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JP6873522B1 |
To provide a method for preparing a cyclic sulfuric acid ester compound and its use. A method for preparing a cyclic sulfuric acid ester-based compound, wherein the preparation raw material contains a compound A of the following formula ...
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JP2021056504A |
To provide a resist composition that makes it possible to produce a resist pattern having excellent CD uniformity (CDU).A resist composition contains a resin having a hydroxystyrene constitutional unit and a constitutional unit having an...
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JP2021035914A |
To provide an agricultural and horticultural fungicide manifesting a high effect of controlling a wide range of plant pathogens.The invention provides a compound represented by formula (1) in the figure, where each symbol is as described...
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JP6836780B2 |
To provide a tetrafluoro benzooxathiane compound, and a production method thereof.A tetrafluoro benzooxathiane compound represented by general formula (c) is obtained by subjecting a β-ketoester or β-ketosulfone represented by general ...
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JP2021017442A |
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU) and a resist composition containing the salt.A salt represented by formula (I), a quencher, and a resist composition containing the same are provided...
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JP2021011481A |
To provide a carboxylate capable of producing a resist pattern having good CD uniformity (CDU), and a resist composition containing the carboxylate.The carboxylate represented by formula (I), a carboxylic acid generator, and the resist c...
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JP2021011480A |
To provide a salt capable of producing a resist pattern having a good mask error factor (MEF), and a resist composition containing the salt.The salt represented by formula (I), an acid generator, and the resist composition are provided. ...
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JP2020189830A |
To provide a salt and the like capable of producing a resist pattern with good line edge roughness.A salt represented by formula (I) and a resist composition containing the same are provided. [R1-R3 each independently represent a halogen...
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JP6789034B2 |
To provide a salt, an acid generator, a resist composition and the like, from which a resist pattern can be produced with good CD uniformity.The salt is represented by formula (I); and the acid generator and the resist composition compri...
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JP2020180120A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition capable of producing a resist pattern having good line edge roughness (LER).A carboxylate represented by formula (I), a carboxylic acid generator, and a resi...
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JP2020173438A |
To provide a resist composition capable of producing a resist pattern having good CD uniformity (CDU).The resist composition contains: a resin containing a structural unit represented by formula (a2-A) and a structural unit having an aci...
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JP2020173436A |
To provide a salt and a resist composition capable of producing a resist pattern having good CD uniformity (CDU).The resist composition contains: a resin containing a structural unit represented by formula (a2-A) and a structural unit ha...
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JP6769783B2 |
To provide a salt, an acid generator, a resist composition and the like, from which a resist pattern can be produced with a good focus margin.The salt is represented by formula (I); and the acid generator and the resist composition compr...
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JP6768370B2 |
To provide a resist composition excellent in lithographic characteristics such as sensitivity and capable of forming a resist pattern having an excellent shape, a resist pattern forming method using the resist composition, and a compound...
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JP6757233B2 |
To provide a salt capable of producing a resist pattern with a good mask error factor, an acid generator, and a resist composition containing the same.The salt represented by formula (I), the acid generator, and the resist composition ar...
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JP6757234B2 |
To provide a salt capable of producing a resist pattern with a good focus margin, an acid generator, and a resist composition containing the same.The salt represented by formula (I), the acid generator, and the resist composition are pro...
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JP6741854B2 |
This invention discloses a novel cationic photoinitiator and a preparation method and use thereof. The cationic photoinitiator has a structure as represented by general formula (I) below. It can match a longer absorption wavelength in th...
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JP6702264B2 |
A resist composition comprising a base polymer and a sulfonium salt of iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.
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JP2020066595A |
To provide a novel fluorine-containing cyclic ester compound.The present invention provides a fluorine-containing cyclic ester compound represented by the following structural formula (1) [where, R is -C(=O)-, -S(=O)-, -S(=O)- or -P(=O) ...
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JP6689926B2 |
The invention relates to the field of organic synthesis, and especially relates to a sulfate preparation method. The invention provides a sulfate preparation method. According to the preparation method, a compound represented by a formul...
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JP2020050600A |
To provide a novel perfluoro six-membered ring compound.The perfluoro six-membered ring compound is represented by the general formula (1), where R represents -F or -CF.SELECTED DRAWING: None
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JP2020040940A |
To provide a salt capable of producing a resist pattern having a good mask error factor (MEF), and a resist composition containing the salt.The salt represented by formula (I) and the resist composition are provided. [In the formula, Ran...
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JP6664947B2 |
A salt represented by the formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; R1 represents a C1 to C12 alkyl group in which a methylene group may be replaced by an oxygen atom ...
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JP6659445B2 |
To provide a method for conducting debenzylation selectively without relating to hydrogenation and decomposition of a double bond in an organic compound with a specific structure having a benzyloxy group and a double bond.There is provid...
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JP2020029402A |
To provide a novel pest control agent, in particular, a bactericide and a nematicide.An alkylphenyl-substituted amide compound represented by formula (I), or a salt thereof, and a pest control agent containing the same are provided. In t...
