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WO/2016/191837A1 |
The present invention relates to a method for preparing ingenol-3-hexanoate, and to the ingenol-3-hexanoate obtained by this method.
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WO/2016/191835A1 |
The present invention relates to a method for preparing ingenol-5,20-acetonide, and to the ingenol-5,20-acetonide obtained by this method. The invention is also directed to new intermediate compounds for the preparation of ingenol-5,20-a...
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WO/2016/185865A1 |
The purpose of the present invention is to provide: a novolac-type phenolic-hydroxy-group-containing resin having excellent developability, heat resistance and followability to substrates; and a resist film. A novolac-type phenolic-hydro...
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WO/2016/164864A1 |
Treated aldehyde-based resins containing one or more polyamines and methods for making and same. The treated aldehyde-based resin can be or include an aldehyde-based resin and a polyamine. The polyamine can be or include one or more arom...
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WO/2016/162392A1 |
Use of an alkylphenol-aldehyde resin modified by at least one alkylamine in a crude oil composition or in a product derived from a crude oil composition, as asphaltene dispersant additive. Process for treating a crude oil composition or ...
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WO/2016/158457A1 |
The present invention provides a compound represented by formula (1). (In formula (1), R1 represents a C1-30 2n-valent group, and R2-R5 each independently represent a C1-10 straight chain, branched, or cyclic alkyl group, a C6-10 aryl gr...
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WO/2016/158170A1 |
The present invention is a radiation-sensitive composition containing a resist base material (A), a diazonaphthoquinone optically active compound (B), and a solvent (C). The composition has a solid component content of 1%-80% by mass and...
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WO/2016/157141A1 |
The present invention relates to an activated lignin composition, its manufacture and its use thereof. It also relates to a resin comprising lignin, its manufacture and use.
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WO/2016/161034A1 |
Wax compositions that include a base wax and a rosin oil and methods for making and using same. The wax composition can include a base wax and a rosin oil. The rosin oil can include a decarboxylated rosin acid and less than 25 wt% of ros...
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WO/2016/158149A1 |
This resin for ink is obtained as a result of a reaction between lignin, a phenol, an aldehyde, a rosin-based resin, and a polyhydric alcohol.
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WO/2016/159218A1 |
The present invention provides a modified phenolic resole resin composition including a modified phenolic resole resin that has structural units A, which are represented by general formula (1) and are modified using a dimethylphenol, and...
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WO/2016/152656A1 |
Provided is a photosensitive resin composition that, despite having high sensitivity, can improve cohesion between a pattern curing film and metal wiring subsequent to a reflow process in a pattern curing film of a semiconductor device. ...
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WO/2016/125657A9 |
A resin composition for printed wiring boards which comprises a cyanic acid ester compound (A), a maleimide compound (B), and a benzoguanamine compound (C) having one or two aminomethyl groups and represented by the following general for...
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WO/2016/143635A1 |
This compound is represented by formula (1). (In formula (1), R1's are each independently a divalent group having 1-30 carbon atoms, R2 to R7 are each independently a linear, branched, or cyclic alkyl group having 1-10 carbon atoms, an a...
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WO/2016/130733A1 |
A process for the production of high compressive strength microspheres of cured phenolic resins are disclosed. Specifically, the microspheres formed by this process exhibit excellent viscoelastic properties in that the microspheres retai...
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WO/2016/129679A1 |
A compound represented by formula (1). (In formula (1): R1 represents a C1-30 2n-valent group, and R2 through R5 each independently represent a C1-10 alkyl group, a C6-10 aryl group, a C2-10 alkenyl group, a C1-30 alkoxy group, a thiol g...
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WO/2016/121957A1 |
The present invention provides a resin composition for printed wiring boards that contains a cyanic acid ester compound (A) represented by general formula (1) and an epoxy resin (B). (In the formula, n represents a positive integer.)
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WO/2016/116468A1 |
The present invention relates to a rubber composition including at least one phenol-aldehyde resin made up of: at least one aromatic polyphenol including at least one aromatic ring having at least two hydroxyl functions in the meta posit...
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WO/2016/116699A1 |
The invention relates to a method for producing an ablative resin, by carrying out a reduction reaction for the reduction of a compound of formula A, followed by a polymerisation reaction.
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WO/2016/116471A1 |
The present invention relates to a rubber composition including at least one phenol-aldehyde resin made up of: at least one aromatic polyphenol including at least one aromatic ring having at least two hydroxyl functions in the meta posit...
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WO/2016/116697A1 |
The invention relates to a method for producing an ablative resin, comprising a step of pre-polymerisation wherein an innovative aldehyde compound is used.
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WO/2016/116470A1 |
The present invention relates to a rubber composition including at least one phenol-aldehyde resin made up of: at least one aromatic polyphenol including at least one aromatic ring having at least two hydroxyl functions in the meta posit...
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WO/2016/114000A1 |
Provided are: a curable composition which is particularly suitable for obtaining permanent resist films, exhibits excellent solubility in a solvent, and is capable of obtaining coating films exhibiting excellent alkaline development prop...
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WO/2016/114001A1 |
Provided is a phenolic hydroxyl group-containing compound which exhibits excellent solvent solubility, and which is capable of obtaining a composition with which a coating film exhibiting excellent thermal decomposition resistance, alkal...
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WO/2016/103850A1 |
Provided are: a novolac type phenolic resin which is suitable for the achievement of a coating film that has excellent flexibility even if formed thick, while exhibiting excellent heat resistance, alkali developability, sensitivity and r...
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WO/2016/104214A1 |
A compound which is represented by formula (1). (In formula (1), each X independently represents an oxygen atom or a sulfur atom, or alternatively represents being non-crosslinked; R1 represents a single bond or a 2n-valent group having ...
