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WO/2015/070352A1 |
A concentric APCI surface ionization probe, supersonic sampling tube, and method for use of the concentric APCI surface ionization probe and supersonic sampling tube are described. In an embodiment, the concentric APCI surface ionization...
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WO/2015/053658A1 |
A method includes layer-by-layer stacking of carbon fibers or carbon fiber fabric onto a working surface of a forming element. On base 1 of the forming element are provided cylindrical protrusions 2 with conical apexes. Shape and size...
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WO/2015/053301A1 |
The objective of the present invention is to provide an ion beam device capable of forming a nanopyramid stably having one atom at the front end of an emitter tip even when the cooling temperature is lowered in order to observe a sample ...
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WO/2015/047446A1 |
In accordance with one embodiment of the present invention, an end-Hall ion source has an electron emitting cathode, an anode, a reflector, an internal pole piece, an external pole piece, a magnetically permeable path, and a magnetic-fie...
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WO/2015/023361A1 |
A processing system is disclosed, having an electron beam source chamber that excites plasma to generate an electron beam, and an ion beam source chamber that houses a substrate and also excites plasma to generate an ion beam. The proces...
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WO/2015/019665A1 |
Provide is a charged particle beam device comprising a gas field ionization ion source, wherein control of the flow rate (pressure) of a raw material gas is made easier, and without increasing the temperature of the nanochip, the concent...
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WO/2015/017635A1 |
An ion source includes an ion source chamber, a gas source to provide a fluorine-containing gas species to the ion source chamber and a cathode disposed in the ion source chamber configured to emit electrons to generate a plasma within t...
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WO/2015/009457A1 |
A cathode assembly is for use in a radiation generator and includes an ohmically heated cathode, and a support having formed therein a hole and a recess at least partially surrounding the hole. In addition, there is a mount coupled to th...
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WO/2015/006065A1 |
A negative ion source includes a plasma chamber, a microwave source, a negative ion converter, a magnetic filter and a beam formation mechanism. The plasma chamber contains gas to be ionized. The microwave source transmits microwaves to ...
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WO/2014/201292A1 |
A linear anode layer ion source is provided that includes a top pole having a linear ion emitting slit. An anode under the top pole has a slit aligned with the top pole ion emitting slit. At least one magnet creates a magnetic field that...
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WO/2014/198737A2 |
The invention provides an apparatus for charging or altering the charge of gas-entrained particles in an aerosol, the apparatus comprising: (a) an ion generating chamber (1) containing a first electrode (2) for generating a corona discha...
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WO/2014/201285A1 |
A duoplasmatron is provided having a cathode, an anode with linear slit, and an intermediate electrode (IE) between the cathode and the anode where the IE has an opening that is aligned with the anode slit. A magnet forms a magnetic fiel...
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WO/2014/196262A1 |
An ion gun (IG) has an ionizing chamber (IC) and a ion generation unit (GP) for generating ions in the ionizing chamber (IC). The ion generation unit (GP) includes an anode (13), a cathode (11), a gas supply mechanism (10), and a permane...
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WO/2014/191890A1 |
The invention is a new arrangement of magnets in the pattern of a geometrically symmetrical grid, lying on a plane or non-plane surface. Said arrangement produces a configuration of magnetic field that is asymmetrical with respect to the...
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WO/2014/192703A1 |
[Problem] In a nanocluster production device, to improve size control and structural control of nanoclusters, and to increase the yield and amount of nanoclusters for which at least one of size and structure was selected. [Solution] Prov...
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WO/2014/178418A1 |
The present invention provides a liquid droplet injecting apparatus capable of efficiently injecting liquid droplets into a vacuum vessel. The liquid droplet injecting apparatus includes a liquid container(12) which holds a liquid(9) and...
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WO/2014/179677A1 |
An ion source includes an ion source chamber, a cathode disposed within the ion source chamber and configured to emit electrons to generate an arc plasma, and a repeller configured to repell electrons back into the arc plasma. The ion so...
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WO/2014/175087A1 |
The purpose of the present invention is to provide a charged particle gun using merely an electrostatic lens, said charged particle gun being relatively small and having less aberration, and to provide a field emission-type charged parti...
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WO/2014/175702A1 |
An ion beam source comprises a magnetic field unit and an electrode unit. The magnetic field unit has one side of which is open and faces an object to be treated, and the other side of which is closed, wherein a plurality of magnetic pol...
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WO/2014/176516A1 |
An exemplary ion source for creating a stream of ions has a chamber body that at least partially bounds an ionization region of the arc chamber. The arc chamber body is used with a hot filament arc chamber housing that either directly or...
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WO/2014/170935A1 |
Provided is an ion beam processing device that makes it possible to reactively and selectively remove foreign matter which has been attached onto an electrode possessed by an electrode assembly during use of the ion beam processing devic...
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WO/2014/158479A1 |
An ion source for use in a radiation generator includes an active cathode configured to emit electrons on a trajectory away from the active cathode, at least some of the electrons as they travel interacting with an ionizable gas to produ...
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WO/2014/158474A1 |
A method of generating ions in a radiation generator includes emitting electrons from an active cathode and on a trajectory away from the active cathode, at least some of the electrons as they travel interacting with an ionizable gas to ...
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WO/2014/140179A1 |
A method of and apparatus for controlling the temperature of an inductively coupled or microwave induced plasma for optical emission spectrometry or mass spectrometry in which the intensities of two spectral lines of radiation emitted by...
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WO/2014/136158A1 |
According to one embodiment of the present invention, an ion beam etching method has: a step (11b) for applying, to a first electrode (307), a positive voltage for extracting ions to a vacuum container (1) in a first state wherein an ion...
