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Matches 651 - 700 out of 1,662

Document Document Title
JP2008536956A
A top-coat composition comprising a non-self imageable polymer consisting of norbornene-type repeating units, said polymer comprising a first norbornene-type repeating unit represented by Formula I: where X is -CH 2 -, -CH 2 CH 2 -, O or...  
JP2008202003A
To provide a norbornene-based compound with good efficiency by using an organopalladium complex stable in air and preservable for a long period of time.The method of manufacturing a homo-or co-polymer of a norbornene-based compound which...  
JP2008202059A
To provide a polymer which can be suitably used as a base polymer for a resist using ArF excimer laser as a light source, that is, a novel polymer capable of satisfying characteristics such as transparency at 193 nm, dry etching resistan...  
JP4139948B2
There is provided a chemically-amplified resist composition having high transparency to light having a wavelength of 220 nanometers or smaller, excellent resistance to etching, and excellent adhesion to a substrate. The chemically-amplif...  
JP4137406B2  
JP4127941B2
The present invention relates to a cross-linker for photoresist compositions which is suitable for a photolithography process using KrF (248 mn), ArF (193 mn), E-beam, ion beam or EUV light sources. Preferred cross-linkers, according to ...  
JP4123343B2  
JP4118508B2
Ruthenium complexes of the formula I or IVwhereX, Y are anionic ligands,R is hydrogen or a substituted or unsubstituted C1-C20-alkyl radical or C6-C20-aryl radical andL1 and L2 are, independently of one another, uncharged electron donor ...  
JP2008156569A
To provide a method of removing impurities such as catalyst residue, particularly, impurities containing metals from a norbornene compound polymer hydrogenated substance solution in high removing efficiency without damaging the productiv...  
JP4116340B2  
JP4102889B2  
JP4096241B2
A rubber roller formed by molding an elastomer composition not less than 250 mus nor more than 400 mus in a T 2 relaxation time (spin-spin relaxation) of a bound rubber formed between a rubber and/or a thermoplastic elastomer and a reinf...  
JP4092756B2  
JPWO2006043617A1
The present invention has a resin layer of a resin composition containing a cyclic olefin resin (A) having an epoxy group and a photoacid generator (B) on a circuit element forming surface, and the residual stress of the resin layer afte...  
JP2008115379A
To provide a process for producing a cycloolefin addition polymer that can achieve the production of a homogeneous cycloolefin addition polymer having a narrow molecular weight distribution, a controlled molecular weight and excellent ba...  
JP4088672B2  
JP2008101169A
To provide a method for obtaining a polymer solution of a sufficiently lowered metallic component content by effectively removing a metallic component from a polymer solution by a simple additional step.The method for removing the metall...  
JP4085034B2
There is disclosed a polymer containing at least a repeating unit represented by the following general formula (1), and the resist composition containing the polymer as a base resin, especially a chemically amplified resist composition. ...  
JP4081640B2  
JPWO2006006399A1
[Summary] [Problem] To provide a thermoplastic resin capable of obtaining a highly heat-resistant molded product having little change in performance due to water absorption and excellent optical performance, and a molded product made of ...  
JP4079799B2  
JP4079893B2
The present invention relates to a fluorine-containing cyclic compound of formula (5): wherein R2-R4 and R9-R15 are independently a hydrogen atom, a halogen atom, or a C1-C25 straight-chain, branched or cyclic alkyl group, and may contai...  
JP2008088247A
To provide a method for producing a norbornene polymer having a fluorosulfonyl group, and an electrolyte membrane for a fuel cell by using the polymer.This method for obtaining a polymer containing a unit expressed by formula (a) is prov...  
JP4075789B2
[Means to solve problems] The process for preparing a cycloolefin addition polymer comprises addition-polymerizing monomers containing a specific cycloolefin compound in the presence of ethylene and a multicomponent catalyst containing, ...  
JP2008081655A
To provide a norbornene polymer which can be used in producing a film having the property of developing a negative Rth, a film using the norbornene type polymer, a polarizing plate using the film, and a liquid crystal display device usin...  