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WO/2016/088515A1 |
Provided are: a photosensitive composition for forming a resist underlayer film, which exhibits excellent dry etching resistance and heat resistance, while having easily controllable alkali solubility; and a resist underlayer film. Speci...
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WO/2016/084495A1 |
Provided are: a photosensitive composition that has excellent heat resistance, a low absorbance for g-ray, h-ray and i-ray exposure wavelengths, and high sensitivity; a resist material; a coating film thereof; and a novolac type phenol r...
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WO/2016/080469A1 |
Provided is a lignin resin composition which comprises a lignin derivative having a weight-average molecular weight of 500-4,000 and a phenolic novolak resin having a weight-average molecular weight of 1,000-3,000, the content of the lig...
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WO/2016/076403A1 |
A method for producing a novolac type phenolic resin by reacting phenols and saturated aliphatic aldehyde having 6-20 carbon atoms under the presence of a boron compound represented by general formula (1), B-(OR)3 (1), (in the formula, t...
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WO/2016/069567A2 |
There is now provided a variety of curable polyester resins that cure well with phenolic crosslinking agents. The curable polyester resins include polyester resins that have both carboxyl and hydroxyl functionalities and a high ratio of ...
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WO/2016/069572A1 |
This invention relates to a resole phenolic resin comprising the residues of (a) from about 50 to 100 mole % of a meta-substituted phenol [phenolic component (a)], (b) from 0 to about 50 mole % of at least one phenolic component [phenoli...
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WO/2016/065050A1 |
This invention relates to a process for stabilizing a phenolic resin containing a mixture of linear phenolic resins and calixarenes and a demulsifier composition comprising the stabilized phenolic resins prepared from the process. The pr...
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WO/2016/052447A1 |
This rubber composition for a tire is obtained by blending a rubber component (A), insoluble sulfur (B), and a co-condensate (C) that has a softening point of 150 °C or less and that contains a p-tert-butylphenol-derived constituent uni...
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WO/2016/052448A1 |
This rubber composition for a tire is obtained by blending a rubber component (A), zinc oxide (B), and a co-condensate (C) that has a softening point of 150 °C or less and that contains a p-tert-butylphenol-derived constituent unit repr...
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WO/2016/049564A1 |
Disclosed are methods for preparing and collecting a polyaromatic compound. Also disclosed are products comprising a polyaromatic compound.
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WO/2016/033079A1 |
A method for making naphthol novolac comprising: contacting a) a naphthol component comprising i) from 1 to 99 weight percent 1- naphthol; and ii) from 1 to 99 weight percent 2-naphthol; and b) an aldehyde in a reaction zone under reacti...
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WO/2016/029451A1 |
Provided is a method for making naphthol novolac comprising, consisting of, or consisting essentially of: contacting a) a naphthol component comprising i) from 1 to 99 weight percent 1-naphthol; and ii) from 1 to 99 weight percent 2-naph...
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WO/2016/024425A1 |
[Problem] To provide an element for display or lighting devices, which comprises an insulating film that generates little outgas and exhibits light blocking properties near the ultraviolet region. [Solution] An element for display or lig...
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WO/2016/021594A1 |
[Problem] To provide a resist underlayer film for lithography, which has high solubility in a resist solvent (a solvent used in lithography) for developing good film formability by coating and a dry etching rate selectivity lower than th...
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WO/2016/013467A1 |
The present invention provides: a production method that makes it possible to obtain a high reaction yield of a resin in which the content of metal impurities is reduced and all or a part of phenolic hydroxyl groups are alkylated; a resi...
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WO/2016/010124A1 |
Provided is a positive photosensitive resin composition, a film of which after heating and firing generates less outgas. A positive photosensitive resin composition which contains a polyalkenyl phenol resin having a structure represented...
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WO/2016/009754A1 |
This method for manufacturing an electroconductive resin has a dissolving step for dissolving a metal compound and a polymerizable monomer in a solvent, and a polymerization step for polymerizing the polymerizable monomer in the presence...
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WO/2016/006358A1 |
Provided are: a phenolic hydroxyl group-containing resin that has excellent alkali development properties and that makes it possible to achieve high heat resistance in an obtained cured product; a production method for the hydroxyl group...
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WO/2016/007778A1 |
Described herein are methods for the production of oligosaccharides, including functionalized oligosaccharides, from one or more sugars, such as one or more monosaccharides, using polymeric and solid- supported catalysts containing acidi...
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WO/2015/194273A1 |
[Problem] To provide a novel resist underlayer film-forming composition which is capable of forming a resist underlayer film that has etching resistance and excellent embeddability of a surface having recesses and/or projections. [Soluti...
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WO/2015/189776A1 |
The invention relates to a gelled aqueous polymer composition for forming, by means of drying then pyrolysis, a monolithic porous carbon, to a pyrolysed carbonated composition produced by the drying, followed by the pyrolysis, of said ge...
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WO/2015/179426A1 |
Disclosed herein are flame retardant compounds and polymer compositions containing these flame retardant compounds. The flame retardant compounds can be derived from biological sources and can include coordinated metal ions.
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WO/2015/175551A1 |
This invention relates to processes for preparing novolak resins and using the same as reinforcing resins. One process comprises reacting one or more alkylphenols with an aldehyde in the presence of a base to form a resole resin, wherein...
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WO/2015/163287A1 |
A bisphenol resin obtained by reacting (a) a bisphenol compound, (b1) at least one compound selected from a group consisting of aminoalkyl sulfonic acids, aminoalkyl sulfonic acid derivatives, aminonaphthalene sulfonic acid, and aminonap...
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