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Matches 1,351 - 1,400 out of 29,320

Document Document Title
WO/2014/208201A1
The purpose of the present invention is to provide a semiconductor device that is provided with a terminal region where electric field concentration can be effectively relaxed, while suppressing resist collapse during manufacture, and to...  
WO/2014/202341A1
The present invention discloses a system and a method for reflective and scanning CDI for the identification of errors in mask patterns and defects on mask blanks, comprising the steps of: a) providing a set-up for scanning the mask in r...  
WO/2014/203961A1
Provided are a mask blank substrate which has effectively extremely high principal surface flatness while a reduction in the manufacturing throughput of mask blank substrates is suppressed, a mask blank, and a transfer mask. Also provide...  
WO/2014/201730A1
A mask plate and a manufacturing method of an array substrate are disclosed. The mask plate (30) is used for manufacturing fan-out leads in non-effective display areas on the array substrate, and comprises fan-out lead patterns (31) with...  
WO/2014/190718A1
A mask plate, comprising a plurality of sub-mask plates which are arranged in an overlapping manner, wherein each sub-mask plate comprises a light-permeable area (1) and a light-shading area (2), and the light-shading areas (2) of the pl...  
WO/2014/192518A1
Provided is a method of optimizing (designing) a light source and a mask pattern which can be used for different purposes as necessary, wherein the cooperative relation between OPC and SMO is fully realized. [Solution] This method of des...  
WO/2014/188710A1
The present invention addresses the problem of providing a pellicle which has high EUV transmittance and high strength, while being not susceptible to damage by heat. In order to solve the above-mentioned problem, the present invention p...  
WO/2014/190077A1
A film and method of forming a film provides an unmodified starting layer of a starting material, the starting layer having opposed first and second surfaces and an initial thickness, T1, and a modified surface layer of thickness T2 whic...  
WO/2014/189004A1
A mask blank which has a structure wherein a semi-light-transmitting film and a light blocking film are laminated on a main surface of a light-transmitting substrate, and which is characterized in that: the semi-light-transmitting film i...  
WO/2014/183325A1
A mask plate used for a glue coating and a manufacturing method thereof. The mask plate comprises a framework and a screen plate (20) installed on the framework. The screen plate (20) is made from sheet metal. The screen plate (20) compr...  
WO/2014/184292A1
The invention relates to a system for producing structures in a wafer by means of a projection exposure system and a lithography mask. High-frequency contributions to a CD error can be removed substantially completely by means of said sy...  
WO/2014/181858A1
An optical element is provided with: a substrate; a multilayer film disposed on the substrate and formed by stacking a plurality of unit laminated structures each having a first layer and a second layer disposed on the first layer; and a...  
WO/2014/178244A1
Provided are a substrate processing apparatus, whereby high-quality substrates can be manufactured with high productivity, a device manufacturing method, and a mask. The present invention is provided with: a mask supporting member that s...  
WO/2014/176211A1
A method for lithographic patterning of thin films. A thin film is deposited on a substrate and the film is exposed to optical energy from a focused laser to induce a thermal gradient in the film by optical absorption. The film is soften...  
WO/2014/176163A1
The embodiments described herein generally relate to active alignment of a fine metal mask. The fine metal mask is connected with a frame through a plurality of microactuators. The microactuators can act on the fine metal mask to stretch...  
WO/2014/172989A1
A mask (1) and a manufacturing method therefor. The mask (1) comprises multiple controllable color change units (11) in array arrangement. The controllable color change units (11) are used for adjusting a light transmittance according to...  
WO/2014/171315A1
Provided is a mold release performance-restoring solution useful for restoring decreased mold release performance when the mold release performance of a coating film containing silicone oil has decreased. The solution is configured of on...  
WO/2014/171510A1
The topmost layer configuring a multistage region of a phase shift layer is made to have a higher oxygen content than the lower layers. By this means, the reflectivity is reduced of the topmost layer, where the exposure light is incident...  
WO/2014/171352A1
Provided are a resist removing liquid to be used in patterning a photomask for EUV lithography, said resist removing liquid having an excellent removability, a resist removal method using the same, and a method for producing a photomask....  
WO/2014/171512A1
In a phase shift layer forming step, by setting the flow rate ratio of an oxidizing gas in an ambient gas, phase shift layers (11b, 11c, 11d) are formed on a transparent substrate (S) in multiple stages. Further, in a phase shift pattern...  
WO/2014/166155A1
A manufacturing method of a mask plate for solidifying and shielding frame sealing glue comprises: forming a negative light resistance shading material layer (11) on a transparent substrate (10); exposing, by using a color film mask plat...  
WO/2014/164894A1
A technique for inspecting, qualifying and repairing photo-masks for use at extreme ultra-violet (EUV) wavelengths is described. In this technique, multiple images of a substrate and/or a blank that includes multiple layers deposited on ...  
WO/2014/154452A1
The present invention is concerned with an apparatus for shielding a reticle for EUV lithography. The apparatus comprises a pellicle, and at least one actuator in communication with the pellicle, the actuator being configured to induce, ...  
WO/2014/153879A1
A UV mask and a fabrication method thereof. The UV mask fabrication method comprises: forming a UV shielding layer on a coverage area of a base substrate by using a color filter layer mask plate and a black matrix mask plate; or forming ...  
WO/2014/153889A1
An ultraviolet mask plate and a preparation method therefor, and a curing method for a sealant. The ultraviolet mask plate comprises: a transparent substrate (7) and a metal mask layer (6) arranged on the transparent substrate (7). A lig...  
