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Patent Searching and Data


Matches 1,251 - 1,300 out of 29,320

Document Document Title
WO/2016/043147A1
The purpose of the present invention is to provide a low defect reflective mask blank that has a multilayer reflective film with high smoothness and wherein charging-up during mask defect inspection by an electron beam is prevented, a re...  
WO/2016/043292A1
A pellicle for use in extreme ultraviolet lithography, a production method thereof and an exposure method are provided. This pellicle comprises: a first frame body on which a pellicle film is arranged; a second frame body which encompass...  
WO/2016/037851A1
Method for producing a mask for the extreme ultraviolet wavelength range proceeding from a mask blank (250, 350, 550, 950) having defects (220, 320, 520, 620, 920), wherein the method comprises the following steps: a. classifying the def...  
WO/2016/032096A1
The present invention relates to a pellicle for lithography, which is used as a dust-proof film when a semiconductor device, a display device, or the like is manufactured. The pellicle using silicon hydrocarbon, according to the present ...  
WO/2016/033195A1
Transfer films, articles made therewith, and layer-by-layer methods of making and using transfer films to form an inorganic optical stack are disclosed.  
WO/2016/029610A1
A mask plate, a mask plate assembly, a method for manufacturing pixels and a pixel structure, wherein the mask plate comprises a shielding area (202) and opening area (201) alternately arranged. The opening area (201) is two times the wi...  
WO/2016/024474A1
Provided is a mask blank 1 that is provided with a resist film and provided with a substrate 10, which has a thin film 11, and a negative resist film 12 formed on the primary surface of the thin film 11, and that is characterized by a co...  
WO/2016/024473A1
This mask blank 1 provided with a resist film is provided with: a substrate 10 having a thin film 11; and a negative resist film 12 formed at the surface of the thin film 11. In the resist film 12, a photoacid generator low-concentration...  
WO/2016/023737A1
The invention relates to a mask (M) for EUV lithography, comprising: a substrate (7), a first surface region (A1), which is formed by a surface (8a) – facing away from the substrate (7) – of a multilayer coating (8) which is designed...  
WO/2016/020264A1
According to the invention, an IC manufacturing model is disclosed, wherein input variables and an output variable are measured using a calibration set of patterns. The model can or not include a PSF. The output variable may be a dimensi...  
WO/2016/012174A1
A lithographic apparatus is described, the apparatus comprising: n illumination system configured to condition a radiation beam; otary drive adapted to move a flexible patterning device along a closed loop trajectory, the closed loop tra...  
WO/2016/012426A1
In a method for three-dimensionally measuring a 3D aerial image in the region around an image plane during the imaging of a lithography mask (5) arranged in an object plane (4), a selectable imaging scale ratio in mutually perpendicular ...  
WO/2016/008711A1
Disclosed herein are several methods of reducing one or more pattern displacement errors, contrast loss, best focus shift, tilt of a Bossung curve of a portion of a design layout used in a lithographic process for imaging that portion on...  
WO/2016/008656A1
A measurement method comprising using multiple radiation poles to illuminate a diffraction grating on a mask at a mask side of a projection system of a lithographic apparatus, coupling at least two different resulting diffraction orders ...  
WO/2016/008182A1
A mask, a corresponding array substrate manufacturing method, and an array substrate, applicable in the technical field of liquid crystal displays. The mask comprises an opaque area (5c) and a transparent area. The opaque area (5c) compr...  
WO/2016/005420A1
In a method for localizing defects (31) on a substrate (2) for EUV masks, phase contrast optics having a phase mask (11) are used for examining the substrate (2).  
WO/2016/005117A1
A lithographic apparatus comprising a support structure configured to be moved by a first scan distance during a single scanning operation when supporting a patterning device having a first extent in the scanning direction and to be move...  
WO/2016/001351A1
Disclosed is a membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane comprises one or more high doped regions wherein said membrane is doped with a dopant con...  
WO/2015/193486A1
Method of forming an electronic device(20) on a flexible substrate (30) without using acetone dissolvent, comprising the steps of: printing a hydrophobic mask (12) on a porous membrane (10) to form a pattern thereon which is complementar...  
WO/2015/185576A1
The invention discloses a method for calculating the parameters of a resist model of an IC manufacturing process. According to an embodiment of the method of the invention, a function representative of the target design convoluted throug...  
WO/2015/182362A1
A support frame (1A) for pellicles, which has a frame body (10) that is formed of an aluminum alloy, and wherein a pellicle film is bonded to the front surface (10a) of the frame body (10) and a glass substrate is bonded to the back surf...  
WO/2015/182483A1
A pellicle-manufacturing device provided with a pasting unit that includes a pasting chamber in which a pellicle frame member that includes a pellicle frame having a groove(s) provided at one end surface and/or the other end surface in t...  
WO/2015/183095A1
The invention is directed to a method for removing particulate contaminants from the backside of a wafer or reticle, and to a cleaning substrate for use in such method. In the method of the invention particulate contaminants are removed ...  
WO/2015/180191A1
Provided are a printed circuit board and a manufacturing method therefor, comprising a lower-clad layer, a groove provided on the lower-clad layer, and an optical fibre for transmitting an optical signal embedded in the groove, wherein t...  
WO/2015/182482A1
Provided is a pellicle mounting device comprising a bonding unit that includes the following: a bonding chamber for bonding an original plate which has a light irradiation surface onto which exposure light is radiated, and a pellicle whi...  
