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WO/2023/227676A1 |
The present invention relates to the use of malonic acid monoamides and malonamide esters of the formula (I) wherein the variables are as defined in the claims and the description, for controlling unwanted vegetation, to a method for com...
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WO/2023/220461A1 |
Photo switchable photoinitiators comprising a photochromic molecule including one or more substituents and including a polycyclic group attached to the photochromic molecule as a substituent or to a substituent on the photochromic molecu...
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WO/2023/189961A1 |
This resist composition contains a resin component (A1) having: a constitutional unit (a01) derived from a compound represented by general formula (a0-1); and a constitutional unit (a02) including a lactone-containing cyclic group or the...
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WO/2023/189503A1 |
The present invention causes a radiation-sensitive composition to contain a polymer including acid-labile group and a compound (Q) given by formula (1). In formula (1), L1 represents an ester group, -CO-NR3-, a (thio) ether group, or a s...
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WO/2023/171670A1 |
This resist composition, which generates an acid by being exposed to light and of which the solubility in a developer changes due to the action of the acid, contains a resin component (A1) of which the solubility in a developer changes d...
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WO/2023/156453A1 |
There are disclosed psychedelic and entactogen compounds, the use of such compounds in the treatment of diseases associated with a serotonin receptor or monoamine transporter, pharmaceutical compositions such as tablet compositions and k...
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WO/2023/153296A1 |
Provided are a radiation-sensitive resin composition capable of forming a resist film with excellent sensitivity, LWR performance, water repellency, and suppression of development flaws, and having good storage stability; and a pattern f...
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WO/2023/153294A1 |
The purpose of the present invention is to provide: a radiation-sensitive resin composition which enables the formation of a resist film having excellent sensitivity, LWR performance, water repellency and development defect reducing prop...
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WO/2023/132713A1 |
The present invention relates to a method for preparing a cyclic sulfonic acid ester derivative compound, and aims to provide a preparation method capable of improving the yield and properties of the cyclic sulfonic acid ester derivative...
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WO/2023/120250A1 |
Provided is an actinic-ray-sensitive or radiation-sensitive resin composition, etc. that, when forming an ultra-fine pattern (for example, a line and space pattern of 25 nm or less, or a hole pattern with a hole diameter of 25 nm or less...
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WO/2023/119910A1 |
Provided is a radiation-sensitive composition containing: a polymer having an acid dissociable group; and at least one compound (b) selected from the group consisting of a compound represented by formula (1) and a compound represented by...
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WO/2023/066404A1 |
A disubstituted dihalogen phosphate additive, and a preparation method therefor and the use thereof. The molecular formula of the additive is as shown in formula A1 or A2, wherein one group of R1 and R2 is represented by structural formu...
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WO/2023/053977A1 |
The present invention provides a method for producing a salt (P) of an organic cation and an organic anion, the method comprising: (1) a step for obtaining a product which contains the salt (P) by subjecting a salt (I) of the organic cat...
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WO/2023/030279A1 |
Provided are a 3, 3-difluoroallylic onium salt as represented by formula (C), and a preparation method of the substance. Cheap industrial raw materials are used to prepare the important fluorine-containing reagent, which can be used as a...
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WO/2023/018276A1 |
The present invention relates to a precursor compound which can be used when preparing an annular sulfonic acid ester derivative compound, and a preparation method thereof.
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WO/2023/013592A1 |
A resist composition is adopted that contains a resin component, which has a constituent unit represented by general formula (a0-1), and a compound, which is represented by general formula (d0-1). In general formula (a0-1), R0 is a hydro...
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WO/2023/008127A1 |
An actinic ray-sensitive or radiation-sensitive resin composition is provided which has excellent storage stability and which enables excellent pattern shapes to be obtained when forming fine patterns (specifically, with a line width or ...
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WO/2023/008345A1 |
The present invention provides: an active light sensitive or radiation sensitive resin composition which contains a compound (I) that produces an acid when irradiated with active light or radiation, while having an ionic structure and a ...
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WO/2022/270627A1 |
Provided is a resist composition comprising a resin component (A1), a compound (B0) which is represented by general formula (b0), and a photo-disintegrable base (D0), a generated acid of which is a carboxylic acid having a pka of 0.3-2.5...
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WO/2022/265002A1 |
Provided is a resist composition comprising: a resin component having a constituent unit (a01a) having a polycyclic lactone-containing ring group and a constituent unit (a02) represented by general formula (a0-2); and a compound (B0) rep...
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WO/2022/264941A1 |
A resist composition which contains: a resin component (A1) having a constituent unit (a01) that contains an acid-cleavable group represented by formula (a01-r); and an acid generator component (B) that contains a compound (B0) represent...
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WO/2022/250347A1 |
The present invention relates to an organic sulfur compound preparation method, and more specifically to an organic sulfur compound preparation method in which an organic sulfur compound is synthesized by reacting a specific compound wit...
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WO/2022/203402A1 |
The present invention relates to: a compound represented by chemical formula I disclosed in the present specification, wherein the compound can reduce the flammability of a non-aqueous electrolytic solution when included in the non-aqueo...
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WO/2022/202345A1 |
The present invention provides: an actinic-ray-sensitive or radiation-sensitive resin composition comprising (A) a resin which decomposes by the action of an acid to increase in polarity and (B) a compound which generates an acid upon ir...
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WO/2022/172685A1 |
Provided are a method for forming a resist pattern having excellent performance including sensitivity during a light exposure process, LWR performance and CDU performance even when a next-generation light exposure technology is applied t...
