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Patent Searching and Data


Matches 801 - 850 out of 1,695

Document Document Title
JP2009046614A
To provide a cycloolefin copolymer that effectively exhibits reverse wavelength dispersion of birefringence, and a film composed of the copolymer.The cycloolefin copolymer is obtained by addition polymerization of at least one non-cycloo...  
JP2009046613A
To provide a cycloolefin copolymer that effectively exhibits wavelength dispersion of birefringence, and a film composed of the copolymer.The cycloolefin copolymer is obtained by addition polymerization of at least one non-cycloolefin mo...  
JP4232632B2
There is provided a fluorine-containing copolymer having an aliphatic monocyclic structure in the polymer trunk chain which has a number average molecular weight of from 500 to 1,000,000 and is represented by the formula (Ma): - (M1) - (...  
JP4230733B2
To provide a heat-shrinkable laminated polyolefin film which is excellent in heat-shrinkage finish and heat resistance, can be suitably used as a label stuck to a PET bottle for a hot drink, and is accurately applicable to segregated rec...  
JP2009035746A
To provide a norbornene-based addition copolymer obtained by copolymerizing (a) a norbornene-based monomer having a carbon-carbon unsaturated bond in addition to a norbornene ring.The norbornene-based addition copolymer including an unsa...  
JP4222700B2
The present invention discloses a cross-linking monomer for a photoresist polymer represented by following Chemical Formula 1:wherein, V represents CH2, CH2CH2, oxygen or sulfur; Y is selected from the group consisting of straight or bra...  
JP2009029848A
To provide a polymer having high sensitivity and high resolution and causing little defect in development when it is used for a resist composition in DUV excimer laser lithography and the like.The polymer contains at least one constituen...  
JP2009024019A
To provide fulvene-based compounds, and to provide a production method thereof.A fulvene compound having substituents at 2,5-positions by using as a starting material an unsaturated ketone having a substituent at -position and a halogen ...  
JP2009003439A
To provide: an optical film having high birefringence, that is, a large phase-difference in a surface direction of a film and in a depth direction thereof, the optical film being useful as a retardation film; an optical member having the...  
JP4205061B2
A negative resist composition and a method of forming a resist pattern that are capable of suppressing resist pattern swelling are provided. The negative resist composition includes an alkali-soluble resin component (A), an acid generato...  
JP4200145B2
The present invention provides a polymer represented by the following formula 1 and a chemically amplified resist composition including the polymer, which resist composition is excellent in adhesion, storage stability and dry etch resist...  
JP2008304947A
To provide an optical waveguide and an optical waveguide structure excelling in heat resistance, low in water absorbing properties and kept low in material cost.The optical waveguide structure 9 has an optical waveguide 90 having a core ...  
JP4197493B2
A cyclic conjugated diene copolymer comprising a main chain comprised of (A) cyclic conjugated diene monomer units, (B) monomer units obtained from vinyl aromatic monomers each having a hydrogen atom at the alpha-position thereof, and op...  
JP2008299350A
To provide a positive photoresist composition having superior sensitivity in the resolution of contact holes in the production of a semiconductor device, the photoresist composition preventing the occurrence of particles in the dissoluti...  
JP2008299351A
To provide a positive photoresist composition having superior sensitivity in the resolution of contact holes in the production of a semiconductor device, the photoresist composition preventing the occurrence of particles in the dissoluti...  
JP2008285656A
To provide cycloolefin copolymers characterized by racemic diad polycyclic units and triad polycyclic units, methods for producing the same, and selected catalysts which can be used for these methods.The cycloolefin copolymers can be pro...  
JP4186213B2
To provide a cyclic olefin copolymer moldable by solution casting method or the like because of being good in solubility to hydrocarbon solvent, having especially low coefficient of linear expansion and good in dimensional stability whil...  
JP4183815B2
The present invention relates to a semiconductor device using a copolymer-containing photoresist, and a process for manufacturing the same. As a norbornene derivative (monomer) having a hydrophilic group is synthesized and introduced to ...  
JP4181760B2  
JP4183283B2
The invention relates to a method for producing a cycloolefin copolymer by polymerization of 0.1-99.0 wt %, with respect to the total amount of monomers, of at least one polycyclic, 0-99.9 wt. %, with respect to the total amount of monom...  
JP4174968B2
A norbornene polymer comprising a repeating unit derived from a norbornene monomer having a cyclic hydrocarbon structure (I) derived from the norbornene ring which constitutes at least a part of the main chain, another cyclic hydrocarbon...  
