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WO/2023/247170A1 |
An imaging EUV optical unit (24) serves for imaging an object field (5) into an image field (11). The EUV optical unit (24) has a plurality of mirrors (M1 to M4) for guiding EUV imaging light (16) at a wavelength of shorter than 30 nm al...
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WO/2023/247496A1 |
The invention relates to a device (100) for treating the surface (102) of an optical element (101) of a lithography system (1), in particular an EUV lithography system, in an atomic layer treatment process, comprising: a sample holder (1...
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WO/2023/249070A1 |
This photosensitive resin composition contains (a) an alkali-soluble resin, (b) a photoinitiator, and (c) an ethylenically unsaturated compound, and is characterized in that the mass ratio ((a) alkali-soluble resin / (c) ethylenically un...
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WO/2023/249606A1 |
The problem of stitching together multiple exposure regions in a maskless photolithography system is addressed by systems and methods that utilize high-speed data paths between critical maskless photolithography components and a master c...
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WO/2023/248933A1 |
The present invention addresses a first problem of providing a pattern forming method that makes it possible to form a pattern having excellent in resolution. Moreover, the present invention addresses a first problem of providing a metho...
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WO/2023/249045A1 |
Provided are: a photosensitive composition for an organic EL display device, the photosensitive composition being excellent in preservation stability as a photosensitive composition, being excellent in curing properties at low temperatur...
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WO/2023/243586A1 |
This electronic device manufacturing method includes: a layering step in which a resist film and a topcoat film are provided in this order on a substrate to obtain a layered body; an exposure step in which the result is irradiated with a...
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WO/2023/245047A1 |
The present disclosure relates to precursor compositions for forming irradiation sensitive films. In particular, the disclosure is directed to use of metal-containing precursors having haloaliphatic or unsaturated substituents, or other ...
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WO/2023/242060A1 |
The invention relates to: a method for heating an optical element in an optical system, in particular in a microlithographic projection exposure system; and an optical system. In a method according to the invention, a heating power is in...
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WO/2023/243184A1 |
Provided is a cooling device for cooling an object to be cooled, the cooling device being characterized by having a circulation system for circulating a refrigerant for cooling the object to be cooled, wherein: the circulation system is ...
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WO/2023/244832A1 |
A method for manufacturing a micromodel with a mixed wettability surface representing a hydrocarbon reservoir is disclosed. The method includes coating a top surface of a hydrophilic substrate with photoresist, covering a top of the phot...
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WO/2023/241885A1 |
An assembly includes a window useful for optical access to an interior of an extreme ultraviolet (EUV) light source vessel, the window having a transmission band and a protector configured to shield the window from the interior of the EU...
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WO/2023/243426A1 |
Provided is a resist underlayer film-forming composition that, in addition to exhibiting a satisfactory etching resistance and heat resistance, also satisfies various other properties, e.g., curability, amount of sublimate generation, in...
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WO/2023/243414A1 |
This resin composition contains: a pigment-containing colored material; a resin; and a compound represented by formula (1), wherein said compound has a maximum value of the molar extinction coefficient in the wavelength range of 400 to 7...
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WO/2023/241849A1 |
The invention relates to: a method for heating an optical element in an optical system, in particular in a microlithographic projection exposure system; and an optical system. In a method according to the invention, a thermal manipulator...
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WO/2023/241878A1 |
The invention relates to a method for driving an actuator for a component (Mx, 117) of a projection exposure apparatus (1, 101) for semiconductor lithography, comprising the following steps: - characterizing (30) the actuator, - paramete...
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WO/2023/243476A1 |
A resist underlayer film formation composition for EB or EUV lithography includes a hydroxyl group–containing polymer (A), a photoacid generator (B) that has a hydroxyl group at a cation portion, a cross-linker (C) that can react with ...
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WO/2023/241867A1 |
A method for calibrating a height measuring optical sensor for a substrate in a lithographic apparatus. The method comprises determining, using the height measuring optical sensor, a first height of a surface of the substrate within a re...
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WO/2023/241893A1 |
A substrate support configured to support a substrate in a lithographic apparatus comprising: a first circumferential wall; a first opening radially outwards of the first circumferential wall and configured to supply and/or extract gas; ...
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WO/2023/243353A1 |
The present invention addresses the problem of providing a colored resin composition which is capable of forming an optical filter that has excellent heat resistance. The preset invention provides a colored resin composition which cont...
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WO/2023/243593A1 |
This resin composition comprises: a polymer having a structural unit represented by [(R2)d(R3)e(OR4)fSiOg/2] and a structural unit represented by [(R1)bMOc/2]; and a solvent having a 1-octanol/water partition coefficient log Pow of 3 or ...
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WO/2023/242012A1 |
An inspection system includes a radiation source, an integrated optical system, and first and second detectors. The radiation source generates radiation to irradiate a target. The integrated optical system includes: a substrate; first, s...
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WO/2023/241870A1 |
Systems and methods of detecting a defect in a sample using a charged-particle beam apparatus are disclosed. The apparatus may include a charged-particle source configured to emit charged particles and a controller including circuitry co...
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WO/2023/241850A1 |
Method of spatially aligning a patterning device and a substrate, wherein the patterning device and the substrate are separated by an optical path comprising one or more moveable optical components, the method comprising: - projecting a ...
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WO/2023/243199A1 |
An embodiment of the present invention relates to a photosensitive resin composition, a patterned resin film, a method for producing a patterned resin film, and a semiconductor circuit substrate. The photosensitive resin composition comp...
