| Document |
Document Title |
|
JP4459908B2 |
A method for preparing a cyclic olefin polymer is described. The method includes polymerizing cyclic olefin monomers or a cyclic olefin monomer with ethylene to prepare a cyclic olefin polymer solution; slowly adding a non-solvent drop w...
|
|
JP2010090273A |
To provide a method which can advantageously produce a high-molecular-weight -pinene polymer under higher temperature conditions than in the past.The method for producing the -pinene polymer includes subjecting -pinene or a monomer group...
|
|
JP2010511746A |
Disclosed are processes for preparing an epoxidized and/or hydroxylated α-olefin/diene copolymer materials such as ethylene/dicyclopentadiene. These processes comprise contacting in a reaction medium a) a copolymeric precursor component...
|
|
JP4448767B2 |
A positive resist composition comprising (A) resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and capable of decomposing by the action of an acid to increase the solubility in an alkaline developer, (B) a compound ...
|
|
JP4447224B2 |
|
|
JP4439686B2 |
|
|
JP4432903B2 |
A polymerizable composition which comprises a cycloolefin monomer (A), a filler (B), a polymer (C) having a carboxyl group or a carboxylic acid anhydride group and having an acid value of 0.1 to 100 mgKOH/g, and a metathesis polymerizati...
|
|
JP4433933B2 |
|
|
JP2010031191A |
To provide an optical film having not only developability of a high retardation value but also reverse wavelength dispersiveness.The reverse wavelength dispersive resin is a polymer (A) comprising the alkylidene norbornenes (a1) shown by...
|
|
JP4409366B2 |
|
|
JP2010006985A |
To provide a dampproof molding material which contains as a resin component a hydride of a copolymer excellent in solution stability when produced and which has high transparency, high dampproof properties and moderate heat resistance, a...
|
|
JP4395997B2 |
|
|
JP4393010B2 |
A chemically amplified resist composition which comprises a base resin reacting in the presence of an acid, a photo acid generator generating an acid upon exposure, and a compound having the combination of an acetal moiety and a site whi...
|
|
JP4388429B2 |
|
|
JP4382925B2 |
The present application relates to polymeric resinous material comprising (1) from 5 to 70 weight percent units derived from limonene; (2) from 5 to 70 weight percent units derived from dicyclopentadiene; (3) from 5 to 45 weight percent ...
|
|
JP4386200B2 |
|
|
JP4375785B2 |
|
|
JP2009256468A |
To provide a polymer of fluorine-containing norbornenes having a chemically stable terminal structure and narrow molecular weight distribution.A method of producing the fluorine-containing polymer essentially comprising a repeating unit ...
|
|
JP4347179B2 |
A chemically amplified resist composition includes a novel polymer, a photoacid generator, and a solvent. The chemically amplified resist can form a resist pattern that is excellent in adhesiveness with a low dependency to the substrate,...
|
|
JP2009235286A |
To provide a copolymer of a cyclic olefin monomer having a polar group and a 2-12C -olefin monomer, excellent in heat resistance, strength and molding workability, and a production method therefor free from generation of black metal deri...
|
|
JP2009235414A |
To provide a polycyclic polymer and a polycyclic resist composition useful for a photoresist composition transparent to a short wavelength of image focusing irradiation, and having resistance in a dry etching method.The present invention...
|
|
JP4344119B2 |
Photoresist monomers, polymers thereof, photoresist compositions containing the same for preventing acid generated in the exposed area during the course of a photolithography process from being diffused to the unexposed area. The line ed...
|
|
JP4336326B2 |
A polymerization catalyst for the polymerization and copolymerization of olefin monomers and the copolymerization of olefin monomers with other monomers selected from, for example, norbomenes and styrenes are disclosed. The polymerizatio...
|
|
JP2009215379A |
To provide a film having low hygroscopicity and moisture permeability, adequate elasticity, no fragility, and excellent mechanical strength, and to provide a polarizing plate using the film and an image display.The film contains a copoly...
|
|
JPWO2007129528A1 |
Maintains excellent light stability over a long period of time. The objective lens 10 as an optical element according to the present invention is an optical element composed of a resin composition, wherein the resin composition is a ther...
