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JP4345331B2 |
An aligner to expose any exposure area includes an exposure light source that emits an exposure beam having a specified width to expose the exposure area to light; a douser having a width corresponding to at least the width of the exposu...
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JP4345730B2 |
Heterocyclic sulfonium and iodonium salts with chromone or xanthone groups are new. Heterocyclic sulfonium and iodonium salts of formula [S(Ph 1>)(Ph 2>)R] +>A (1) and [R 2>6>-I-R 2>7>] +>A 3(35) are new. Ph 1>, Ph 2>phenyl (optionally s...
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JP4344492B2 |
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JP4343740B2 |
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JP2009229500A |
To provide a silver salt heat developable photosensitive material having high sensitivity and low fogging and excellent in illuminance irregularity properties, image light resistance and silver tone, to provide a method for preparing an ...
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JP4341406B2 |
Heterocyclic sulfonium and iodonium salts with chromone or xanthone groups are new. Heterocyclic sulfonium and iodonium salts of formula [S(Ph 1>)(Ph 2>)R] +>A (1) and [R 2>6>-I-R 2>7>] +>A 3(35) are new. Ph 1>, Ph 2>phenyl (optionally s...
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JP4335128B2 |
A photo mask and a method for fabricating the same are described, in which a transparent substrate is covered with a phase inversion light-transmitting layer, a plurality of small sized light-transmitting holes are aggregately formed at ...
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JP4336476B2 |
An exposure method for correcting dimension variations in a pattern resulting from the fogging effect occurring during electron beam exposure and/or the loading effect occurring during dry etching, and a recording medium for recording th...
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JP2009218303A |
To provide a method of forming a conductive pattern that does not decrease the conductivity and suppresses undesirable deposition of metal caused at a place except the conductive pattern when plating is carried out by using a thick elect...
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JP4331320B2 |
Direct X-ray films are disclosed capable of being handled in room light prior to and during processing. The films contain silver halide grains responsive to X-radiation that are sulfur sensitized. The films also contain a combination of ...
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JP4328572B2 |
The invention disclosed herein concerns technology that ensures, in a projection exposure process using a transmission type reticle, exposure with an even finish size throughout the entire exposure region, without adverse influence of ex...
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JP4325118B2 |
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JP4323919B2 |
The data representing patterns comprising features (10), are obtained. A number of distinct zones are defined based on the critical dimensions of the features. Each feature is categorized into one of the zones. The mask pattern is modifi...
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JP4310119B2 |
The invention consists in a process which contemplates: filming the painting or photograph to be reproduced; preparing the support (1) onto which the photographic and/or painted image will be reproduced, consisting in the formation onto ...
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JP4307778B2 |
A photographic developer composition for use in the development of a black and white silver halide photographic element said composition comprises at least one developing agent and, in an amount sufficient to inhibit sludge deposition, o...
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JP4303488B2 |
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JP4304169B2 |
A device manufacturing method for a substrate of a batch of substrates includes conveying the substrate to an exposing position of a lithographic apparatus, exposing the substrate at the exposing position to a beam of radiation of the li...
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JP2009526270A |
Bis phenol reducing agents incorporating bicyclic and tricyclic substituents ortho to the hydroxyl groups on the aromatic rings have been found to provide photothermographic materials with improved silver efficiency and stability without...
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JP4292727B2 |
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JP4290907B2 |
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JP2009146587A |
To provide a manufacturing method of a conductive material which has a high conductivity and can form a wiring pattern in which a fattening of a wire width of a conductor circuit by an electroless copper plating is limited.After forming ...
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JP4286212B2 |
A method according to one embodiment of the invention relates to determining at least one parameter of a model that provides information about a position of an object. The object has a plurality of alignment marks of which desired positi...
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JP4284854B2 |
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JP4284007B2 |
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JP4280024B2 |
An X-ray flat panel detector includes sensor elements constituted by a plurality of effective pixels that detect X-rays and a plurality of dummy pixels that are arranged adjacent to the effective pixel area and generate electrical signal...
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JP4276116B2 |
The invention relates to a method of manufacturing a multilayer optical disc which is not formed with voids in an optically transparent zone, and a multilayer optical disc. The method of manufacturing a multilayer optical information rec...
