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Patent Searching and Data


Matches 351 - 400 out of 29,222

Document Document Title
WO/2022/060573A1
A layout geometry of a lithographic mask is received. The layout geometry is partitioned into feature images, for example as selected from a library. The library contains predefined feature images and their corresponding precalculated ma...  
WO/2022/059916A1
Provided is a pellicle thermal durability evaluation device. The pellicle thermal durability evaluation device may comprise: a chamber; a pellicle holder which is disposed in the chamber and on which a pellicle is seated; a durability me...  
WO/2022/054810A1
Provided are a phase shift mask blank with which the occurrence of haze on a mask can be sufficiently minimized, a phase shift mask having few haze defects, and a method for manufacturing said phase shift mask. A phase shift mask blank (...  
WO/2022/054431A1
A focused energy beam device equipped with a support part for supporting a substrate to be processed and a focused energy beam column which is provided with a differential pump and is capable of relative movement so as to correspond to a...  
WO/2022/053283A1
Systems, apparatuses, and methods are provided for transporting a reticle chamber (pod) for processing. In one example, a system for transporting the pod is disclosed. The system may include a moving apparatus, a base coupled to the movi...  
WO/2022/050156A1
The present invention pertains to a reflection-type mask blank (10) obtained by forming, on a substrate (11) in the following order, a multilayer reflection film (12) for reflecting EUV light, a phase shift film (14) for shifting a phase...  
WO/2022/048854A1
A pellicle membrane for use in a lithographic apparatus, said pellicle membrane characterised by inplane variation in composition is described. Also described is a method of manufacturing a pellicle membrane, said method including the st...  
WO/2022/051310A1
A reticle inspection system and a method of handling a reticle in a reticle inspection system are provided. The reticle inspection system includes an active reticle carrier and an inspection tool. The reticle is disposed on the active re...  
WO/2022/042993A1
An apparatus for reducing a partially oxidized reticle and pellicle assembly comprises: a support; a hydrogen supply; and an electron source. The support is for supporting a reticle and pellicle assembly. The hydrogen supply is operable ...  
WO/2022/044557A1
The purpose of the present invention is to provide a photomask with which adhesiveness to an object to be brought into contact therewith during contact exposure is reduced and a pattern having excellent linearity is formed. The present...  
WO/2022/037921A1
Described herein is a method for selecting patterns for training a model to predict patterns to be printed on a substrate. The method includes (a) obtaining images of multiple patterns, wherein the multiple patterns correspond to target ...  
WO/2022/039254A1
The present invention provides a photomask container that can firmly hold a photomask substrate, suppresses condensation of a photomask substrate accommodation part, provides an excellent level of cleanliness, does not easily allow the a...  
WO/2022/037244A1
A layout correction method, comprising: providing an initial layout (10) (S11); expanding the initial layout (10) to obtain an expanded layout (11) (S12); correcting the expanded layout (11) to obtain a corrected layout (12) (S13); and o...  
WO/2022/033196A1
An overlay pattern, comprising: a light-transmitting region, and a first non-light-transmitting region. The first non-light-transmitting region and the light-transmitting region are located in the same plane, and the area of the first no...  
WO/2022/029939A1
Provided is an optical waveguide having little optical loss at a connection portion, in an optical circuit divided into a plurality of sub-circuits. Further provided is a photomask (110) in which a waveguide pattern of an optical circuit...  
WO/2022/028182A1
Provided are a metal mask, an evaporation method, a display panel and a display device. The metal mask comprises: a metal frame, the metal frame being provided with a hollowed-out area; and an alignment metal strip, the alignment metal s...  
WO/2022/029262A1
A processing arrangement (10) comprising: a device (240) for providing a focused particle beam (242); a sample (300), which can be processed with the aid of the particle beam (242) and a process gas (PG); and a flushing plate (100) compr...  
WO/2022/030499A1
The present invention addresses the problem of providing: a pellicle which is capable of suppressing deterioration of a pellicle film; and an original plate for light exposure. This pellicle comprises a pellicle film (12) which compris...  
WO/2022/031268A1
Embodiments of a photomask removal apparatus for removing photoresist off of a photomask are provided herein. In some embodiments, a nozzle head for removing photoresist off of a photomask includes: a nozzle portion having a first side a...  
WO/2022/029315A1
Method for the particle beam-induced etching of a lithography mask (100), more particularly a non-transmissive EUV lithography mask, having the steps of:a) providing (S1) the lithography mask (100) in a process atmosphere (ATM),b) beamin...  
WO/2022/030498A1
A pellicle (10) which comprises a pellicle film (12) that comprises a carbon-based film having a carbon content of 40% by mass or more and a support frame (14) that supports the pellicle film in such a manner that the pellicle film and t...  
WO/2022/031442A1
Methods and systems for detecting defects on a specimen are provided. One system includes an inspection subsystem configured to generate images of a specimen and one or more computer subsystems configured for detecting defect candidates ...  
WO/2022/028123A1
A photomask storage system (504A, 504B), a query system, a storage method, a computer apparatus, and a storage medium. The storage system (504A, 504B) comprises: support devices (10A, 10B) comprising a photomask accommodation region (102...  
WO/2022/028997A1
Described herein is a method and apparatus for selecting patterns from an image such as a design layout. The method includes obtaining an image (e.g., of a target layout) having a plurality of patterns; determining, based on pixel intens...  
WO/2022/023546A1