WO/2014/153866A1
A mask plate, comprising: a substrate (1). The substrate (1) comprises an unexposed area (22) and a partially exposed area (21), wherein at least a light-tight material layer (2) is formed on the unexposed area (22) of the substrate (1);...  
WO/2014/140047A2
The problem of mura in large area photomasks is solved or at least reduced by setting up a writing system to write a pattern with high accuracy and with the optical axes essentially parallel to the movement axes of the stage, then writin...  
WO/2014/143928A1
A system or machine 10 is disclosed which takes pre-stretched emulsion coated screens 34, digitally prints thereon and exposes them before further processing and use in a screen printing machine.  
WO/2014/139855A1
The invention provides a patterning device, for use in forming a marker on a substrate by optical projection, the patterning device comprising a marker pattern having a density profile that is periodic with a fundamental spatial frequenc...  
WO/2014/142125A1
Provided are a pellicle film and a pellicle which exhibit excellent transmittance with respect to extreme ultraviolet (EUV) light, and sufficient physical strength and durability in practical use, and with which film fragments can be eas...  
WO/2014/139807A1
An illumination optical unit (1) for a mask inspection system is used with EUV illumination light (2). A hollow waveguide (9) of the illumination optical unit (1) serves for guiding the illumination light (2). The hollow waveguide (9) ha...  
WO/2014/140046A2
The technology disclosed relates to methods and systems that can be used to reduce visible artifacts know as mura. In particular, it relates to producing alignment marks by physically modifying appearance of a layer of exposure or radiat...  
WO/2014/127568A1
A preparation method for a multi-film layer substrate comprises: forming a first film layer on a substrate and forming a set of alignment marks in an alignment area of the first film layer; and successively forming a plurality of subsequ...  
WO/2014/129527A1
The present invention provides a reflective mask blank on which a reference mark is formed for performing highly precise coordinate management of defects, whereby there is no cleaning damage or risk of contamination of a multilayer refle...  
WO/2014/127569A1
A mask plate comprises a non-transmitting area and a slit-shaped transmitting area, wherein the slit-shaped transmitting area has two opposite edges, and each edge is formed by multiple continuous concave circular arcs.  
WO/2014/127985A1
Disclosed herein is a computer-implemented method for simulating a scattered radiation field of a patterning device comprising one or more features, in a lithographic projection apparatus, the method comprising: determining a scattering ...  
WO/2014/128794A1
A photomask includes: a light-shielding section provided on a translucent substrate; a main pattern section that is an opening provided in an area corresponding to a desired pattern of the light-shielding section; and an auxiliary patter...  
WO/2014/125000A1
The invention relates to a method for ascertaining distortion properties of an optical system in a measurement system for microlithography, wherein the optical system images at least one structure to be measured into a measurement image....  
WO/2014/125494A1
A method for repairing a defect on a substrate surface includes placing on the defect a nanoparticle that includes a conductive material. A region of the substrate surface in which the nanoparticle is placed is irradiated, the region bei...  
WO/2014/123030A1
Provided are a photomask capable of suppressing the incidence of exposure flaws even when deformation occurs during the exposure process, a method for manufacturing the photomask, and an exposure apparatus. Pattern regions on which a pre...  
WO/2014/120985A1
An apparatus for generating extreme ultra-violet (EUV) light for use in a lithography inspection tool, comprising a drive laser arranged to produce a laser pulse, a vacuum chamber, a set of focusing optics arranged to focus the laser pul...  
WO/2014/112409A1
Provided are a method for manufacturing a low-defect and high-quality mask blank substrate such that the occurrence of a phenomenon where a portion of a transfer pattern and a principal surface of the substrate therebeneath are broken of...  
WO/2014/113245A1
A two-dimensional dense array of contact holes can be printed on a negative photoresist employing a combination of a quadrupole illumination lens and a lithographic mask including a criss- cross pattern of opaque lines. The openings in t...  
WO/2014/110854A1
A device and a method for repairing an array substrate. The device comprises: a laser source (100), used for repairing redundant photoresist (302) on an array substrate (300); a detecting device (400), used for detecting whether redundan...  
WO/2014/111983A1
A photomask includes a transparent substrate and a light-shielding section provided on the transparent substrate. The light-shielding section has a translucent mask pattern opening, and in the mask pattern opening, there are provided a p...  
WO/2014/113070A1
A reticle (501 ) for multiple patterning a layer (303) of an integrated circuit die includes a first portion (503) with a first layout pattern for multiple patterning the layer of the integrated circuit die, and a second portion (505) wi...  
WO/2014/112457A1
Provided is a mask blank in which, even when a silicon-based material is applied to the material forming a phase-shift film, there is a high uniformity in composition and optical characteristics in the in-plane and film thickness directi...  
WO/2014/104544A1
The present invention relates to a monomer for a hardmask composition represented by chemical formula 1, to a hardmask composition including said monomer, and to a method for forming a pattern using said hardmask composition. In the abov...  
WO/2014/103875A1
A method for producing a phase shift mask includes a step of forming a second mask (RP2) having a predetermined aperture pattern in such a manner that: a light-blocking layer (13) exposed on a surface and pattern apertures is covered; an...  
WO/2014/103867A1
A method for producing a phase shift mask includes the step of sputtering a target made of a chromium-based material in an atmosphere of a mixture gas containing 10.4 % or less of an acidic gas.  

Matches 1,351 - 1,400 out of 29,320