY is a hydroxyl group or OP...
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WO/1991/004970A1 |
A process for preparing a compound containing (a) peroxyacetal lactone, (b) peroxyacetal lactol or (c) peroxyacetal ether functionality comprising oxygenating in the presence of one or more oxidizing metal catalysts a compound containing...
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WO/1991/003479A1 |
A novel synthesis of compounds having formula (I), wherein T is a stabilizing spiro-linked polycycloalkylidene group, R?3� is a C�1?-C�20? alkyl, aralkyl or heteroatom containing group, Y is an aromatic fluorescent chromophore, and...
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WO/1991/000009A1 |
12H-dibenzo[d,g][1,3]dioxocin-6-carboxylic acid and certain derivatives thereof (glyoxylates) exhibit plant growth regulant and herbicidal activity when applied to a plant locus.
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WO/1990/014764A1 |
Methods of treating systemic viral infections are disclosed comprising the parenteral administration of pharmacologically effective amounts of ozonides of terpenes in pharmaceutically acceptable carriers. Methods for treating viral lesio...
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WO/1990/015040A1 |
A stable 1,2-dioxetane of the formula (I), where R1, R2 and R3 are passive organic groups that allow the dioxetane to decompose and produce light when Z and Y are removed, with the proviso that R1 and R2 may be joined to form a cyclic mo...
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WO/1990/012562A1 |
Hair colorants based on oxidation colorants in a cosmetic vehicle contain as the developer 2,3-alkylene dioxy-p-phenylene diamines of the formula (I) in which R?1¿ and R?2¿ are independently hydrogen, halogen atoms or alkyl groups with...
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WO/1990/007511A1 |
Triggerable dioxetanes with a fluorescent molecule containing group bonded or tethered in the dioxetane so as to produce fluorescence from the group are described. The compounds are useful in immunoassays and in probes using enzymes or o...
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WO/1990/002742A1 |
Methods are disclosed for purifying chemiluminescent water-soluble 1,2-dioxetane derivatives suitable for use as reporter molecules in a variety of biological analytical systems, including enzyme-linked immunoassays, nucleic acid probe t...
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WO/1990/000168A1 |
Processes are disclosed in which light of different wavelengths is simultaneously released from two or more enzymatically decomposable chemiluminescent 1,2-dioxetane compounds, said compounds being configured, by means of the inclusion o...
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WO/1990/000050A1 |
Non-peptidyl compounds characterized generally as aminoalkylaminocarbonyl aminodiol derivatives of amino acids are useful as renin inhibitors for the treatment of hypertension. Compounds of particular interest are of formula (I), wherein...
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WO/1990/000164A1 |
Chemiluminescent 1,2-dioxetane compounds are disclosed in which the molecule is stabilized at the 3-position on the dioxetane ring against decomposition prior to the molecule's coming in contact with a labile group-removing substance and...
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WO/1989/006961A1 |
An antianxiety drug containing as an active ingredient a piperazine derivative represented by general formula (I) (wherein m represents an integer of 2, 3 or 4, X represents -O-, (a) (wherein l = 0 or 1), (b), (c), (d) or (e), Ar represe...
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WO/1989/006650A1 |
A dioxetane that includes a fluorescent chromophore spiro-bound at the 4-carbon of the dioxetane. The dioxetane has formula (I), where X is CR7R8, O, S, or N-R (where each R7, R8, and R, independently, is H, alkyl, heteroalkyl, aryl, het...
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WO/1989/006226A1 |
Compounds having formula (I), wherein T is a polycycloalkylidene group (e.g., adamant-2-ylidene); R is a C1-20 alkyl, aralkyl or cycloalkyl group; and Y is a fluorescent chromophore (e.g., m-phenylene), produced by reacting a compound ha...
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WO/1988/008452A1 |
The antibiotic reuterin is obtained by cultivating strains of Lactobacillus reuteri under controlled conditions. Reuterin has inhibitory activity against Gram positive and Gram negative bacteria, against the yeast, Saccharomyces cerevisi...
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WO/1988/000695A1 |
In an assay method in which a member of a specific binding pair is detected by means of an optically detectable reaction, the improvement wherein the optically detectable reaction includes the reaction, with an enzyme, of a dioxetane hav...
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WO/1985/004958A1 |
Thermochemically induced luminescence is generated in a fluorescent labeled organic compound containing a covalently bonded fluorescent label which is a polycyclic aromatic radical having at least three linearly fused benzene rings and c...
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WO/1985/000367A1 |
11-halogene-prostane derivatives of the general formula (I), wherein X is F, Cl or Br; R1 is CH2OH or (II) wherein R2 is a hydrogen atom, a rest of alkyl, cycloalkyl, aryl, phenacyl or heterocyclic rest; A is a group -CH2-CH2- or cis -CH...
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WO/1983/003604A1 |
Process for preparing substitued polycyclo-alkylidene polycyclo-alkanes, such as substituted adamantylidene adamantanes, and the corresponding epidioxy compounds, in which polycyclo-alkylidene polycyclo-alkanes are halogenated with an N-...
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JP7462574B2 |
A method is for the detection of presence or absence, quantification, and identification of target microorganisms, such as bacteria, bacterial fragments (e.g., LPS, endotoxin), viruses, fungi as well as other pathogens by means of chemil...
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JP2024045065A |
The present invention provides a salt, an acid generator, and a resist composition that can produce a resist pattern with good CD uniformity. A salt represented by formula (I), an acid generator, and a resist composition. [In the formula...