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WO/2014/128462A2 |
An analytical apparatus (1) for mass spectrometry comprises an electron impact ioniser including an electron emitter (22) and an ionisation target zone (18). The target zone (18) is arranged to be populated with matter to be ionised for ...
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WO/2014/117271A1 |
A surface ionization source comprises a tube having a first end, a second end, and an interior bore extending through the tube from the first end to the second end. The first end of the tube is configured to receive a flow of gas and the...
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WO/2014/111469A1 |
The invention relates to a device (100) for producing a plasma (Q) from a fluid (F) and handling same, including a microwave source (102), a microwave resonant structure (104) comprising a resonant element in the form of a quarter-wave a...
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WO/2014/097576A1 |
The purpose of the present invention is to provide a grid assembly, which is easy to assemble, and has high assembly repeatability, and an ion beam etching apparatus that is provided with the grid assembly. According to one embodiment of...
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WO/2014/081128A1 |
The present invention concerns a linear accelerator based on an electron layer whereby a high frequency pulse type of electron beam is emitted, and the invention has the advantage of reduced expense and the advantage of extended life of ...
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WO/2014/074414A1 |
Methods of reducing glitch rates within an ion implanter are described. In one embodiment, a plasma-assisted conditioning is performed, wherein the bias voltage to the extraction electrodes is modified so as to inhibit the formation of a...
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WO/2014/069094A1 |
A film thickness distribution exists within the surface of a substrate after a CMP step. This film thickness distribution results in, for example, variation in the gate threshold voltage of a metal gate, and causes variation in element c...
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WO/2014/065576A1 |
The apparatus for generating a polarization beam for β- NMR according to the present invention, comprises: an acceleration unit for accelerating protons so as to generate proton beams; a target unit including a multi-stage 9Be target in...
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WO/2014/061625A1 |
This charged particle beam device is provided with: a charged particle beam source that discharges a charged particle beam; a charged particle beam optical system that focuses the charged particle beam and irradiates same on a specimen; ...
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WO/2014/062515A1 |
An ion source includes arc chamber housing defining an arc chamber. The arc chamber housing has an extraction plate in a fixed position, and the extraction plate defines a plurality of extraction apertures. The ion source also includes a...
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WO/2014/058642A1 |
A plasma ion source including a plasma chamber, gas inlets, an RF antenna, an RF window, an extraction plate, a window shield, and a chamber liner. The RF window may be positioned intermediate the RF antenna and the plasma chamber. The w...
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WO/2014/036130A2 |
An ionic liquid ion source can include a microfabricated body including a base and a tip. The body can be formed of a porous material compatible with at least one of an ionic liquid or room-temperature molten salt. The body can have a po...
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WO/2014/025611A1 |
A system and method of improving the performance and extending the lifetime of an ion source is disclosed. The ion source includes an ion source chamber, a suppression electrode and a ground electrode. In the processing mode, the ion sou...
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WO/2014/025751A2 |
A system and method for producing a continuous or pulsed source of high energy electrons at or near atmospheric pressure is disclosed. High energy electrons are used to ionize analyte molecules in ambient air through collisions with reac...
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WO/2013/190285A1 |
An ion accelerator comprises: an inner magnet (10) having a channel (34) extending through it in an axial direction; an outer magnet (12) extending around the inner magnet (10), the magnets having like polarities so as to produce a magne...
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WO/2013/186523A1 |
A plasma source apparatus for generating a beam of charged particles is disclosed. The apparatus comprises: a plasma chamber provided with an inlet for the ingress of gas and an aperture for the extraction of charged particles from the p...
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WO/2013/176867A1 |
In one embodiment, a method for generating an ion beam having gallium ions includes providing at least a portion of a gallium compound target in a plasma chamber, the gallium compound target comprising gallium and at least one additional...
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WO/2013/161837A1 |
With a gas field ionization ion source, impurities included in an ionized gas result in an unstable field ionization ion source. Cooling an ionized gas which is supplied to an emitter tip of the field ionization ion source increases puri...
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WO/2013/120097A9 |
The present invention relates to a filtered cathodic-arc ion source that reduces, or even eliminates, macroparticles while minimally compromising the compact size, simplicity, and high flux ion production benefits of unfiltered cathodic-...
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WO/2013/150861A1 |
This gas field ion source is characterized by emitting an ion beam in at least two operation states including: a first operation state in which ions are emitted from a first ion emission region at the tip of an emitter electrode when ion...
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WO/2013/148286A1 |
An apparatus to generate negative hydrogen ions includes an ion source operative to generate positive hydrogen ions, a first component to adjust positive molecular hydrogen ion species in the ion source, a second component to adjust extr...
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WO/2013/116787A1 |
In a particular embodiment, a device is disclosed that includes means for providing a negative ion source comprising a compact surface plasma source (CSPS) with a significantly increased average beam current, increased brightness, and an...
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WO/2013/112318A1 |
A system for infusing ion clusters into a target environment includes a housing, a fan, and an ion cluster generation component. The housing has intake and outflow openings. The fan forces air through the intake opening and along a route...
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WO/2013/098505A1 |
The invention, which relates to a miniaturisable plasma thruster, consists of: - igniting the plasma by microhollow cathode discharge close to the outlet and inside the means for injecting the propellant gas, said injection means being m...
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WO/2013/096519A1 |
In a particular embodiment, a device is disclosed that includes means for providing a large volume surface plasma source (SPS) with an anode layer plasma accelerator. The device also includes means for operating the large volume surface ...
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