JP4073255B2  
JP4072063B2
The present invention provides a method for producing a film forming resin suitable for use in a photoresist composition, involving the following steps: (a) providing a solution of a film forming resin in a solvent; (b) providing the fol...  
JP4067251B2
The present invention relates to novel monomers which can be used to form photoresist polymers and photoresist compositions using the same which are suitable for photolithography processes employing a far ultraviolet light source, copoly...  
JP2008065061A
To provide an optical film made of cyclic olefin based resin homogeneous in thickness direction and superior in transparency, in industrial manufacture of a long film, and a method of manufacturing the same.The optical film contains cycl...  
JP4064667B2  
JP2008050415A
To provide a method for producing a terpene and/or allylphenol-based polymer, advantageous in industrial production.The method for producing the terpene and/or allylphenol-based polymer involves polymerizing the terpene-based compound ha...  
JP4056345B2  
JP4056318B2
To provide a positive resist composition which improves edge roughness of a pattern, remedies the problem of development defects and gives an excellent resist pattern profile. The positive resist composition comprises (A) a resin having ...  
JP4052943B2
A monomer containing an electron-withdrawing group of the present invention is represented by following Formula (a), (b) or (c): wherein A1, A2, and A3 are each a ring; Ra, Rb, Rc, and Ru are the same or different and are each a hydrogen...  
JP2008031292A
To provide a film stretchable at an industrially appropriate temperature and manifesting wide-ranging retardation.The film is comprised of a norbornene polymer having a recurring unit represented by general formula (1). In formula (1), L...  
JP2008031319A
To provide a norbornene polymer film whose retardation has reverse wavelength dispersion characteristics.The film is comprised of a norbornene polymer containing a recurring unit represented by general formula (I). In the formula, R1 and...  
JP4046314B2
Compositions suitable for forming planarizing underlayers for multilayer lithographic processes are characterized by the presence of (A) a polymer containing: (i) cyclic ether moieties, (ii) saturated polycyclic moieties, and (iii) aroma...  
JP4044947B2
Metallocenes of formula (XI) are new, wherein M<1> = Ti, Zr, Hf, V, Nb or Ta; R<14>, R<15> = H, halogen, 1-10 C alkyl, 1-10 C alkoxy, 6-10 C aryl, 6-10 C aryloxy, 2-10 C alkenyl, 7-40 C arylalkyl, 7-40 C alkylaryl or 8-40 C arylalkenyl; ...  
JP4041335B2
Photoresist polymers, and photoresist compositions using the polymer are disclosed. More specifically, photoresist polymers containing maleimide represented by Formula 1. Photoresist compositions including the photoresist polymers have e...  
JP4038675B2  
JP2008013770A
To provide an aliphatic resin which is controlled with respect to the softening point and the molecular weight and which is useful for imparting tackiness; a manufacturing method thereof; and a pressure-sensitive adhesive composition con...  
JP4037099B2  
JP2008006807A
To provide a high-quality cellulose acylate film and a saturated norbornene resin film, and the process for producing them since the cellulose acylate film and the saturated norbornene resin film which are produced by a melt film formati...  
JP2008007733A
To provide an optical form excellent in low birefringence and low in water absorption.A spiro ring-containing norbornene derivative of the formula(1) ( wherein, R1 and R2 are each H, a 1-20C hydrocarbon group or a group containing haloge...  
JP4034538B2
Disclosed is a polymer compound for photoresist characterized in that the polymer compound is formed of a polymer compound having at least one skeleton represented by the following general formula (1), general formula (2A), general formu...  
JP4034896B2  
JP4025076B2
To provide a positive photosensitive composition which is improved inline edge roughness and excellent in profile. The positive photosensitive composition is characterized in containing (A1) at least one compound which generates an aroma...  
JPWO2005085303A1
Provided is a curable composition which is excellent in transparency, light resistance (particularly short wavelength light having a wavelength of 200 to 500 nm), and heat resistance, and gives a fluorine-containing cured product having ...  
JP4018101B2  
JP4016765B2
To provide a pattern forming method capable of forming a dense pattern independently of standing waves and capable of further forming a resist pattern having a high aspect ratio by using an underlayer film excellent in dry etching resist...  

Matches 651 - 700 out of 1,662