The present invention relates to a method (1700, 1800) for determining an alignment of a photomask (270, 410, 700) on a sample stage (100) which is displaceable along at least one axis that is parallel to a chuck surface (195, 265) of th...  
WO/2022/022035A1
A method for forming a high density pattern, comprising: providing a substrate; forming a hard mask layer on the substrate; forming a sacrificial layer on the hard mask layer; forming photoresists provided at intervals on the sacrificial...  
WO/2022/022949A1
Disclosed is a method for focus measurement of a lithographic process. The method comprises receiving a substrate on which a metrology pattern has been printed with a lithographic apparatus with an illumination pupil, illuminating the me...  
WO/2022/023129A1
Systems, apparatuses, and methods are provided for increasing the throughput of a particle inspection system. During a first portion of an exposure time period of the particle inspection system, an example method can include irradiating ...  
WO/2022/017080A1
A photomask defect detection method and system. The photomask defect detection method comprises: providing a photomask (S110); providing a photomask defect detection system, and when the photomask is loaded or unloaded, continuously perf...  
WO/2022/017705A1
Disclosed is a method of determining a process window within a process space comprising obtaining (610) contour data (615) relating to features to be provided to a substrate (625) across a plurality of layers, for each of a plurality of ...  
WO/2022/016802A1
A physical feature map- and DCNN-based computation method for a machine learning-based inverse lithography technology solution, comprising: obtaining N1 feature maps for {Si} (i=1, 2, …, N1) from a lithography target pattern on the bas...  
WO/2022/015612A1
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; and an absorber layer...  
WO/2022/014248A1
The purpose of the present invention is to provide a mask blank which makes it possible to accurately manufacture a transfer mask having an auxiliary pattern with a microscopic dimension of about 20 nm. This mask blank (10) comprises a...  
WO/2022/013302A1
The present invention relates to a method (1900) for repairing at least one defect (240, 750, 940, 1140, 1240, 1330, 1630, 1840) of a lithographic mask (200, 400, 500, 600, 700, 800, 900, 1100, 1200, 1300, 1600, 1800), the method compris...  
WO/2022/015548A1
The present disclosure relates to methods of assembling a lensed optical fiber array by printing in situ a lens onto each optical fiber of an optical fiber array with an ultrafast laser system (202) where the lens (108) can be shaped to ...  
WO/2022/013297A1
A method, a device and a computer program for repairing a mask for lithography, in particular a mask for EUV lithography, are described. A method of repairing a mask for lithography, in particular a mask for EUV lithography, comprises th...  
WO/2022/010201A1
The present invention relates to a method for producing a pellicle for extreme ultraviolet lithography. The present invention provides a method for producing a pellicle for extreme ultraviolet lithography, the method comprising the steps...  
WO/2022/008675A1
A method for determining a geometry of a measuring tip (100) for a scanning probe microscope is proposed. The method comprises the steps of: a) generating (S1) at least one test structure (200), which has elevations (210) alternating wit...  
WO/2022/010214A1
The present invention relates to a growth inhibitor for forming a pellicle protective thin film, a method for forming a pellicle protective thin film by using same, and a mask manufactured therefrom and, more specifically, to a growth in...  
WO/2022/004456A1
The purpose of the present invention is to solve problems of accuracy deterioration in the shape of a formed pattern which is caused by an increase in pattern thickness resulting from increase in thickness of an oxide layer formed on a s...  
WO/2022/004350A1
Provided is a mask blank that enables, without complicating the mask-manufacturing process, creation of patterns of differing transmittance with desired accuracy, and achievement of a desired phase-shift function in each pattern. This ...  
WO/2022/002931A1
The present invention relates to a method (2800) for setting at least one side wall angle (170, 670, 1970, 2470, 2770, 2780) of at least one pattern element (120, 220, 230, 250, 260, 280, 290) of a photolithographic mask (150, 200, 700) ...  
WO/2022/002728A1
Methods for repairing a defect of a lithographic mask with a particle beam are described. One such method can comprise the following steps: Processing the defect with the particle beam with a first set of processing parameters; processin...  
WO/2022/002558A1
To ascertain an image of an object (5) which emerges when the object (5) is illuminated with illumination light (1) from a partly coherent light source (17) with a target illumination setting having an illumination-side numerical apertur...  
WO/2022/000478A1
The present application relates to a circuit board manufacturing method and a circuit board. The method comprises: providing a substrate, forming a metal layer on the substrate, covering the side of the metal layer away from the substrat...  
WO/2021/259738A1
Described herein is a method for determining a likelihood that an assist feature of a mask pattern will print on a substrate. The method includes obtaining (i) a plurality of images of a pattern printed on a substrate and (ii) variance d...  
WO/2021/262271A1
A computing device is provided, including a processor. The processor may generate a three-dimensional device model at least by receiving one or more three-dimensional substrate elements and one or more two-dimensional lithography element...  
WO/2021/259646A1
Systems, apparatuses, and methods are provided for detecting a particle on a substrate surface. An example method can include receiving, by a grating structure, coherent radiation from a radiation source. The method can further include g...  
WO/2021/253778A1
A photomask protection device, comprising: a pair of reflectors (12), the reflectors (12) being arranged in parallel to each other; and a laser tube (13) provided on one end of one of the reflectors (12) and used for emitting a laser bea...  
WO/2021/251157A1
Provided are a pellicle frame (1), a pellicle, an exposure original plate with a pellicle, an exposure method, a method for manufacturing a semiconductor, and a method for manufacturing a liquid crystal display board, the frame-shaped pe...  

Matches 351 - 400 out of 29,222