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Patent Searching and Data


Matches 1,101 - 1,150 out of 29,309

Document Document Title
WO/2017/102378A1
A membrane assembly (80) for EUV lithography, the membrane assembly comprising: a planar membrane (40); a border (81) configured to hold the membrane; and a frame assembly (50) connected to the border and configured to attach to a patter...  
WO/2017/102321A1
A method to improve a lithographic process of imaging a portion of a design layout onto a substrate using a lithographic apparatus, the method including: computing a multi-variable cost function, the multi-variable cost function being a ...  
WO/2017/102256A1
The invention relates to a reflective optical element particularly for a microlithographic projection exposure system or for a mask inspection system. According to one aspect of the invention, the reflective optical element comprises an ...  
WO/2017/100307A1
The present disclosure relates to semiconductor manufacturing, in particular to reticle rack systems. The teachings of the present disclosure may be embodied in a reticle rack unit including a frame with four uprights and multiple crossb...  
WO/2017/092957A1
A measurement method comprising using multiple radiation poles to illuminate a diffraction grating on a mask at a mask side of a projection system of a lithographic apparatus, coupling at least two different resulting diffraction orders ...  
WO/2017/095811A1
A method for optimizing a multi die implementation flow that is aware of mix-and-match die integration for implementing multi-die integrated circuits includes partitioning a netlist into partitions comprehending mix-and-match die integra...  
WO/2017/091738A1
A method of fabricating a visible spectrum optical component includes: providing a substrate; forming a resist layer over a surface of the substrate; patterning the resist layer to form a patterned resist layer defining openings exposing...  
WO/2017/090485A1
Provided is a reflective mask that is capable of reducing out-of-band light when a predetermined pattern is transferred onto a wafer with exposure light using EUV light in a process for manufacturing a semiconductor device. This substrat...  
WO/2017/091339A1
Disclosed are mask definition tools, apparatus, methods, systems and computer program products configured to process data representing a semiconductor fabrication mask. A non-limiting example of a method includes performing a decompositi...  
WO/2017/087252A1
Apparatus for cleaning a photo mask includes a rotor in a head, with the rotor having a seal plate having a central opening, a resilient mask seal in the central opening, and retractors attached to the resilient mask seal and adapted to ...  
WO/2017/087653A2
Methods and systems for generating simulated images from design information are provided. One system includes one or more computer subsystems and one or more components executed by the computer subsystem(s), which include a generative mo...  
WO/2017/087410A2
Provided is a method of plasma etching on a substrate using an etchant gas mixture to meet integration objectives, the method comprising: disposing a substrate having a structure pattern layer, a neutral layer, and an underlying layer, t...  
WO/2017/087066A1
Techniques disclosed herein provide a method and fabrication structure for pitch reduction for creating high-resolution features and also for cutting on pitch of sub-resolution features. Techniques include using multiple materials having...  
WO/2017/087138A1
Methods of etching silicon nitride faster than silicon or silicon oxide are described. Methods of selectively depositing additional material onto the silicon nitride are also described. Exposed portions of silicon nitride and silicon oxi...  
WO/2017/086196A1
Provided is a mask blank having a resist layer and capable of suppressing charging-up during irradiation with electron beams. A mask blank (10) having a resist layer is provided with: a substrate (11) having a thin film (12); a resist la...  
WO/2017/076686A1
A method for manufacturing a membrane assembly (80) for EUV lithography, the method comprising: providing a stack (40) comprising a membrane layer (45) between a supporting substrate (41) and an attachment substrate (51), wherein the sup...  
WO/2017/077915A1
Provided is a mask blank (100) for manufacturing a phase shift mask, the mask blank enabling the formation of a high-precision and fine pattern in a light-blocking film. The mask blank (100) in which a phase shift film (2) formed from a ...  
WO/2017/076694A1
A multilayer reflector for use in EUV lithography, for example, comprises alternating layers of Mo and RbxSiy. The RbxSiy and Mo interface is thermodynamically stable, reducing intermingling of the layers and preventing reduction in refl...  
WO/2017/073906A1
An embodiment of the present invention provides a photo-mask repair system and method for repairing a photo-mask, which is used in a semiconductor process, through dissociation of gas using a laser beam when the photo-mask is required to...  
WO/2017/072195A1
The invention relates to an optical assembly (32), comprising an optical element (13), in particular for the reflection of EUV radiation (4), and a protective element (30) for protecting a surface (31) of the optical element (13, 14) fro...  
WO/2017/073604A1
In the present invention, light from a light source is projected onto a mask via a high-resolution optical system, and high-resolution optical image data is obtained. In addition, such light is projected onto the same mask via a low-reso...  
WO/2017/069090A1
Provided is a glass-resin composite including a glass plate and a resin film, wherein the glass-resin composite is characterized in that: the resin film is provided on the entire surface of at least one main surface of the glass plate; t...  
WO/2017/067755A1
A method including identifying that an area of a first substrate includes a hotspot (710) based on a measurement and/or simulation result pertaining to a patterning device in a patterning system, determining first error information (720)...  
WO/2017/067239A1
Provided are a mask plate and a manufacturing method thereof, and a method using a mask plate to compose a pattern. A pattern region (01) of the mask plate is provided with a first pattern portion (10) and second pattern portions (20), w...  
WO/2017/067752A1
A method including modelling, by a computer system, a high resolution patterning error information of a patterning process involving a patterning device in a patterning system using an error mathematical model, modelling, by the computer...  