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WO/2023/243579A1 |
This electronic device manufacturing method comprises: a lamination step for providing a resist underlayer film, a resist film, and a top coat film in the stated order on a substrate to obtain a laminate; an exposure step for irradiating...
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WO/2023/243585A1 |
Provided is a resin composition for forming a resist upper layer film, the resin composition comprising at least one sensitizing element selected from the group consisting of Ge, Mo, Hf, Zr, Ta, W, Cr, Co, Fe, Pt, Sn, and Sb, wherein the...
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WO/2023/243521A1 |
The present invention provides an actinic light-sensitive or radiation-sensitive resin composition containing: (A) a resin that exhibits an increase in polarity under the action of acid; (B) a compound that, upon exposure to actinic ligh...
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WO/2023/243198A1 |
One aspect of the present invention relates to: a photosensitive resin composition; a resin film having a pattern; a method for producing a resin film having a pattern; and a semiconductor circuit board. The photosensitive resin composit...
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WO/2023/238902A1 |
This photosensitive resin composition is characterized by containing (A) a photopolymerization initiator, (B) a compound having an ethylenically unsaturated group and a cardo structure, and (E) a colorant, wherein the (A) photopolymeriza...
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WO/2023/236069A1 |
An alignment calibration system and a method therefor. After an image sensing device (3) and an image capturing apparatus (4) respectively acquire alignment information, positioning information is obtained through computation so as to ac...
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WO/2023/238737A1 |
The purpose of the present invention is to provide a substrate processing method that effectively suppresses defects in a resist pattern. A substrate processing method according to the present invention involves forming a relief patter...
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WO/2023/237404A1 |
An illumination optical unit (1) is part of a mask inspection system for use with EUV illumination light (3). A hollow waveguide (11) serves to guide the illumination light (3). For the illumination light (3), the hollow waveguide (11) h...
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WO/2023/237612A1 |
A composition containing an alkali-soluble material, a cured film and a manufacturing method thereof.
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WO/2023/236254A1 |
A photomask pattern correction method, a system, a photomask and a preparation method therefor. The photomask pattern correction method comprises: acquiring photomask data of all photomask patterns in a photomask pattern template, the ph...
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WO/2023/238299A1 |
A photosensitive resin composition according to one embodiment of the present disclosure contains a binder polymer, a photopolymerizable compound, a photopolymerization initiation agent, and a sensitization agent, wherein the binder poly...
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WO/2023/239417A1 |
This disclosure describes techniques for fabrication of waveguides as optical devices or for use in optical devices, with the waveguides customized to have a desired thickness variation. Techniques can employ inkjet-based lithography to ...
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WO/2023/239628A1 |
A method provides for performing a dry development of an organotin composition patterned with radiation and having a latent image. The method comprises developing a structure with a gas comprising a halogen based developer and an oxygen ...
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WO/2023/238115A1 |
A computer system is presented configured and operable as a library constructor for use in extracting one or more parameters of a patterned structure from real time measured data obtained on said structure. The system comprises: data inp...
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WO/2023/237993A1 |
Primer layers (104) having improved reflectivity and thermal insulation properties are provided for use in microencapsulated thermal imaging sheets (100). Primer layers having a polymeric binder, of about 3% to about 60% by weight, relat...
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WO/2023/239890A1 |
A system, software application, and method for optical device metrology of optical device patterns formed from lithography stitching are provided. In one example, the method includes creating a stitched design file comprising images of a...
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WO/2023/238762A1 |
This method for producing a blue cured film includes: a step for forming, on a substrate, a coating film of a blue photosensitive composition that contains a colorant, an alkali-soluble resin, a photopolymerizable compound, and a photoin...
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WO/2023/237452A1 |
The invention relates to a component (50, 70) for a projection exposure apparatus (1, 101) for semiconductor lithography comprising at least two structural parts (51, 55, 71, 75) which are connected to one another, it being possible for ...
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WO/2023/238286A1 |
Provided is a photosensitive resin composition by which can be formed, at a relatively low temperature, an insulating coating that excels in adhesion to a substrate of an electronic device such as a touch panel, resistance (chemical resi...
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WO/2023/238732A1 |
[Problem] To provide a layered structure that includes a resin layer with which a cured product with a high dielectric constant can be obtained and having both good image formation after development and before heat curing and good image ...
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WO/2023/237282A1 |
The invention relates to a method for operating a projection exposure system for microlithography, comprising: heating at least one optical element of the projection exposure system by applying heat radiation to a surface (30) of the opt...
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WO/2023/238202A1 |
This photosensitive element comprises a support body and a photosensitive layer formed on the support body using a photosensitive resin composition containing a binder polymer, a photopolymerizable compound, a photopolymerization initiat...
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WO/2023/238200A1 |
Provided is a drawing data generating method, said data representing a drawing pattern to be formed by a spatial light modulator in order to form a predetermined exposure pattern atop a substrate by means of exposure light. In order to s...
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WO/2023/238814A1 |
This photosensitive element comprises: a support body; and, on the support body, a photosensitive layer formed by using a photosensitive resin composition that contains a binder polymer, a photopolymerizable compound, a photopolymerizati...
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WO/2023/236255A1 |
The present disclosure relates to an exposure method and apparatus, a computer device, a storage medium, and a computer program product. The method comprises: acquiring a reference diffraction light intensity which is used for exposing a...
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