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Patent Searching and Data


Matches 751 - 800 out of 29,320

Document Document Title
WO/2020/011507A1
A method for determining the existence of a defect in a printed pattern includes obtaining a) a captured image of a printed pattern from an image capture device, and b) a simulated image of the printed pattern generated by a process mode...  
WO/2020/012653A1
The present invention addresses the problem of providing a method for manufacturing a photomask for forming a pattern on a curved section of a molded article. The above-described problem can be solved by a method for manufacturing a phot...  
WO/2020/010303A1
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture, and production systems therefor are disclosed. The method for forming an EUV mask blank comprises placing a substrate in a multi-cathode physical vapor deposition cham...  
WO/2020/009762A1
A lithography system for generating grating structures is provided having a multiple column imaging system located on a bridge capable of moving in a cross-scan direction, a mask having a grating pattern with a fixed spatial frequency lo...  
WO/2020/007546A1
An apparatus (200) comprising: a first gripping member (202) comprising a first magnetic element (204) and moveable between a first position and a second position; a first biasing member (210) configured to bias the first gripping member...  
WO/2020/009787A1
Embodiments described herein generally relate to an apparatus and methods for removing a glue residue from a photomask. The glue residue may be exposed when a pellicle is removed from the photomask. Before a new pellicle can be adhered t...  
WO/2020/009169A1
A pellicle frame (1) according to an aspect of the present disclosure has a rectangular shape in plan view, and is provided with one or more recesses (25) in an outer peripheral surface (13) of the pellicle frame (1), the one or more rec...  
WO/2020/008977A1
The purpose of the present invention is to provide: a pellicle complex that has fewer out-gassing occurrences; and a production method for the pellicle complex. This pellicle complex has a pellicle membrane (A) and a pellicle frame (B) j...  
WO/2020/008978A1
The objective of the present invention is to provide a reinforced pellicle film that suppresses the generation of outgas, has high heat resistance and durability, and has excellent EUV transmissivity. A reinforced pellicle film character...  
WO/2020/008976A1
A pellicular complex comprises a carbon film (A), a film part (B) face-to-face-bonded to one side of the carbon film, and a frame part (C) that is arranged along the outer edge of the film part (B), wherein an element constituting the fr...  
WO/2020/008021A1
The invention relates to a method (900) for evaluating a statistically distributed measured value (100, 300, 350) in the examination of an element (810) for a photolithography process, comprising the following steps: (a) using a pluralit...  
WO/2020/006308A1
The systems and methods discussed herein are for the fabrication of diffraction gratings, such as those gratings used in waveguide combiners. The waveguide combiners discussed herein are fabricated using nanoimprint lithography (NIL) of ...  
WO/2020/003053A1
Τ-phase-shifted fiber Bragg gratings in optical waveguides, and methods of formation thereof. Sensing apparatus comprising such gratings using femtosecond pulse duration lasers and specialized transmission diffraction elements or phase ...  
WO/2020/001831A1
Disclosed is a method for assigning features into at least first features and second features, said first features being for at least one first patterning device configured for use in a lithographic process to form corresponding first st...  
WO/2020/004854A1
The present application relates to a plasma etching method using a faraday box, comprising the steps of: providing a base material for etching in the faraday box having a mesh part provided on the upper surface thereof; shielding at leas...  
WO/2019/242280A1
Provided is a mask plate (60), comprising: a plurality of light shielding strips, the plurality of light shielding strips being configured to block light, and the gaps surrounded by the plurality of light shielding strips allowing light ...  
WO/2019/243009A1
A pellicle comprising a core comprising a material other than silicon carbide, a silicon carbide adhesion layer, and a ruthenium capping layer, the ruthenium capping layer being in contact with the silicon carbide adhesion layer. Also de...  
WO/2019/242413A1
A mask plate screen tensioning frame and a mask plate screen tensioning process, wherein the mask plate screen tensioning frame comprises a frame body (210) and a support rib (220), the frame body (210) has a first surface (212) and seco...  
WO/2019/238372A1
Described herein is a method for calibrating a process model and training an inverse process model of a patterning process. The training method includes obtaining a first patterning device pattern from simulation of an inverse lithograph...  
WO/2019/238668A1
The invention relates to a device (1000) for examining and/or processing an element for photolithography (110, 200) with a charged-particle beam (170, 1028), the device (1000) comprising: (a) means for recording measurement data (330, 44...  
WO/2019/240166A1
The present invention provides a support frame provided with a filter which can easily be attached to and detached from a ventilation hole, and which can be provided with a pellicle film for extreme ultraviolet lithography, a pellicle in...  
WO/2019/230312A1
Provided is a mask blank equipped with a phase-shift film which has reduced rear-side reflectance and has both a function of allowing exposure light from an ArF excimer laser to transmit therethrough with a predetermined transmittance, a...  
WO/2019/230313A1
Provided is a mask blank equipped with a phase-shift film which has reduced rear-side reflectance and which has both a function of allowing exposure light from an ArF excimer laser to transmit therethrough with a predetermined transmitta...  
WO/2019/228193A1
Provided are a metal-plastic composite body, a preparation method therefor and an application thereof. The metal-plastic composite body comprises a metal substrate, a metal-resin particle composite coating formed on the metal substrate, ...  
WO/2019/225360A1
Provided is a photomask inspection device capable of detecting a diffraction pattern more suitable for measurement. The photomask inspection device measures the pattern characteristics of the phase shift portion of a phase shift mask. Th...  