WO/2017/067024A1
A color resist mask plate and method for use thereof. A color resist mask plate (10) comprises an alignment coating mark region (11) and an alignment testing mark region (12); the alignment coating mark region (11) comprises a plurality ...  
WO/2017/067757A1
A method including: determining first error information (1310) based on a first measurement and/or simulation result (1300) pertaining to a first patterning device in a patterning system; determining second error information (1330) based...  
WO/2017/067756A1
A method including: obtaining information describing a modification made or to be made by a pattern modification tool to a patterning device for a patterning process (1100); obtaining a spatial distribution of temperature and/or deformat...  
WO/2017/066319A2
Organometallic precursors are described for the formation of high resolution lithography patterning coatings based on metal oxide hydroxide chemistry. The precursor compositions generally comprise ligands readily hydrolysable by water va...  
WO/2017/063951A1
The invention relates to a method for producing a microstructure (10), having the following steps: providing a photo-sensitive layer (12) on a carrier substrate (11); arranging a photomask (20) having a transparent substrate (21) on or a...  
WO/2017/063040A1
In one aspect, there is provided a method of creating a microstructure pattern on an exterior surface of an aircraft, boat, automobile or other vehicle is disclosed. A layer of photopolymer (44) is applied to the top coat or substrate (4...  
WO/2017/060192A1
A method including providing a plurality of unit cells for a plurality of gauge patterns appearing in one or more images of one or more patterning process substrates, each unit cell representing an instance of a gauge pattern of the plur...  
WO/2017/054247A1
A photomask plate for LED manufacturing, comprising: a wafer exposure unit (1) and a non-wafer exposure unit (2), a fluorescent marker (3) for distinguishing different photomask plates being provided on the non-wafer exposure unit (2). T...  
WO/2017/054121A1
A method of making a multilayer structure is provided, comprising providing a substrate; providing a coating composition, comprising: a liquid carrier, a polycyclic aromatic additive and a MX/graphitic carbon precursor material having a ...  
WO/2017/059286A1
Structures and associated methods for making high index of refraction surface coatings for masks used in imprint lithography for application to patterning for advanced semiconductor and data storage devices.  
WO/2017/058638A1
A calibration curve for a wafer comprising a layer on a substrate is determined. The calibration curve represents a local parameter change as a function of a treatment parameter associated with a wafer exposure to a light. The local para...  
WO/2017/055086A1
A method involving measuring a first metrology target designed for a first range of values (806) of a process parameter (802); measuring a second metrology target designed for a second range of values (808) of the same process parameter ...  
WO/2017/057376A1
Provided is a mask blank which makes it possible to suppress chrome migration. This mask blank (100) is provided with a structure obtained by stacking, in order, a phase shift film (2) and a light shielding film (3) on a translucent subs...  
WO/2017/059314A1
An optical source for a photolithography tool includes a source configured to emit a fist beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelengt...  
WO/2017/050774A1
Methods for treating substrates are described. The methods comprise the steps of flowing an aqueous liquid medium through a flow channel and at least one outlet slit onto a substrate to be treated and exposing the aqueous liquid medium t...  
WO/2017/053128A1
Methods and apparatus for characterizing a beam parameter associated with an electromagnetic beam of a light source. The light source exposes a phase-shifted target through a set of focal distances relative to a focal plane of a substrat...  
WO/2017/053316A1
Techniques disclosed herein provide a method and fabrication structure for pitch reduction for creating high-resolution features and also for cutting on pitch of sub-resolution features. Techniques include using multiple materials having...  
WO/2017/045225A1
A spacer (4) and a manufacturing apparatus therefor. The apparatus comprises a photomask (10) and an exposure apparatus (20) directly facing the photomask (10), wherein the photomask (10) comprises a central light-transmissive region (10...  
WO/2017/047490A1
A mask blank 10 according to the present invention comprises: a light-blocking film 4 which has a single layer structure or a multilayer structure composed of a plurality of layers, and wherein at least one layer of the light-blocking fi...  
WO/2017/049267A1
Methods for forming a titanium-containing hard mask film on a substrate surface by exposing the substrate surface to a titanium-containing precursor. The titanium-containing hard mask comprises one or more of silicon, oxygen or carbon at...  
WO/2017/045391A1
A mask plate, comprising a transparent substrate and a mask pattern formed on the surface of the transparent substrate. The mask pattern comprises a first region (1) for forming a display region inner membrane layer graph and a second re...  
WO/2017/041347A1
A PSVA-type liquid crystal display panel and a manufacturing method therefor. The PSVA-type liquid crystal display panel comprises a patterned passivation layer (22), the upper surface of the passivation layer (22) comprising grooves (22...  
WO/2017/041438A1
An optical mask plate and an exposure system.The optical mask plate is provided with a composition pattern for forming a mapping pattern, the composition pattern comprising a strip-shaped main body (11) for forming a linear pattern, wher...  
WO/2017/038213A1
Provided is a mask blank for a phase shift mask, said mask blank being provided with an etching stopper film that satisfies the characteristics of having: higher tolerance than a translucent substrate with respect to dry etching wherein ...  
WO/2017/035909A1
A photomask(2) for optical alignment and an optical alignment method. By aligning the tail ends of first light-transmission patterns(313) which form a first photomask figure(3), and aligning the front ends of second light-transmission pa...  

Matches 1,101 - 1,150 out of 29,309