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Matches 501 - 550 out of 2,298

Document Document Title
JP5787624B2  
JP5771905B2
Provided is a radiation-sensitive resin composition for immersion exposure, a curing pattern forming method and a curing pattern ideally used in an immersion exposure process for exposing a resist film via a liquid for immersion exposure...  
JP5761863B2  
JP5759542B2
The present invention relates to a photo-reactive norbornene-based copolymer which has superior miscibility to various organic solvents or additives while exhibiting superior liquid crystal alignment property and can be preferably used t...  
JP2015132779A
To provide a photosensitive resin composition from which such a pattern film can be formed that maintains a high development residual film rate while having no development residue in the forming process of the pattern film, has excellent...  
JP5738097B2  
JP5736038B2  
JP5728762B2  
JP5728790B2  
JP5729079B2  
JP2015094910A
To provide a radiation-sensitive resin composition which gives a resin film excellent in exposure sensitivity and excellent in reliability under a high-temperature and high-humidity environment, and to provide a laminate including a resi...  
JP5712963B2
A polymer for use in resist compositions is obtained from a monomer having formula (1) wherein R1 is methyl, ethyl, propyl, vinyl or ethynyl, the circle designates C3-C12 cycloalkyl, a combination wherein R1 is ethyl and the circle is cy...  
JP2015067822A
To provide a resin composition which is excellent in temporal stability of dielectric characteristics and heat resistance and provides a crosslinked body excellent in transparency, mechanical characteristics and a balance between dielect...  
JPWO2013005429A
A forming object of the present invention is used for an optical component chosen from ftheta lens, an image pick-up lens, or a light guide plate, and contains polymer which has alicyclic structure in a part or all of a repetition struct...  
JPWO2013005429A1
本発明の成形体は、fθレンズ、撮像レンズ たは導光板から選ばれる光学部品に用いら 、繰り返し構造単位の一部または全部に脂 式構造を有するポリマーを含む。そし...  
JP2015025126A
To provide a modifier and a compatibilizing material for modifying an engineering plastic such as a polyamide or compatibilizing an engineering plastic with a polyolefin-based resin and to provide a resin composition containing each comp...  
JP2015025987A
To provide a resist protective film material that can prevent an overhang of a resist pattern caused by amine contamination in air and has a sensitizing effect on the resist film and thereby, can improve sensitivity of a resist film.The ...  
JP2015025880A
To provide a novel resist pattern forming method capable of improving nano-edge roughness and capable of suppressing the occurrence of outgassing while sufficiently satisfying sensitivity.The present invention is the resist pattern formi...  
JP5664576B2  
JP5663721B2  
JP2015007762A
To provide a negative photosensitive resin composition excellent in balance between resolution and time required for pattern formation, and to provide an electronic device and a polymer.There is provided the negative photosensitive resin...  
JP2014240470A
To provide a tire rubber composition or the like in which both of wear resistance and grip performance are improved to high levels.This invention provides a tire rubber composition comprising a phellandrene copolymer, the phellandrene co...  
JP2014232233A
To provide a photosensitive resin composition exhibiting an excellent balance between chemical resistance and other characteristics demanded for a photosensitive resin composition, and to provide an electronic device having the photosens...  
JP2014232232A
To provide a photosensitive resin composition capable of improving chemical resistance of a cured film, and to provide an electronic device.The photosensitive resin composition comprises a polymer expressed by formula (1), a crosslinking...  
JP2014224170A
To provide a cyclic olefin copolymer resin film which sufficiently suppresses phase difference in an in-plane or thickness direction to a low level and suppresses generation of wrinkles.A cyclic olefin copolymer composition is provided, ...  
JP2014224169A
To provide a cyclic olefin copolymer film in a thin film state, which sufficiently suppresses retardation in an in-plane or thickness direction to a low level and has excellent toughness.The cyclic olefin copolymer film includes an ethyl...  
JP2014218595A
To provide a crosslinked cyclic olefin resin composition which contains a crosslinked cyclic olefin resin, has excellent adhesiveness with a metallic material, and provides a crosslinked cyclic olefin resin film having, in a laminate wit...  
JP2014218569A
To provide a norbornene monomer excellent in high refractive index, low birefringence high abbe number, and adhesion with metals, and is suitable for optical materials, and to provide a norbornene polymer using the same.The norbornene po...  
JP2014195988A
To provide a film imparting various functions, by ameliorating problems of hardness, gas barrier, electric conductivity and low reflectivity of films made of cyclic olefin addition polymers which have excellent transparency, chemical res...  
JP5603039B2  
JP5597103B2  
JP5597102B2  
JP2012077296A5  
JP5594712B2  
JP2014167116A
To provide a fluorescent material which absorbs light or different wavelengths, and then emits the light again.There is provided a composition containing an organic polymer matrix, rare-earth metal nano clusters dispersed in the polymer ...  
JP5585508B2  
JP2014071304A5  
JP5577572B2  
JP5580800B2
A laminate including a supporting member which is light transmissive; a supported substrate which is supported by the supporting member; an adhesive layer which is provided on a surface of the supported substrate on which surface the sup...  
JP2014520935A
[Subject] Including a copolymer and this copolymer, it is useful to formation of a self-development film, and provides it with a constituent. [Means for Solution] At least one copy of a maleic anhydride type repeat unit is 開環 (ing) t...  
JP5576829B2  
JP2014136718A
To provide a polymer for improving operational reliability of an electronic device, a photosensitive resin composition, and an electronic device.The polymer comprises a copolymer expressed by formula (1) described below, which has a mole...  
JP2014137429A
To provide a photosensitive resin composition excellent in solvent resistance.The photosensitive resin composition comprises a polymer, a crosslinking agent and a photosensitive material. A film is formed from the photosensitive resin co...  
JP2014136720A
To provide a production method of a polymer by which an amount of a carboxyl group in the polymer can be adjusted.The production method of a polymer includes: a step in which a norbornene type monomer and maleic acid anhydride are co-pol...  
JP2014136717A
To stably produce a polymer for an electronic device.The polymer comprises a copolymer expressed by formula (1) described below and has an acid value of 15 mgKOH/g or more and 65 mgKOH/g or less on the polymer basis. In formula (1), l an...  
JPWO2012141000A1
An object of the present invention is for sensitivity and development nature to be good and to provide the resin composition or photosensitive resin composition containing the copolymer which gives the coloring pattern excellent in heat-...  
JP2014136719A
To provide a polymer for improving the operational reliability of an electronic apparatus, and a photosensitive resin composition including the polymer and an electronic apparatus made using the photosensitive resin.This invention relate...  
JPWO2012141000A
An object of the present invention is for sensitivity and development nature to be good and to provide the resin composition or photosensitive resin composition containing the copolymer which gives the coloring pattern excellent in heat-...  
JP2014137428A
To provide a photosensitive resin composition having a high film retention rate after development.The photosensitive resin composition comprises a polymer, a crosslinking agent and a photosensitive material. After the photosensitive resi...  
JP2014137426A
To provide a photosensitive resin composition which enables formation of a film with low dielectric constant.There is provided a photosensitive resin composition comprising a polymer composed of a copolymer of a specific structure, a the...  

Matches 501 - 550 out of 2,298