WO/2019/225503A1
A pellicle frame according to one aspect of the present invention includes a first surface and a second surface provided on both sides along the thickness direction, and an inner peripheral surface and an outer peripheral surface connect...  
WO/2019/223366A1
A method for use in manufacturing a display substrate, a method for use in manufacturing a mask, and a display device. The method for use in manufacturing the display substrate comprises the following steps: roviding a first substrate (1...  
WO/2019/225737A1
Provided is a reflective mask blank with which it is possible to further reduce the shadowing effect of a reflective mask, and also possible to form a fine and highly accurate phase-shift pattern. A reflective mask blank (100) having, in...  
WO/2019/225736A1
Provided is a reflective mask blank with which it is possible to further reduce the shadowing effect of a reflective mask, and also possible to form a fine and highly accurate phase-shift pattern. A reflective mask blank having, in the f...  
WO/2019/219826A1
The present invention relates to a method and an apparatus for determining at least one unknown effect (250) of defects (650, 660) of an element (450) of a photolithography process. The method (1000) comprises the steps of: (a) providing...  
WO/2019/222062A1
Directly biasing a mask image is disclosed. A method includes generating a mask image for the mask, biasing the mask image to obtain a biased mask image, and simulating the biased mask image to obtain a wafer image to be compared to the ...  
WO/2019/221787A1
A laser-based manufacturing system is disclosed for fabricating non-planar three-dimensional layers. The system may have a laser for producing a laser beam with a plurality of optical wavelengths. An optically dispersive element may be u...  
WO/2019/216303A1
An inspecting device (1) according to one embodiment of the present invention is provided with an illuminating light source (11) which generates illuminating light for illuminating a specimen (21), a detector (16) for capturing an image ...  
WO/2019/217584A1
Embodiments of methods and systems for patterning of low aspect ratio stacks are described. In one embodiment, a method may include receiving a substrate comprising a patterned organic planarizing layer (OPL) mask wherein a surface of th...  
WO/2019/215110A1
An optical system serves to transfer the original structure portions (13) of a lithography mask (10). The original structure portions (13), which have an x/y-aspect ratio of greater than 4:1, are arranged in a line next to one another on...  
WO/2019/211083A1
A wafer comprising a mask on one face and at least one layer on the opposite face, wherein the mask comprises at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one ...  
WO/2019/209591A1
Methods, apparatuses, and systems for determining a binary mask pattern from a pixelated mask pattern include: determining, by a processor, based on a fast marching method (FMM), arrival values for pixels of a portion of the pixelated ma...  
WO/2019/206614A1
The present application relates to a method (3300) for removing a particle (550, 2750, 3150) from a photolithographic mask (500), including the following steps: (a) positioning (3320) a manipulator (300, 1300, 2500, 3000, 3100), which is...  
WO/2019/209449A1
Systems and methods discussed herein relate to patterning substrates during lithography and microlithography to form features to a set or sets of critical dimensions using dose. The dose maps are generated based upon images captured duri...  
WO/2019/209396A1
Embodiments of the present disclosure provide improved photolithography systems and methods using a solid state emitter device. The solid state emitter device includes an array of solid state emitters arranged in a plurality of horizonta...  
WO/2019/202921A1
The present invention is a quartz glass plate comprising a quartz glass plate main body, and a quartz glass member adhered via an adhesive layer to the quartz glass plate main body. In this quartz glass plate, the adhesive layer comprise...  
WO/2019/203871A1
Membrane-coating stereolithography (MCSL), a novel 3D printing technology, is provided, which employs the transfer of working resin to the manufacture are as a coating on a membrane, and curing of the resin using, e.g., advanced micro-di...  
WO/2019/199697A1
Computer implemented methods and computer program products have instructions for generating transfer functions that relate segments on lithography photomasks to features produced by photolithography and etching using such segments. Such ...  
WO/2019/200049A1
Methods for making molecular sieves are provided. The molecular sieves are comprised of thin semiconductors films in which a plurality of apertures is defined. The apertures are non-circular, nanoscale openings with tapered sidewalls tha...  
WO/2019/195105A1
A method for etching features in a stack below a mask with features is provided. A fill layer is deposited on the mask, wherein the fill layer fills the features of the mask. The fill layer is etched back to expose the mask. The mask is ...  
WO/2019/184694A1
A substrate edge processing method and a mask. The substrate edge processing method comprises: using a first device to form a first photoresist layer on a substrate to be processed (S20); in an exposure machine, using a mask to expose th...  
WO/2019/190566A1
A method for optical proximity correction (OPC) comprises creating a semi-physical model of a mask for a current layer in an IC design layout using physical parameters of a lithography process used to create the mask, the semi-physical m...  
WO/2019/188397A1
A mask blank (100) is provided with a phase shift film (2) on a translucent substrate (1), wherein the phase shift film (2) includes a structure in which a bottom layer (21), a middle layer (22), and a top layer (23) are laminated in thi...  
WO/2019/189310A1
The present invention addresses the problem of providing a mask adhesive that plastically deforms easily in the temperature region in which exposure is performed, the mask adhesive being configured so that almost no adhesive residue rema...  
WO/2019/188445A1
Provided is a supporting frame in which a vent hole with a detachably-attached filter can be provided and to which a pellicle film for extreme ultraviolet lithography can be pasted. A supporting frame according to an embodiment of the pr...  

Matches 751 - 800 out of 29,320