|
|
JP4327360B2 |
Photoresists and associated processes for microlithography in the extreme, far, and near UV are disclosed. The photoresists in some embodiments comprise (a) a fluorine-containing copolymer comprising a repeat unit derived from at least o...
|
|
JP2009185298A |
To provide a new photoresist composition having sufficiently low optical density for short wavelength radiation at 193 nm and below.A method of polymerizing polycyclic olefin monomers encompassing (a) combining a monomer composition cont...
|
|
JP2009179749A |
To provide a norbornene-based polymer film having good peeling-off properties and high productivity.The norbornene-based polymer comprises 0.01-2.00 mol%, in the total repeating units, of a repeating unit (1) derived from a norbornene-ba...
|
|
JP2009179769A |
To provide an organic and inorganic composite material having a high transparency and refractive index, and excellent in heat resistance and moldability.This organic and inorganic composite material is provided by dispersing inorganic fi...
|
|
JP4312268B2 |
The present invention relates to polymerizable compositions for the manufacture of optical lenses with a high refractive index and a high Abbe number, and optical lenses comprising these compositions.
|
|
JP4307663B2 |
The resist composition includes a polymer containing the following units (A) and a compound of acid generating dosage (B). In accordance with the present invention, it can provide a low-cost positive type resist composition for ArF excel...
|
|
JP4310028B2 |
|
|
JP4305637B2 |
|
|
JP2009161770A |
To provide another new resist composition for use at a wavelength of 193 nm or lower, in particular at a wavelength of 157 nm, which has not only high transparency at these short wavelengths but also other key properties including good p...
|
|
JP4299775B2 |
A process for the preparation of ethylene polymers is disclosed, comprising the polymerization reaction of ethylene in the presence of a catalyst consisting of the reaction product of: (A) a mixture of the racemic and meso isomers of a s...
|
|
JP4300774B2 |
|
|
JP4298863B2 |
The present application relates to a pneumatic tire having a tread comprised of (a) a diene-based elastomer containing olefinic unsaturation and (b) from 1 to 50 phr of polymeric resinous material comprising from 4 to 60 weight percent u...
|
|
JP4290328B2 |
An ethylene cyclic olefin polymer, particularly an ethylene/norbornene copolymer and an ethylene/norbornene/alpha olefin terpolymer resin, of improved toughness and processibility for film production. This invention provides ethylene bas...
|
|
JP4289121B2 |
|
|
JP4275284B2 |
|
|
JP2009120857A |
To produce a polymer having a sufficiently high impact resistance for industrial uses.The polymer blend includes at least one of cycloolefin copolymers, and at least one core-shell particle, or at least one of copolymers constituted part...
|
|
JP4268249B2 |
The present invention relates to a novel maleimide- or alicyclic olefin-based monomer, a copolymer resin of these monomers and a photoresist using the copolymer resin. The maleimide-introduced copolymer resin according to the present inv...
|
|
JP2009108332A |
To provide a catalyst composition and its preparation method and a use of the catalyst composition for preparing a polymer from an ethylenic unsaturated monomer.The catalyst composition contains a pair of cationic metal complexes contain...
|
|
JP2009108282A |
To provide a resin material capable of providing an optical component having both high refractive index and high Abbe number, and an optical component such as an optical lens obtained using the resin material.An alicyclic structure-conta...
|
|
JP4266101B2 |
|
|
JP2009079087A |
To provide a cyclic olefin resin sheet or film with low moisture absorption properties and moisture permeability which has few defects resulting from a gel component formed in a synthetic process of the cyclic olefin resin.The cyclic ole...
|
|
JP2009079098A |
To provide a film having low hygroscopicity, low moisture permeability, moderate elasticity, no brittleness and excellent mechanical strength, and a polarizing plate and an image display using the same.The film comprises a copolymer of (...
|
|
JP4254745B2 |
|
|
JP2009073979A |
To provide a copolymer which has low hygroscopicity and low moisture permeability and has moderate elasticity and excellent mechanical strength and no brittleness, and to provide a molded article, film, polarizing plate and image display...
|
|
JP4247592B2 |
|