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WO/2022/117575A1 |
The present invention refers to a route for the conversion of ethane to ethylene glycol which involves reacting ethane with concentrated sulfuric acid in the presence of an iodine compound. In particular, the present invention includes a...
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WO/2022/112351A1 |
The present invention relates to malonamide compounds of the formula (I) wherein the variables are as defined in the claims and the description, and to compositions comprising these compounds. The invention also relates to the use of sai...
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WO/2022/113814A1 |
Provided are: a radiation-sensitive resin composition able to exhibit satisfactory levels of sensitivity, LWR performance and CDU performance; a method for forming a pattern; and an onium salt compound. This radiation-sensitive resin com...
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WO/2022/092430A1 |
The present invention relates to a method for producing an organic sulfur compound, and more specifically relates to a method for producing an organic sulfur compound in which a specific compound is reacted with a metal hypohalite in the...
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WO/2022/092429A1 |
The present invention relates to a method for producing an organic sulfur compound, and more specifically relates to a method for producing an organic sulfur compound in which a specific compound is reacted with a metal hypohalite in the...
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WO/2022/092833A1 |
The present invention relates to a method for in-situ preparation of an organic sulfur compound, the method comprising: a solventless cyclization step in which dihalogen-based cyclization agent is fed to alkylene glycol, followed by stir...
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WO/2022/092834A1 |
The present invention relates to a method for preparing a cyclic sulfonic acid ester compound and has an effect of providing an economical method for preparing a cyclic sulfonic acid ester compound, in which by using a cyclizing agent al...
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WO/2022/048013A1 |
Disclosed is a method for preparing cyclic sulfate by direct oxidation of hydrogen peroxide, comprising: dropwise adding hydrogen peroxide into a mixture of cyclic sulfite, an organic solvent and a solid catalyst to carry out a catalytic...
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WO/2022/038171A1 |
There are disclosed psychedelic and entactogen compounds, the use of such compounds in the treatment of diseases associated with a serotonin 5-HT2 receptor, pharmaceutical compositions such as tablet compositions and kits containing the ...
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WO/2022/024928A1 |
The present invention addresses the problem of providing an actinic-ray-sensitive or radiation-sensitive resin composition capable of forming patterns having excellent LWR performance. Also provided are a resist film, a pattern formation...
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WO/2022/007259A1 |
A method for preparing ethylene sulfate, comprising: dropwise adding ethylene glycol into thionyl chloride, raising the temperature to 50-80°C, keeping the temperature for 2-4 h, and then vacuumizing to obtain a reaction solution contai...
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WO/2021/226675A1 |
The invention provides a zwitterionic plastic crystal (ZIPC) compound in the form of a single molecule comprising: at least one positively charged functional group carrying at least one positive charge, and at least one negatively functi...
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WO/2021/220648A1 |
Provided are a method for forming a resist pattern and a radiation-sensitive resin composition which, even when a next-generation exposure technology is applied thereto, have excellent performances concerning sensitivity during exposure ...
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WO/2021/200179A1 |
The present invention provides an actinic-ray-sensitive or radiation-sensitive resin composition comprising (A) a resin which increases in polarity by the action of an acid and (B) a compound which generates an acid upon irradiation with...
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WO/2021/172112A1 |
The present invention provides: an actinic ray-sensitive or radiation-sensitive resin composition, represented by specific general formula (1), containing (A) a resin, and (B) a compound that produces an acid when irradiated with actinic...
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WO/2021/161943A1 |
Provided is a method for producing a methylene disulfonate compound that is industrially advantageous and makes it possible to produce a methylene disulfonate compound easily and inexpensively by fewer raw materials. The method for pro...
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WO/2021/135207A1 |
Disclosed are a nitrogen-containing compound as represented by chemical formula 1, an electronic component, and an electronic device, the nitrogen-containing compound being capable of improving the performance of the electronic component...
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WO/2021/120838A1 |
Disclosed is an organic compound, an electronic device containing the organic compound, and an electronic apparatus having the electronic device. A main structure of the organic compound is a fused heterocyclic aromatic group containing ...
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WO/2021/111912A1 |
The purpose of the present invention is to provide a radiation-sensitive resin composition that exhibits a good sensitivity to exposure light and an excellent LWR performance and CDU performance, a method for forming resist patterns, a p...
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WO/2021/073736A1 |
The invention relates to new odoriferous substances or odoriferous substance mixtures, comprising a sensory active amount of the compounds of formula (I). The invention further relates to perfume oils, modified perfume oils, perfume subs...
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WO/2021/049592A1 |
Provided are a radiation-sensitive resin composition with which it is possible to form a resist pattern having excellent sensitivity to exposure light and having exceptional LWR performance and resolution, a resist pattern formation meth...
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WO/2021/039654A1 |
The present invention provides: an active-ray-sensitive or radiation-sensitive resin composition having a solid material concentration of 10% by mass or more, the active-ray-sensitive or radiation-sensitive resin composition comprising a...
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WO/2021/033200A1 |
The main object of present invention is to provide an economical and industrially applicable process for preparation of sultones of Formula (I). wherein n is 1-3 Sultones such as 1,3-propanesultone and 1,4-butanesultone are widely used a...
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WO/2021/028521A1 |
A process to reduce the odor of compounds with at least one five-membered cyclic monothiocarbonate group, shortly referred to as monothiocarbonate compounds, is provided, wherein the monothiocarbonate compounds are in a liquid phase and ...
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WO/2021/028522A1 |
A process for the purification of organic sulfur compounds is provided, wherein - the organic sulfur compounds are in a liquid phase and are brought into contact with an oxide of a metal from groups VIIb or VIIIb and an oxide of a metal ...
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