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JP2017181696A |
To provide a radiation-sensitive resin composition excellent in sensitivity, LWR performance, and film thickness reduction-preventing properties.This invention relates to a radiation-sensitive resin composition, comprising: a first polym...
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JP6185603B2 |
This disclosure relates to a base film, a laminated structure including the same, and a display device. More specifically, this disclosure relates to a base film that includes a polymer having a cyclic olefin-based repeat unit containing...
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JP2017518423A |
The present invention relates to a polyolefin having excellent environmental stress crack resistance and processability by having a large molecular weight, a wide molecular weight distribution and a high long chain branching content. Acc...
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JPWO2015141525A1 |
The photosensitive resin composition is a photosensitive resin composition used for forming a permanent film, contains a polymer having a cyclic olefin structural unit, and has a PED of 10% or less measured under a specific condition (A)...
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JP6097216B2 |
Embodiments in accordance with the present invention provide for the use of polycycloolefins in electronic devices and more specifically to the use of such polycycloolefins as gate insulator layers used in the fabrication of electronic d...
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JP6090880B2 |
The present invention relates to a a base film, a laminated structure comprising the same, and a display device. More specifically, a transparent base film including a polymer having a cyclic olefin-based repeating unit including an exo ...
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JP2017014508A |
To provide a manufacturing method of an olefin polymer capable of providing the olefin polymer at high yield by suppressing side reactions.A manufacturing method of an olefin polymer by polymerizing an olefin monomer in presence of conce...
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JP6062407B2 |
A release layer of a release film for producing a membrane electrode assembly of a polymer electrolyte fuel cell comprises a cyclic olefin polymer comprising an olefin unit having a C 3-10 alkyl group as a side chain thereof. The release...
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JP6003873B2 |
A resist composition comprising a polymer comprising recurring units (a) of formula (1) and having a Mw of 1,000-500,000 as base resin is provided. R1 is H or methyl, X is a single bond or —C(═O)—O—R5—, R2 is a single bond or C...
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JP6003973B2 |
Some embodiments in accordance with the present invention relate to norbornene-type polymers and to photosensitive dielectric resin compositions formed therefrom. Other embodiments relate to films formed from such compositions and to dev...
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JP2016161886A |
To provide a composition for forming an underlay film enhancing heat resistance while increasing clarity of a phase separation structure by a self assembly and rectangle property of a pattern, a method for forming an underlay film and a ...
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JP5932793B2 |
The invention relates to the use of polycycloolefins in electronic devices and more specifically to the use of such polycycloolefins as interlayers applied to insulating layers used in electronic devices, the electronic devices that enco...
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JP5888982B2 |
The present invention relates to a photoreactive norbornene polymer comprising a photoreactive norbornene monomer, a process for preparing the same, and an alignment layer using the same. The photoreactive norbornene polymer includes a p...
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JP5870091B2 |
Disclosed therein are a photoreactive polymer, and an alignment layer comprising the same that exhibit excellences in alignment rate and alignment stability. The photoreactive polymer comprises a cyclic olefin-based repeating unit with a...
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JP5849889B2 |
As a permeable membrane of an air conditioning system that performs as supply to a space to be air conditioned through the permeable membrane and/or gas discharge from the space to be air conditioned through the permeable membrane, an as...
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JP5842459B2 |
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JP5842741B2 |
A negative pattern is formed by applying a resist composition onto a substrate, prebaking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to dissolve the unexposed ...
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JP5834017B2 |
The invention relates to a catalyst for the polymerization of norbornene monomers comprising transition metal complex (A) represented by formula (1); and a method for producing a norbornene (co)polymer, especially a norbornene copolymer ...
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JP2015533883A |
INDUSTRIAL APPLICABILITY The present invention easily changes the orientation direction according to the polarization direction, and thus can be suitably applied to an alignment film of a stereoscopic display device, a photo-alignment po...
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JP5816128B2 |
Provided are a photoreactive polymer that includes a multi-cyclicmulticyclic compound at as its main chain and a method of preparing the same. The photoreactive polymer exhibits excellent thermal stability since it includes a multi-cycli...
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JP5814503B2 |
PURPOSE: A thermosetting composition is provided to be used as a material of a printed circuit board which is light, thin, simple, and small due to excellent thermosetting property, processability, impregnation property, and thermal prop...
