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JP5505538B2 |
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JP5499889B2 |
To provide an acid-cleavable ester monomer having a spiro ring structure and useful for producing a base resin giving a resist material having high resolution and small PEB temperature dependency, a polymer compound produced by using the...
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JP5481944B2 |
There is provided a fluorine-containing polymer having a repeating unit of the general formula (2) and produced by homopolymerization or copolymerization with an other polymerizable double bond-containing monomer. In the formula, W repre...
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JP5480850B2 |
To provide a photoreactive polymer and a preparation method of the photoreactive polymer.A photoreactive polymer exhibits a more rapid photoreaction speed and an excellent aligning property. The present invention also provides a preparat...
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JP2014065873A |
To provide a radical-polymerizable compound which imparts excellent surface drying characteristics and excellent storage stability to a radical-polymerizable resin composition when added thereto.A radical-polymerizable compound has an ai...
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JP5475233B2 |
Provided are a photoreactive polymer that includes a multi-cyclicmulticyclic compound at as its main chain and a method of preparing the same. The photoreactive polymer exhibits excellent thermal stability since it includes a multi-cycli...
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JP5466705B2 |
A fluorine-containing cyclic olefin polymer composition of the present invention includes a fluorine-containing cyclic olefin polymer (A) containing a repeating structural unit represented by the general formula (1) and having a fluorine...
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JP5459221B2 |
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JP5446144B2 |
A fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivale...
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JP5449649B2 |
A method of producing a cyclic olefin polymer having a polar functional group and a high molecular weight with a high yield in which a catalyst is not deactivated due to polar functional groups, moisture and oxygen is provided. According...
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JP5430066B2 |
Some embodiments in accordance with the present invention relate to norbornene-type polymers and to photosensitive dielectric resin compositions formed therefrom. Other embodiments relate to films formed from such compositions and to dev...
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JPWO2012053535A1 |
The present invention is represented by the general formulas (2) and (3) in the presence of a norbornene-based monomer polymerization catalyst containing the transition metal complex (A) represented by the general formula (1) and the pol...
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JP5422498B2 |
A positive working photosensitive composition which is useful in the manufacturing step of a semiconductor such as IC, the manufacture of a circuit board such as liquid crystals and thermal heads, and other fabrication steps and has an e...
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JP5401800B2 |
A sulfonic acid onium salt represented by the following formula (1) useful as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic ...
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JP5397343B2 |
A monomer of formula (1) is provided wherein R 1 is hydrogen or a monovalent C 1 -C 6 hydrocarbon group, and R 2 is a group having polymerization functionality. Using the monomer, crosslinking units can be incorporated into a polymer cha...
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JP5396763B2 |
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JP5396918B2 |
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JP5390295B2 |
A method of forming an air gap (26) or gaps within solid structures and specifically semiconductor structures to reduce capacitive coupling between electrical elements such as metal lines, wherein a norbornene-type polymer is used as a s...
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JP5380867B2 |
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JP5383039B2 |
The invention relates to biomaterials comprising a carrier material to which surface spherical particles are covalently linked, wherein said spherical particles are formed by polymer chains containing approximately from 30 to 10000 monom...
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JP5375837B2 |
Embodiments in accordance with the present invention provide waveguide structures and methods of forming such structures where core and laterally adjacent cladding regions are defined. Some embodiments of the present invention provide wa...
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JP5364586B2 |
The present invention provides a method for preparing a polymer by precipitation polymerization, comprising the steps of mixing an antisolvent a), a monomer b), and a catalyst c), and while polymerizing the monomers, simultaneously preci...
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JP5366740B2 |
Disclosed is an ether-containing cyclic structure-containing polymer derived from a monomer represented by formula (1) below, or derived from a monomer represented by formula (1) below and a single or more species of cyclic olefinic mono...
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JP2013241595A |
To provide a fluorine-containing monomer useful as a monomer to manufacture a base resin of a resist material for a high energy line such as ArF excimer laser.A fluorine-containing monomer as shown in general formula (6) obtained by an e...
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JP5353043B2 |
To provide a cycloolefin addition polymer which uses a cycloolefin-functional siloxane as a monomer and has both functions of polycycloolefin and siloxane, and to provide a production method of the cycloolefin addition polymer. The cyclo...
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JP5345379B2 |
A resin composition for optical material, having a refractive index nD at a wavelength of 589 nm of at least 1.37, an Abbe's number vD satisfying vD≰63 and vD≰430−250×nD, and a glass transition temperature of not lower than 100° ...
