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Patent Searching and Data


Matches 1 - 50 out of 5,012

Document Document Title
WO/2024/037843A2
The invention relates, inter alia, to an ion source (10) for generating ions (16) or ion beams (16a), having an ion generation chamber (11) in which the ions (16) are generated. To monitor the ion source (10) and in particular ensure its...  
WO/2024/025168A1
In one embodiment of the present invention, provided are an RF-biased reactive ion etching apparatus for addressing the issue of affecting an etch profile that occurs during ion beam etching or reactive ion beam etching by forming a high...  
WO/2024/020294A1
A repeller assembly mounts in an arc chamber of an ion implanter. The repeller assembly includes a repeller, a tubular insert, first and second insulators, a contact member, and a lock member. The repeller has a knob-shaped body placed o...  
WO/2024/003448A1
An inventive arrangement is made to produce for negative ions. It comprises a chamber (1) with a sputtering gas (2), a cathode (3), an alkali metal (4) in order to decrease a work function of the cathode, and an extraction channel (5). F...  
WO/2023/248856A1
Provided is a GCIB device capable of changing the energy of ions to be emitted, without changing: the extraction electrode arrangement optimized at a specific voltage; the electrode arrangement of the GCIB device having a permanent-magne...  
WO/2023/239512A1
An ion source with a crucible is disclosed. In some embodiments, the crucible contains a solid dopant material, such as a metal. A porous wicking tip in disposed in the crucible in contact with the solid dopant material. The porous wicki...  
WO/2023/239503A1
An ion source that is capable of different modes of operation is disclosed. A vaporizer is in communication with the ion source. The ion source may have several gas inlets, in communication with different gasses. When operating in a firs...  
WO/2023/219750A1
An ion source that is capable of different modes of operation is disclosed. The ion source includes an insertable target holder includes a hollow interior into which the solid dopant material is disposed. The target holder may a porous s...  
WO/2023/219748A2
An ion source that is capable of different modes of operation is disclosed. A solid target may be disposed in the arc chamber. The ion source may have several gas inlets, in communication with different gasses. When operating in a first ...  
WO/2023/219747A1
An ion source that is capable of different modes of operation is disclosed. The ion source includes an insertable target holder includes a hollow interior into which the solid dopant material is disposed. The target holder may a porous s...  
WO/2023/205427A1
A plasma focus system for neutron production is disclosed that includes a plasma focus device and a neutron source. The plasma focus device is configured to emit a remnant ion beam. The neutron source includes an enclosure having a cavit...  
WO/2023/196058A1
An ion source is provided. The ion source may include an ion chamber to generate an ion beam comprising a metal ion species; and a charge source, coupled to deliver a metal vapor to the ion chamber, the charge source including a charge m...  
WO/2023/191324A1
The present invention relates to a large linear TCP plasma source, a large linear charged particle beam source using same, and a grid for the large linear charged particle beam source. The large linear charged particle beam source compri...  
WO/2023/167873A1
Embodiments of systems, devices, and methods relate to exclusion of ion beam paths on the target surface to optimize neutron beam performance. A particle beam is directed along an axis so that the particle beam is incident on a target po...  
WO/2023/167522A1
The present invention is installed between a hydrogen fuel cell and a hydrogen supply device, wherein hydrogen supplied to the hydrogen fuel cell is activated by the strength of an ultra-high density line electric field and supplied in a...  
WO/2023/158759A2
A muon detector includes: a chamber having a maximum cross-sectional dimension of 30 cm or less; a gas sealed inside the chamber ionized by the passage of atmospheric muons to form ions in the chamber; a cathode in the chamber at a first...  
WO/2023/147108A1
An ion source 110 has an arc chamber 116 defining an arc chamber volume 140. A reservoir 144 is coupled to the arc chamber, defining a reservoir volume 146. The reservoir receives a source species to define a liquid 114 within the reserv...  
WO/2023/139532A1
The invention relates to an ion source comprising: - an inlet for a sample to be analysed; - a plurality of components forming a path for an ion flow, wherein at least one of the components forming the path for the ion flow comprises gra...  
WO/2023/121653A1
A system and method for spectrometry of a sample in a plasma is described. The system includes a split ring resonator, an electrode, and a delivery system. The split ring resonator has a discharge gap, and the electrode is arranged in pr...  
WO/2023/114166A1
An electron bombardment ion source assembly for use in a mass spectrometer and including an anode extending along an axis and surrounding an ionization volume. At least two filaments are each configured to thermionically emit electrons a...  
WO/2023/113995A1
An IHC ion source having increased plasma potential is disclosed. In certain embodiments, the extraction plate is biased at a higher voltage than the body of the arc chamber to achieve the higher plasma potential. Shielding electrodes ma...  
WO/2023/091267A1
A Bernas ion source having a shield is disclosed. The shield is disposed between the distal portion of the filament and the first end of the chamber and serves to confine the plasma to the region between the shield and the second end of ...  
WO/2023/076007A1
An ion source for extracting a ribbon ion beam with improved height uniformity is disclosed. Gas nozzles are disposed in the chamber proximate the extraction aperture. The gas that is introduced near the extraction aperture serves to sha...  
WO/2023/075966A1
An ion extraction assembly for an ion source is provided. The ion extraction assembly may include a plurality of electrodes, wherein the plurality of electrodes comprises: a plasma-facing electrode, arranged for coupling to a plasma cham...  
WO/2023/076315A1
A system and method for uniform cooling of an electromagnetic coil are provided. The system includes an electromagnetic coil, a cooling structure. and a cooling fluid source. The cooling structure surrounds the entirety of the perimeter ...  