WO/2015/176310A1
An ultraviolet mask, which comprises a black matrix photoresist layer (302) covering a display area of a color filter substrate (301). An ultraviolet mask manufacturing method, which comprises: covering a black matrix photoresist materia...  
WO/2015/178250A1
A pellicle film has a film comprising an organic material and an inorganic material, with an area including the organic material and an area comprising the inorganic material coexisting on the same surface of the film, at least the centr...  
WO/2015/173397A1
The invention relates to a method for determining a corrected variable, which depends on at least one parameter, in a parameter range of the at least one parameter. The method comprises the step of carrying out a measurement, measurement...  
WO/2015/174412A1
A pellicle frame (300) equipped with a first frame member (100) and a second frame member (200) arranged such that one end face of each frame member in the thickness direction opposes an end face of the other frame member. In addition, a...  
WO/2015/166570A1
According to one embodiment of the present invention, in a method for designing a semiconductor integrated circuit layout, inhibition regions (DP1-DP5) are set on the basis of defect information (DF1-DF5) of mask blanks (M1-M5). A dispos...  
WO/2015/166927A1
Provided is a pellicle frame which includes a frame main body comprising: a groove disposed on one end surface, of the frame main body, that is in the thickness direction and that is on the side which supports a pellicle film; and a thro...  
WO/2015/163535A1
The present invention provides a photomask and a method for manufacturing the same, the photomask comprising: a light-transmitting substrate; and a light-shielding layer on the substrate, wherein the light-shielding layer comprises a lig...  
WO/2015/160185A1
Provided is a pellicle for EUV lithography. The pellicle for EUV lithography comprises a first combining layer formed on a first inorganic layer and a strength reinforcing layer including a carbon nanostructure, wherein the first combini...  
WO/2015/158444A1
Disclosed herein is a computer-implemented method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus comprising an illumination source and projection opti...  
WO/2015/156016A1
This mask blank has: a transparent substrate; a semitransparent layer formed on the transparent substrate; an intermediate layer formed on the semitransparent layer; and a light blocking layer formed on the intermediate layer. The light ...  
WO/2015/152124A1
This invention provides a mask blank that, despite containing a chromium-based light-blocking film, allows high transfer precision when using a hard-mask-film pattern as a mask. In said mask blank, a semi-light-transmitting film (2), a l...  
WO/2015/149401A1
A method for designing and manufacturing an alignment mark of a TFT LCD array. The method for manufacturing an alignment mark of a TFT LCD array comprises: step 10, preparing a passivation layer of a TFT LCD array; step 20, providing a p...  
WO/2015/152123A1
In order to form microscopic mask patterns with a high degree of precision, in this mask blank (10), in which a semi-light-transmitting film (2), a light-blocking film (3), and a hard-mask film (4) are layered on top of a light-transmitt...  
WO/2015/149378A1
An exposure mask (40), used in the manufacturing process of a color filter (203). The exposure mask (40) comprises a plurality of exposure areas (402) and shading areas (401) for separating the plurality of the exposure areas (402). Edge...  
WO/2015/146422A1
This mask blank is provided with a structure obtained by stacking, upon a light-transmitting substrate (10), a light-blocking film (11) and a hard mask film (13), in that order from the light-transmitting substrate side. The hard mask fi...  
WO/2015/146313A1
The present invention provides an information processing device (1) provided with: a reception unit (11) that receives pattern information indicating a pattern figure and actual observation contour line information acquired using an imag...  
WO/2015/146140A1
Provided is an extreme ultraviolet (EUV) mask wherein the optimal correction amount for an absorption layer pattern surrounding a phase defect can be estimated with high precision, with the propagation state of the phase defect in a mult...  
WO/2015/145887A1
This substrate for mask blanks comprises a substrate having two main surfaces, and is characterized in that the main surface of the substrate for mask blanks at the side where a transfer pattern is to be formed has a surface shape in whi...  
WO/2015/146421A1
This mask blank is provided with a structure obtained by stacking, upon a light-transmitting substrate (10), a phase shift film (11), a light-blocking film (13), and a hard mask film (15), in that order from the light-transmitting substr...  
WO/2015/141230A1
Provided is a reflective photomask blank that, during production of reflective photomasks, is capable: of reducing position displacement of transfer patterns caused by compressive stress of a reflective multi-layer film even if the refle...  
WO/2015/141706A1
This resist-layer-equipped blank (10) is provided with a resist layer (7) which is formed upon a substrate (1), and which is configured from a positive resist material. The thickness of the resist layer (7) is not more than 200 nm. The r...  
WO/2015/139951A1
Disclosed herein is a computer-implemented method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method comprising: computing a multi-variable co...  
WO/2015/141078A1
Provided are: a phase shift mask which has a thinner light-blocking film, while having solved the problem of ArF light resistance, in cases where a transition metal silicide material is used for the light-blocking film; and a mask blank ...  
WO/2015/136533A1
An article is presented configured for controlling a multiple patterning process, such as a spacer self-aligned multiple patterning, to produce a target pattern. The article comprises a test site carrying a test structure comprising at l...  
WO/2015/137077A1
Provided are: an apparatus for cleaning a reflective mask, which is capable of suppressing deterioration of the optical characteristics of a capping layer that is provided on a reflective mask and contains ruthenium; and a method for cle...  

Matches 1,251 - 1,300 out of 29,320