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JP5332883B2 |
To provide a photosensitive composition that synthesizes a functional substituent group-containing polynorbornene by bulk polymerization. The photosensitive composition includes a photoacid generator, a norbornene-based monomer containin...
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JP5331315B2 |
There are provided a thermal-imprinting resin which has a good heat-deterioration tolerability and a low resin elastic modulus at the time of fluidization in order to suppress any production of particle-like materials in microfabrication...
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JP5331341B2 |
A cyclic-olefin-based thermoplastic resin for thermal imprint to be used in the production of a sheet or a film which contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation ...
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JP2013538363A |
To provide a liquid crystal film that has excellent properties including durability and an optical property and is capable of being effectively used for various uses.A liquid crystal film comprises: a substrate; an alignment layer that i...
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JP5308700B2 |
To provide a polarizing plate having a small change in transmissivity and a polarization degree by heat and humidity, and to provide a liquid crystal display device having high display quality without generating the problem such as light...
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JP5310633B2 |
To provide an optical waveguide structure including an optical waveguide which has a high degree of freedom in designing a pattern shape of an optical circuit, and in which a core part with high dimension accuracy can be easily formed an...
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JP5304592B2 |
To provide a semiconductor device, with which a step or the like of applying an adhesive leading to a drawback in workability during production of an MCP in a stacked structure is improved, a semiconductor chip can be laminated without t...
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JP5294159B2 |
A catalyst system and a process for the bulk addition polymerization or of polycyclic olefins, such as norbornene, methylnorbornene, ethylnorbornene, butylnorbornene or hexylnorbornene, 1,2,3,4,4a,5,8,8a-octahydro-1,4:5,8-dimethanonaptha...
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JP5281970B2 |
The present invention provides an air-conditioning system that supplies a gas to a space to be air-conditioned and/or discharges a gas from the space to be air-conditioned through a permeable membrane in order to provide an air-condition...
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JP5278366B2 |
To provide an optical waveguide structure having an optical waveguide that enables a greater degree of freedom in pattern shape design, allows a core part (an optical path) to be formed with high dimensional precision by a simple method ...
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JP2013533893A |
Embodiments in accordance with the present invention provide for non-self imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and immersion...
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JP5244393B2 |
A resin for thermal imprint comprises a cyclic-olefin-based thermoplastic resin that contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass tran...
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JP5239180B2 |
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JP2013137333A |
To provide an optical waveguide body having a wide degree of design freedom of a pattern shape, capable of easily forming a core part (an optical path) having high dimensional precision via a simple method, and having excellent durabilit...
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JP5218713B2 |
The present invention relates to polymer compositions and methods of polymerizing such compositions. Furthermore, the present invention relates to polymer compositions that are useful in forming waveguides and to methods for making waveg...
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JP5213717B2 |
Provided is a metal catalyst complex for preparing a cyclic olefin-based polymer by addition polymerization of a cyclic olefin-based monomer, which is represented by Formula 1 below: [M(L1)x(L′2)y(L3)z]a[Ani]b wherein M is a Grou...
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JP5212164B2 |
To provide a new norbornene producible readily and efficiently. There is provided a compound expressed by formula (1) (wherein B1to B3are each independently hydrogen, 1-10C alkyl, 3-10C cycloalkyl, 6-12C aryl or 1-10C alkoxy; and m is an...
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JP5212659B2 |
A method for preparing a cyclic olefin addition polymer of high gas permeability, which method including subjecting a specific type of cyclic olefin-functional siloxane and a mixture thereof with a specific type of cyclic olefin compound...
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JP5209679B2 |
A suitable cross-linkable matrix precursor and a poragen can be treated to form a porous cross-linked matrix having a Tg of greater than 300° C. The porous matrix material has a lower dielectric constant than the corresponding non-porou...
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JP2013091759A |
To provide a resin fine particle having good heat resistance.The resin particle comprises a cyclic olefin addition polymer which is obtained by performing addition polymerization of a cyclic olefin functional siloxane represented by form...
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JP5193597B2 |
The present invention provides a polymerizable compound having an alicyclic structure and a polymerizable group and represented by the general formula (1) or (19). The polymerizable compound exhibits high adhesion to substrates, reduced ...
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JP5155255B2 |
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JP5157585B2 |
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JP5151710B2 |
A polymerizable fluorine-containing compound represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R2 represents an acid-labile protecting group, R3 represents a fluorine atom or fluorine-contain...
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