WO/2023/076575A2
An ion source has arc chamber having one or more radiation generating features, an arc chamber body enclosing an internal volume, and at least one gas inlet aperture defined therein. A gas source provides a gas such as a source species g...  
WO/2023/075969A1
An ion source capable of extracting a ribbon ion beam with improved vertical angular uniformity is disclosed. The extraction plate and extraction optics are designed such that there is at least one non-uniform gap between adjacent compon...  
WO/2023/058291A1
An ion generation apparatus 10 comprises: an arc chamber 50; a magnetic field generator 52 that generates a magnetic field B to be applied in the axial direction in an internal space S of the arc chamber 50; a first cathode cap 72 that p...  
WO/2023/059494A1
An ion source has a vacuum envelope structure comprising a cylindrical portion with a lengthwise axis and an inside diameter defining an interior volume, joined at one end to a flange concentric with the axis, the cylindrical portion ope...  
WO/2023/055451A1
An ion source has an arc chamber with a first end and a second end. A first cathode at the first end of the arc chamber has a first cathode body and a first filament disposed within the first cathode body. A second cathode at the second ...  
WO/2023/048896A1
A processing system including an ion source having a plasma chamber to house a plasma, an extraction assembly, disposed along a side of the plasma chamber, and including at least one extraction aperture, and an antenna assembly extending...  
WO/2023/045368A1
A PLC-based BNCT high-duty-ratio ECR ion source efficient beam output system and method. An ECR ion source comprises a microwave generation and microwave transmission feeding system, a discharge chamber, an extraction system, a vacuum sy...  
WO/2023/043600A1
An ion source. The ion source may include a plasma chamber to house a plasma, and an extraction assembly, disposed along a side of the plasma chamber, and comprising at least one extraction aperture. The ion source may further include an...  
WO/2023/038772A1
An ion source capable of extracting a ribbon ion beam with improved uniformity is disclosed. One of the walls of the ion source has a protrusion on its interior surface facing the chamber. The protrusion creates a loss area that serves a...  
WO/2023/038771A1
An ion source having an extraction plate with a variable thickness is disclosed. The extraction plate has a protrusion on its interior or exterior surface proximate the extraction aperture. The protrusion increases the thickness of the e...  
WO/2023/019081A1
Some embodiments are directed to a decomposing and collection apparatus for use with a fluid. The apparatus includes an assembly for generating ions via applying atmospheric pressure, low temperature plasma to the fluid and separating th...  
WO/2023/009287A1
A system for extending the life of a repeller in an IHC ion source is disclosed. The system includes an IHC ion source wherein the back surface of the repeller has been shaped to reduce the possibility of electrical shorts. The separatio...  
WO/2023/287561A1
Techniques for adjusting the shape of an ion beam are described. Characteristics of a desired beam shape may be defined. The ion beam generator may include beam shaping elements associated with tunable parameters that can be set in combi...  
WO/2023/275579A1
A first aspect of the present invention is related to a method for manufacturing an emitter for electrospray generators. The method comprising the steps of providing a substrate, presenting a plate and at least one protrusion, and then n...  
WO/2022/271347A1
A crucible that exploits the observation that molten metal tends to flow toward the hottest regions is disclosed. The crucible includes an interior in which dopant material may be disposed. The crucible has a pathway leading from the int...  
WO/2022/249371A1
With respect to an ion source 101, an ion milling device according to the present invention applies a discharge voltage Vd between an anode 203 and a cathode 201, 202, and applies an acceleration voltage Va between the anode and an accel...  
WO/2022/242126A1
An ion source apparatus with an adjustable plasma density, which belongs to the field of semiconductor devices. A coil is wound on the outer side of a discharge cavity of the ion source device having an adjustable plasma density; a radio...  
WO/2022/240998A1
An ion source has an arc chamber having first and second ends and an aperture plate to enclose a chamber volume. An extraction aperture is disposed between the first and second ends. A cathode is near the first end of the arc chamber, an...  
WO/2022/235399A1
A system and method for extending the life of a cathode and repeller in an IHC ion source is disclosed. The system monitors the health of the cathode by operating using a known set of parameters and measuring the bias power used to gener...  
WO/2022/231806A1
A method for processing a substrate that includes: applying, at an ionizer, a drive pulse train to an ion source to ionize a gas cluster beam and transfer the drive pulse train to the gas cluster beam; measuring, at a detector exposed to...  
WO/2022/210288A1
This plasma generating device comprises: a chamber that generates plasma therein; a plurality of magnets that wrap around the circumference of the chamber; and a magnet retaining part that retains the plurality of magnets. The magnet ret...  
WO/2022/125264A9
A method includes producing an electric propulsion (EP) rocket engine. The method selects a core discharge chamber. A discharge cathode assembly (DCA) is selected along with a DCA common interface (CI). The DCA CI is connected to the cor...  
WO/2022/169827A1
Plasma generation systems and methods with enhanced electrical insulation properties are disclosed. The system can include a plasma source having a plasma chamber, and a gas supply unit configured to supply process gas into the plasma ch...  
WO/2022/155293A1
Disclosed herein are gas detector devices and methods of making and use thereof. The gas detector devices comprise: a temperature control layer; a grounded electrode; and a pyroelectric layer; the grounded electrode being disposed betwee...  
WO/2022/139689A1
An ion microscope, a method of constructing an ion microscope, and a method of aligning an ion beam in an ion microscope. The microscope comprises a nano-aperture ion source; and a focusing system; wherein the focusing system is configur...  

Matches 1 - 50 out of 5,012