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JP6650509B2 |
The present invention provides: an active light sensitive or radiation sensitive resin composition which is capable of forming a pattern that has low LWR and is suppressed in collapsing; a resist film; a pattern forming method; and a met...
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JP6624313B2 |
A salt represented by formula (I): in which X represents an oxygen atom, a sulfur atom or —N(SO2R5)—; R5 represents a C1-C12 alkyl group which can have a fluorine atom and in which a methylene group can be replaced by an oxygen atom ...
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JP6608451B2 |
The present application relates to spirobifluorene derivatives of a formula (I), to the use thereof in electronic devices, especially in organic electroluminescent devices (OLEDs), where they may be used in hole-transporting function, an...
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JP6589795B2 |
On use of a sulfonium salt of specific structure as PAG, acid diffusion is suppressed. A resist composition comprising the sulfonium salt forms a pattern with improved lithography properties including EL, MEF and LWR when processed by li...
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JPWO2018074569A1 |
A masterbatch containing the sulfide compound (A) and silica (B), wherein the sulfide compound (A) is of formula (I) :.[In formula (I), D represents an oxygen atom or a direct bond, and x represents 3 or 4. ], The silica (B) has the foll...
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JP6565322B2 |
A salt represented by formula (I): in which X represents an oxygen atom, a sulfur atom or —N(SO2R5)—; R5 represents a C1-C12 alkyl group which can have a fluorine atom and in which a methylene group can be replaced by an oxygen atom ...
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JP2019517563A |
Compounds containing benzo [d] [1,3] oxathiol, benzo [d] [1,3] oxathiol 3-oxide and benzo [d] [1,3] oxathiol 3,3-dioxide, and GPR119 Related uses / methods are provided, including treatment of diseases and conditions associated with dysr...
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JP6512049B2 |
A resist composition comprising a base polymer and a sulfonium salt of carboxylic acid containing nitrogenous heterocycle offers dimensional stability on PPD and a satisfactory resolution.
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JP6492515B2 |
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JP6488719B2 |
an acid-labile group having an acetal structure from which group a moiety having a fluorine-containing base-labile group is removed by bring into contact with the acid.
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JP6488718B2 |
A salt which has a group represented by formula (a): wherein Xa and Xb each independently represent an oxygen atom or a sulfur group; X1 represents a C1-C12 divalent saturated hydrocarbon group which has a hydroxy group; and * represents...
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JP6482344B2 |
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JP2019031496A |
To provide γ-diketone or an analog thereof for activating Wnt/β-catenin signal transduction and treating or preventing diseases related to the signal transduction.There is provided a compound of the formula I or a pharmaceutically acce...
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JP6459480B2 |
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JP6461919B2 |
Provided is an active light-sensitive or radiation-sensitive resin composition that comprises a resin (A) and a photoacid generator (B) that generates an acid when irradiated with active light or radiation. The photoacid generator (B) co...
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JP6458361B2 |
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JP6451638B2 |
The purpose of the invention of the present application is to provide a novel compound capable of improving performance of secondary batteries. This compound is represented by formula (1). By making an electrolyte contain this compound, ...
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JP6450660B2 |
A salt having a group represented by formula (a): wherein Xa and Xb each independently represent an oxygen atom or a sulfur atom, X1 represents a divalent group having an alicyclic hydrocarbon group where a methylene group may be replace...
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JP6449893B2 |
Certain compounds, or pharmaceutically acceptable salts or prodrugs thereof, are provided herein. Also provided are pharmaceutical compositions comprising at least one compound, or pharmaceutically acceptable salt or prodrug thereof, des...
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JP6449445B2 |
Compounds of the formula (I) (I), wherein X is O, S, a direct bond or CR16R17; Y is O or S; R1, R2, R3, R4, R5, R6, R7 and R8 for example are hydrogen, halogen, C1-C4alkyl, or a group of formula (II) or (III) (II) (III) provided that eit...
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JP6432327B2 |
A salt represented by formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group; Lb1 represents a C1-C24 divalent saturated hydrocarbon group or the like; R1, R2, R3 and R4 independently ...
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JP6430580B2 |
The present invention relates to the use of strobilurine type compounds of formula I and the N-oxides and the salts thereof for combating phytopathogenic fungi containing a mutation in the mitochondrial cytochrome b gene conferring resis...
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JP6398984B2 |
The objective of the present invention is to provide a novel compound which can improve the performance of a secondary battery. By including a compound represented by formula (1) in an electrolyte, capacity retention can be improved and ...
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JP6368501B2 |
To provide a nonaqueous electrolyte for batteries which enables the decrease in the rise in battery resistance owing to being stored, and the reduction in battery resistance after having been stored and further, enables the reduction in ...
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JP2018116086A |
To provide a resist composition having excellent lithographic characteristics and a resist pattern forming method using the resist composition.The resist composition, which generates acid upon exposure and whose solubility in a developer...
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