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JP2024041865A |
One aspect of the present invention provides novel highly permeable compositions (HPCs) or highly permeable prodrugs (HPPs) for the treatment of Parkinson's disease. The HPC/HPP can be converted to the parent active drug or drug metaboli...
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JP2024513500A |
As used herein, formula (I): [In the formula, variables (e.g., R1,R2,X1,X2,Y1,Y2,Y3,Y4,Y5,Y6,Y7, and Y8) values are as disclosed herein] or a pharmaceutically acceptable salt thereof. Also included herein are pharmaceutical compositions ...
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JP2024037169A |
An object of the present invention is to provide a salt, an acid generator, a resist composition, etc. that can produce a resist pattern with good CD uniformity. A salt represented by formula (I), an acid generator and a resist compositi...
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JP7445396B2 |
To provide a resist composition capable of producing a resist pattern having good CD uniformity (CDU).The resist composition contains: a resin containing a structural unit represented by formula (a2-A) and a structural unit having an aci...
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JP2024022555A |
An object of the present invention is to provide a resist composition etc. that can produce a resist pattern having good CD uniformity. The present invention provides an acid generator, etc., and a resist composition using a salt having ...
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JP2024022553A |
An object of the present invention is to provide a resist composition etc. that can produce a resist pattern having good line edge roughness. The present invention provides an acid generator, etc., and a resist composition using a salt h...
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JP2024022558A |
The present invention provides a carboxylic acid salt, etc. and a resist composition that can produce a resist pattern having good line edge roughness. The present invention provides a carboxylic acid generator and a resist composition c...
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JP2024022556A |
The present invention provides a resist composition and the like that can produce a resist pattern having good pattern collapse resistance. The present invention provides a carboxylic acid generator and a resist composition using a carbo...
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JP2024020171A |
An object of the present invention is to provide a resist composition capable of producing a resist pattern having good line edge roughness. A resist composition containing a compound represented by formula (I) and an acid generator. [In...
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JP2024009780A |
An object of the present invention is to provide a salt, etc., which can produce a resist pattern having good CD uniformity, and a resist composition containing the same. A salt represented by formula (I), an acid generator, and a resist...
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JP7414500B2 |
To provide a salt capable of producing a resist pattern with a good mask error factor (MEF), and a resist composition containing the salt.The salt represented by formula (I), an acid generator, and the resist composition containing the s...
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JP2024001869A |
An object of the present invention is to provide a salt, an acid generator, a resist composition, etc. that can produce a resist pattern with good CD uniformity. A salt represented by formula (I), an acid generator, and a resist composit...
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JP2023184475A |
To provide a carboxylate, a resist composition, and the like which allow a resist pattern having a good focus margin to be produced.There are provided a carboxylate represented by a specific formula, a carboxylic acid generator, and a re...
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JP2023184474A |
To provide a carboxylate, a resist composition, and the like which allow a resist pattern having good line edge roughness to be produced.There are provided a carboxylate of a triphenylsulfonium cation of a specific structure having a cyc...
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JP2023184476A |
To provide a carboxylate, a resist composition, and the like which allow a resist pattern having a good mask error factor to be produced.There are provided a carboxylate represented by formula (I), a carboxylic acid generator, and a resi...
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JP7405377B2 |
The present invention relates to a compound of the following formula (I):The invention also relates to uses thereof as dye or pigment, notably as a luster pigment. The invention relates also to a reflective or photonic or nanophotonic or...
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JP2023177302A |
To provide a salt, a resist composition and the like which allow a resist pattern having a good mask error factor to be produced.There are provided a salt represented by formula (I), an acid generator, and a resist composition. [In the f...
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JP2023177294A |
To provide a salt, a resist composition and the like which allow a resist pattern having good line edge roughness to be produced.There are provided a salt represented by formula (I), an acid generator, and a resist composition. [In the f...
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JP2023177295A |
To provide a carboxylate, a resist composition and the like which allow a resist pattern having a good focus margin to be produced.There are provided a carboxylate represented by formula (I), a carboxylic acid generator, and a resist com...
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JP2023177296A |
To provide a salt, a resist composition and the like which allow a resist pattern having good CD uniformity to be produced.There are provided a salt represented by formula (I), an acid generator, and a resist composition. [In the formula...
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JP2023177303A |
To provide a carboxylate, a resist composition and the like which allow a resist pattern having good CD uniformity to be produced.There are provided a carboxylate represented by formula (I), a carboxylic acid generator, and a resist comp...
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JP2023177297A |
To provide a carboxylate, a resist composition and the like which allow a resist pattern having a good mask error factor to be produced.There are provided: a carboxylate represented by formula (I) and the like; and a resist composition. ...
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JP2023171323A |
To provide a salt, a resist composition, and the like which allow a resist pattern having good CD uniformity to be produced.There are provided: a salt of a sulfonium cation of a specific structure and a sulfonate anion of a specific stru...
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JP7389562B2 |
Described are a salt and a resist composition capable of producing a resist pattern with satisfactory line edge roughness (LER). The salt is represented by formula (I):In formula (I), R1, R2, R3, R4 and R5 each independently represent a ...
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JP2023169812A |
To provide a sulfonium salt used for a resist composition having excellent solvent solubility, high sensitivity and high contrast, and excellent lithographic performance such as exposure latitude and LWR; a resist composition containing ...
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