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JP4273871B2 |
A method is provided that is capable of forming a wiring pattern having an extremely flat surface and few convexo-concave shapes on a substrate on which the wiring pattern is formed. The method to form a wiring pattern includes a bank fo...
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JP2009116158A |
To provide a silver salt heat developable photosensitive material having high sensitivity and low fog and excellent in illuminance irregularity properties, light resistance of an image and silver tone, to provide an image forming method ...
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JP2009117277A |
To prevent a plating failure of a translucent conductive thin film which is made by a procedure of exposure-chemical development-physical development-electroplating using a silver halide photosensitive material.A manufacturing method of ...
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JP4267298B2 |
Disclosed is a method for manufacturing a semiconductor device, wherein a reticle that can expose only a portion where the pattern is changed on an edge area of a wafer is manufactured, and then a double exposure process is performed by ...
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JP4268295B2 |
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JP4267455B2 |
The invention relates to an alternative composite mask that is substantially composed of a transparent support film coated with a transparent polymer matrix that contains light-absorbing pigment particles or metal particles having an ave...
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JP4265189B2 |
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JP2009086588A |
To provide a versatile heat developable photosensitive material which is commonly utilized in various different heat developing apparatus, and to provide an image forming method using the same.The heat developable photosensitive material...
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JP2009088372A |
To provide a method of manufacturing a translucent conductive membrane which reduce foreign substances in mesh portions and an electromagnetic wave shielding capability is improved.In the method, the translucent conductive membrane is ob...
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JP2009087768A |
To provide a conductive film precursor capable of providing a conductive film with less plating unevenness or variation in resistance, and excellent in surface resistance and haze properties.The conductive film precursor 10 is obtained b...
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JP2009080415A |
To suppress a defect such as bleeding or burr at a silver wire edge part of a conductive material by local runaway of developing after developing processing.A developing stop processing tank 18 is provided between a developing processing...
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JP4254241B2 |
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JP4253428B2 |
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JP2009076358A |
To provide a manufacturing method of a translucent conductive film having a high transmittance by preventing smear of silver which adheres to a silver halide sensitive material during a chemical and/or physical development, and further, ...
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JP4252745B2 |
The present invention relates to a silver halide color photographic light-sensitive material wherein at least one of light-sensitive silver halide emulsion layers includes a silver halide emulsion having a silver chloride content of at l...
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JP4245900B2 |
To reduce a stress change generated in the production processes of a transfer mask to improve a position accuracy of a mask pattern. A production method of a transfer mask characterized by further including, in the production processes o...
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JP2009069757A |
To provide a heat developable photosensitive sheet comprising a heat developable photosensitive material superior in conveyance and silver color tone without generating inside contamination in a heat developing device even when quickly a...
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JP4249063B2 |
Deformations (distortion/warp) of a master base plate developed during manufacturing are regulated to ensure close contact with a slave medium and quality of magnetic transfer. The master base plate is formed by the following steps. A me...
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JP4246605B2 |
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JP2009064654A |
To reduce a fluctuation in line width of meshes of a formed translucent conductive thin film.In a translucent conductive thin film forming method of forming the translucent conductive thin film by exposing to light a silver halide photos...
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JP4243225B2 |
Use of glycine-N,N-diacetic acid derivs. of formula (I) is claimed as complex formers for alkaline earth or heavy metals. R = 1-20C alkyl, 2-20C alkenyl or -A.CH(COOM).N(CH2COOM)2; A = 1-12C alkylene or a chemical bond; M = H, alkali met...
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JP2009059769A |
To provide a highly light-permeable conductive film and an electromagnetic wave shielding material.In a method for forming a conductive metal portion by exposing a pattern of a photosensitive material having at least one layer containing...
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JP4241217B2 |
A photosensitive emulsion comprises an organic silver salt containing at least two organic silver salt grains with different average grain size; a photosensitive silver halide and a dispersing medium. An independent claim is included for...
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JP4238491B2 |
A silver salt photohermographic material is disclosed, comprising a support having provided thereon a light-sensitive layer containing light-sensitive silver halide, a light-insensitive organic silver salt and a binder, wherein the photo...
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