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JP5803498B2 |
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JP5803497B2 |
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JP2015182957A |
To provide a new compound which can improve the reliability of material used in the production process of an electronic apparatus.A compound is shown by the formula (1), where n is 0, 1 or 2, X is a single bond or a 1-6C bivalent organic...
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JP5798277B1 |
Embodiments of the present invention provide the formation of various polycycloalkyl polynorbornene polymers and copolymers useful for the formation of pervasion membranes, the membranes themselves, and methods for making such membranes.
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JP5798100B2 |
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JP5791418B2 |
Conventional cross-linked cyclic olefin polymers do not have a sufficiently low linear expansion coefficient. A compound having a structure represented by the following formula (a).
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JP2015172135A |
To provide a method for polymerizing an unsaturated bicyclo compound capable of efficiently obtaining an oligomer from an unsaturated bicyclo compound by increasing the reaction rate and suppressing generation of by-products, and to prov...
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JP5769711B2 |
The present invention relates to a novel metallocene compound, a catalyst composition including the compound and an olefin polymer prepared using the same. The metallocene compound and the catalyst composition can be used for preparing t...
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JP5738097B2 |
A catalyst for a polymerization of norbornene monomers includes a transition metal complex represented by a formula (1). A method for producing a norbornene copolymer includes copolymerizing first norbornene monomers corresponding to a f...
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JP5735220B2 |
Provided are new resins that comprise multi-ring, aromatic and/or multi-cyclic ester unit which preferably are photoacid-labile. Also provided are chemically-amplified positive photoresist that comprise such resins as well as multi-ring,...
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JP5728539B2 |
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JP5721913B2 |
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JP2015086223A |
To provide a purification method of alicyclic monoolefin ester, in which method the high-purity alicyclic monoolefin ester useful as a polymerizable monomer for forming a crosslinked resin molding to be used as an insulating material or ...
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JP5712209B2 |
The inventions describe disclosed and described herein relate to ambipolar small molecule host materials for guest phosphorescent metal complexes. Methods of making the ambipolar small molecules are also described. These ambipolar small ...
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JP2015509660A |
The present invention comprises an organic electronic device comprising a polycycloolefin flattening layer, more particularly a flattening layer disposed between a substrate and a functional layer such as a semiconductor layer, a dielect...
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JPWO2013005429A1 |
The molded article of the present invention is used for an optical component selected from an fθ lens, an imaging lens or a light guide plate, and contains a polymer having an alicyclic structure in a part or all of a repeating structur...
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JP5673337B2 |
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JP5656349B2 |
To provide materials, and methods that use such materials, that are useful for forming chip stack structure, chip and wafer bonding and wafer thinning. The surface of a substrate 10 is coated by a photosensitive polymer, having a weight-...
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JP2014240500A |
To provide a photoreactive polymer and an alignment layer comprising the same that exhibit excellent alignment rate and alignment stability.The photoreactive polymer comprises a cyclic olefin-based repeating unit with one or more photore...
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JP5629454B2 |
A polymerizable compound having a lactone structure represented by formula (1) is provided: wherein A represents a polymerizable site; R2 represents a single bond or an alkylene group; R3 represents a hydrocarbon group in which hydrogen ...
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JP5624759B2 |
Provided is a polymerizable compound represented by the following general formula (ca-1) or (cb-1): wherein the variables in the formulae are defined in the specification.
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JP5624917B2 |
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JP2014172170A |
To solve a problem that a window block used in a window part for detection of a substrate polishing endpoint deteriorates when exposed to light with wavelengths shorter than 400 nm.A multilayer chemical mechanical polishing pad is provid...
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JP5591777B2 |
Disclosed therein is a novel cyclic olefin compound having a photoreactive group and a novel photoreactive polymer. The cyclic olefin compound is applicable to various photoreactions, such as of liquid crystal alignment films and can be ...
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JP5584475B2 |
The present invention relates to a norbornene polymer that comprises a norbornene monomer having a photoreactive functional group, and a method of manufacturing the same. The norbornene polymer comprises at least 50 mol % of exo isomers ...
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JP5561271B2 |
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JP5560709B2 |
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JP5549397B2 |
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JP5540784B2 |
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