JP4160374B2
Photosensitive polymers containing repeat units with a 2,2,4,4,4-pentafluoro-1,3,3-trihydroxybutyl group or a 3,3-difluoro-4-hydroxy-4-trifluoromethyloxetan-1-yl group. Photosensitive polymers (I) with an average mol. wt. of 3000-100000 ...  
JP4159601B2
The invention discloses methods of preparing copolymers from norbornene-type monomers and cationically polymerizable monomers or polymers from catalytically polymerizable monomers by employing Group VIII transition metal ion source in a ...  
JP4155253B2  
JP4156599B2
A positive photoresist composition comprises a radiation sensitive acid generator, and a polymer that includes a first repeating unit derived from a sulfonamide monomer including a fluorosulfonamide functionality, a second repeating unit...  
JPWO2006104049A1
The present invention is a copolymer obtained by addition-copolymerizing (A) a norbornene-based monomer, (B) an aromatic vinyl compound, and (C) an α-olefin having 2 to 20 carbon atoms. The sum of (A) the abundance of the repeating unit...  
JP4136996B2
To provide a method for molding an article free from a fish-eye generated when a cyclic olefin copolymer is melt-molded. In the method for melt-molding an article using a thermoplastic norbornene resin composed of a cyclic olefin and an ...  
JP4133376B2  
JP4133399B2
A polymer comprising recurring units of (1a) or (1b) wherein R1 is an acid labile group, adhesive group or fluoroalkyl, R2 is H, F, alkyl or fluoroalkyl, R3 and R4 each are a single bond, alkylene or fluoroalkylene, R5 is H or an acid la...  
JP2008179824A
To provide a photosensitive polymer which upgrades the characteristics, such as transmittance and resistance to dry etching, of a resist composition, thus enabling still more detailed pattern formation.The photosensitive polymer has a st...  
JP4129433B2
A poly(alpha-olefin) copolymer obtained from the polymerization of at least one alpha-olefin having from 2 to about 20 carbon atoms and at least one bulky olefin, the process comprising polymerizing the monomers in the presence of hydrog...  
JP4126539B2  
JP4128417B2
To provide a polymer for a chemical amplification type photoresist suitable for ArF excimer laser, and further to provide a photoresist composition. This polymer for the chemical amplification type photoresist is represented by general f...  
JP2008163347A
To provide a photosensitive polymer which improves characteristics of a resist such as a high transmittance and good dry etching resistance and which can form a fine pattern.The photosensitive polymer having the structural formula can so...  
JP4116235B2  
JP4109715B2
The present invention refers to a resin composition comprising an ester compound and a polymer, wherein the ester compound and the polymer are obtainable by reacting a diene, a dienophile and a carboxylic acid. The invention also encompa...  
JP4111016B2  
JP4107055B2  
JP4107946B2
A photosensitive polymer comprises a fluorinated ethylene glycol group and a chemically amplified resist composition including the photosensitive polymer. The photosensitive polymer has a weight average molecular weight of about 3,000-50...  
JP4107064B2
To provide an extruded product having transparency and heat resistance equal to those of a conventionally well known light guide plate comprising a cyclic olefinic resin, industrially suitably produced with excellent productivity and eco...  
JP4107081B2
To provide an injection molded product which can be widely used for application to optical parts since which is obtained from a resin material for molding containing a specified cyclic olefinic copolymer, which does not cause thermal deg...  
JP2008519882A
A method of copolymerizing cyclic olefins and polar vinyl olefins, a copolymer produced by the method, and an optical anisotropic film including the copolymer are provided. According to the copolymerization method, a cyclic olefin and a ...  
JPWO2006067950A1
(1) 5 to 80 mol% of a cyclic olefin compound having a substituent selected from an alkyl group represented by the following formula (1), an alkylsilyl group and an alkylsilylmethyl group, and (2) represented by the following formula (2)....  
JPWO2006057309A1
The present invention provides a retardation film made of a norbornene-based copolymer having excellent heat resistance, low specific gravity, low birefringence, low photoelasticity, low wavelength dispersibility, and high retardation co...  
JP4088672B2  
JP4085034B2
There is disclosed a polymer containing at least a repeating unit represented by the following general formula (1), and the resist composition containing the polymer as a base resin, especially a chemically amplified resist composition. ...  
JP4080916B2
A copolymer is provided for use in a lithographic photoresist composition, particularly a chemical amplification photoresist. In a preferred embodiment, the copolymer is substantially transparent to deep ultraviolet radiation, i.e., radi...  
JP4075610B2  
JP4075261B2  
JP4075789B2
[Means to solve problems] The process for preparing a cycloolefin addition polymer comprises addition-polymerizing monomers containing a specific cycloolefin compound in the presence of ethylene and a multicomponent catalyst containing, ...  

Matches 801 - 850 out of 1,695